Patents by Inventor Yoshio Katsuro

Yoshio Katsuro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7427387
    Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.
    Type: Grant
    Filed: April 18, 2006
    Date of Patent: September 23, 2008
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Keiji Yamahara, Takashi Yamaguchi, Yutaka Mori
  • Publication number: 20060183624
    Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.
    Type: Application
    Filed: April 18, 2006
    Publication date: August 17, 2006
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Yoshio Katsuro, Keiji Yamahara, Takashi Yamaguchi, Yutaka Mori
  • Patent number: 7074376
    Abstract: A method of producing a silica gel by hydrolyzing a silicon alkoxide and subjecting the resulting hydrogel to a hydrothermal treatment substantially without aging it is described. Also described in a silica gel produced by such a method and a silica gel which has the following characteristics: (a) the pore volume is from 0.6 to 1.6 ml/g, (b) the specific surface area is from 300 to 900 m2/g, (c) the mode diameter (Dmax) of pores is less than 20 nm, (d) the volume of pores having diameters within ±20% of Dmax is at least 50% of the total pore volume, (e) it is amorphous, and (f) the content of metal impurities is at most 500 ppm.
    Type: Grant
    Filed: August 23, 2004
    Date of Patent: July 11, 2006
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Takashi Yamaguchi, Takayuki Yoshimori, Hanako Kato
  • Patent number: 7063826
    Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700° C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.
    Type: Grant
    Filed: January 16, 2004
    Date of Patent: June 20, 2006
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Keiji Yamahara, Takashi Yamaguchi, Yutaka Mori
  • Publication number: 20050019243
    Abstract: A method of producing a silica gel by hydrolyzing a silicon alkoxide and subjecting the resulting hydrogel to a hydrothermal treatment substantially without aging it is described. Also described in a silica gel produced by such a method and a silica gel which has the following characteristics: (a) the pore volume is from 0.6 to 1.6 ml/g, (b) the specific surface area is from 300 to 900 m2/g, (c) the mode diameter (Dmax) of pores is less than 20 nm, (d) the volume of pores having diameters within ±20% of Dmax is at least 50% of the total pore volume, (e) it is amorphous, and (f) the content of metal impurities is at most 500 ppm.
    Type: Application
    Filed: August 23, 2004
    Publication date: January 27, 2005
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Takashi Yamaguchi, Takayuki Yoshimori, Hanako Kato
  • Patent number: 6838068
    Abstract: A method of producing a silica gel by hydrolyzing a silicon alkoxide and subjecting the resulting hydrogel to a hydrothermal treatment substantially without aging it is described. Also described in a silica gel produced by such a method and a silica gel which has the following characteristics: (a) the pore volume is from 0.6 to 1.6 ml/g, (b) the specific surface area is from 300 to 900 m2/g, (c) the mode diameter (Dmax) of pores is less than 20 nm, (d) the volume of pores having diameters within ±20% of Dmax is at least 50% of the total pore volume, (e) it is amorphous, and (f) the content of metal impurities is at most 500 ppm.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: January 4, 2005
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Takashi Yamaguchi, Takayuki Yoshimori, Hanako Kato
  • Publication number: 20040161375
    Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion.
    Type: Application
    Filed: January 16, 2004
    Publication date: August 19, 2004
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Yoshio Katsuro, Keiji Yamahara, Takashi Yamaguchi, Yutaka Mori
  • Publication number: 20020018743
    Abstract: A method of producing a silica gel by hydrolyzing a silicon alkoxide and subjecting the resulting hydrogel to a hydrothermal treatment substantially without aging it is described.
    Type: Application
    Filed: June 27, 2001
    Publication date: February 14, 2002
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Takashi Yamaguchi, Takayuki Yoshimori, Hanako Kato
  • Patent number: 6225245
    Abstract: A synthetic quartz powder obtained by calcining a powder of silica gel, characterized in that white devitrification spots having sizes of larger than 20 &mgr;m in diameter formed in an ingot obtained by vacuum melting the synthetic quartz powder at a temperature of from 1780 to 1800° C. to form an ingot, followed by maintaining the ingot at a temperature of 1630° C. for 5 hours, are at most 10 spots/50 g.
    Type: Grant
    Filed: November 19, 1997
    Date of Patent: May 1, 2001
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Akira Utsunomiya, Yoshio Katsuro, Akihiro Takazawa, Takashi Moriyama
  • Patent number: 6131409
    Abstract: A method for producing a high purity synthetic quartz powder, characterized by using a tetramethoxysilane having a trimethoxymethylsilane content of at most 0.3 wt %, and converting it to a synthetic quartz by a sol-gel method.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: October 17, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Takanobu Katsuki, Akihiro Takazawa, Hanako Kato, Akira Utsunomiya
  • Patent number: 6129899
    Abstract: A process for producing a synthetic quartz powder, which comprises a step of heat-treating a silica gel powder while permitting it to flow in a rotary kiln.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: October 10, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Masaru Shimoyama, Hiroshi Maeda, Shoji Oishi
  • Patent number: 6110852
    Abstract: A process for producing synthetic quartz powder which comprises calcining silica gel powder to produce a synthetic quartz glass powder, wherein dry air is used in the calcining process at least in the process of cooling from 800.degree. C. to 200.degree. C. This process enables efficient production of synthetic quartz glass powder on an industrial scale.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: August 29, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Hozumi Endo, Akira Utsunomiya, Hiroaki Nagai, Toshifumi Yoshikawa, Shoji Oishi, Takashi Yamaguchi
  • Patent number: 6071838
    Abstract: A synthetic quartz glass powder obtained by sol-gel method, wherein the number of black spot particles is at most 5 particles per 50 g, provides a high quality quartz glass shaped product with low bubble content when fused.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: June 6, 2000
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Hozumi Endo, Yoshio Katsuro, Akira Utsunomiya, Masaru Shimoyama
  • Patent number: 5574172
    Abstract: The disclosure describes a process for producing halogenated phthalic anhydride, which comprises reacting phthalic anhydride with a molecular halogen in vapor phase in the presence of a catalyst containing zeolite as active component.
    Type: Grant
    Filed: May 26, 1994
    Date of Patent: November 12, 1996
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoshio Katsuro, Hitoshi Matsuda
  • Patent number: 5258530
    Abstract: A process for producing a biphenyltetracarboxylic dianhydride which comprises the step of: heating phthalic anhydride at a temperature of from 135.degree. to 300.degree. C. in the presence of a palladium catalyst thereby to allow the phthalic anhydride to undergo a dimerization reaction. According to the process, biphenyltetracarboxylic dianhydride can be synthesized by the direct dimerization of phthalic anhydride.
    Type: Grant
    Filed: February 16, 1993
    Date of Patent: November 2, 1993
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Yoshio Katsuro, Hitoshi Matsuda
  • Patent number: 5095144
    Abstract: A process for dimerizing an aromatic halogen compound is disclosed, which comprises the step of: subjecting an aromatic halogen compound having at least one halogen atom bonded to an aromatic nucleus carbon to a dehalogenation-dimerization reaction in the presence of a catalyst, water, a reducing agent, and a halogen acceptor, the catalyst comprising a carrier supported thereon palladium and iron.
    Type: Grant
    Filed: July 17, 1990
    Date of Patent: March 10, 1992
    Assignee: Mitsubishi Kasei Corporation
    Inventors: Keiichi Sato, Takahiko Takewaki, Yoshio Katsuro
  • Patent number: 4900843
    Abstract: A method of dehalogeno-dimerizing an aromatic halide compound substituted by at least one halogen atom substituted on the aromatic ring using a palladium catalyst on support in the presence of water, a reducing agent and a halogen acceptor is disclosed. The method is characterized by using the palladium catalyst on support immersed in a hydrohalogenic acid prior to the dehalogeno-dimerization reaction.
    Type: Grant
    Filed: May 31, 1988
    Date of Patent: February 13, 1990
    Assignee: Mitsubishi Chemical Industries Limited
    Inventors: Mitsumasa Kitai, Yoshio Katsuro, Shigenori Kawamura, Masumi Hino, Keiichi Sato