Patents by Inventor Yoshio Kawamata
Yoshio Kawamata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11127574Abstract: A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.Type: GrantFiled: March 30, 2018Date of Patent: September 21, 2021Assignee: SHIBAURA MECHATRONICS CORPORATIONInventors: Yoshio Kawamata, Yu Kambe
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Patent number: 11004665Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.Type: GrantFiled: March 30, 2018Date of Patent: May 11, 2021Assignee: SHIBAURA MECHATRONICS CORPORATIONInventors: Yoshio Kawamata, Daisuke Ono
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Publication number: 20180286645Abstract: A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.Type: ApplicationFiled: March 30, 2018Publication date: October 4, 2018Inventors: Yoshio KAWAMATA, Yu KAMBE
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Publication number: 20180286644Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.Type: ApplicationFiled: March 30, 2018Publication date: October 4, 2018Inventors: Yoshio KAWAMATA, Daisuke ONO
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Patent number: 8137511Abstract: A film forming apparatus and a film forming method includes: a vacuum chamber; a holder for a film formation object, the holder being rotatably provided in the vacuum chamber; and a sputter source capable of holding a plurality of targets, the sputter source being spinnably provided so that the opposed area of the target with respect to the film formation object can be varied. They can perform uniform and efficient film formation in accordance with the size of a film formation object using a simple configuration, with less possibility of contamination and easy maintenance.Type: GrantFiled: June 6, 2007Date of Patent: March 20, 2012Assignee: Shibaura Mechatronics CorporationInventor: Yoshio Kawamata
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Patent number: 8022011Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.Type: GrantFiled: April 28, 2010Date of Patent: September 20, 2011Assignee: Shibaura Mechatronics CorporationInventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
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Patent number: 7799731Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.Type: GrantFiled: September 27, 2002Date of Patent: September 21, 2010Assignee: Shibaura Mechatronics CorporationInventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
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Publication number: 20100230273Abstract: A film forming apparatus and a film forming method includes: a vacuum chamber; a holder for a film formation object, the holder being rotatably provided in the vacuum chamber; and a sputter source capable of holding a plurality of targets, the sputter source being spinnably provided so that the opposed area of the target with respect to the film formation object can be varied. They can perform uniform and efficient film formation in accordance with the size of a film formation object using a simple configuration, with less possibility of contamination and easy maintenance.Type: ApplicationFiled: June 6, 2007Publication date: September 16, 2010Applicant: SHIBAURA MECHATRONICS CORPORATIONInventor: Yoshio Kawamata
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Publication number: 20100206723Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.Type: ApplicationFiled: April 28, 2010Publication date: August 19, 2010Applicant: SHIBAURA MECHATRONICS CORPORATIONInventors: Junji HIRAOKA, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
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Publication number: 20100210447Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.Type: ApplicationFiled: April 28, 2010Publication date: August 19, 2010Applicant: Shibaura Mechatronics CorporationInventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
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Patent number: 7608562Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.Type: GrantFiled: November 20, 2008Date of Patent: October 27, 2009Assignee: Shibaura Mechatronics CorporationInventors: Junji Hiraoka, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
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Publication number: 20090134022Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.Type: ApplicationFiled: November 20, 2008Publication date: May 28, 2009Applicant: SHIBAURA MECHATRONICS CORPORATIONInventors: Junji HIRAOKA, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
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Patent number: 7462578Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.Type: GrantFiled: November 29, 2002Date of Patent: December 9, 2008Assignee: Shibaura Mechatronics CorporationInventors: Junji Hiraoka, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
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Publication number: 20050020444Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.Type: ApplicationFiled: November 29, 2002Publication date: January 27, 2005Inventors: Junji Hiraoka, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
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Publication number: 20040248725Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.Type: ApplicationFiled: July 22, 2004Publication date: December 9, 2004Inventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
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Patent number: 6416638Abstract: The present invention is such that, in a circuit for preventing an arc discharge through the application of a reverse voltage pulse, in the case where, after the application of the reverse voltage pulse has been ended, the generation of an arc discharge is detected by an arc discharge detecting means (23), a reverse voltage generated by a reverse voltage generating means (12) is applied within 1 to 10 &mgr;s to a sputtering source to lower the probability of generating a continuous arc discharge and, through a diode (D10) connected in series with the sputtering source (14) and a resistor (r10) connected in parallel with the diode (D10), a current at a time of applying the reverse voltage is restricted, thus lowering a continuous arc discharge resulting from the reverse arc discharge.Type: GrantFiled: July 28, 1999Date of Patent: July 9, 2002Assignee: Shibaura Mechatronics CorporationInventors: Noboru Kuriyama, Yutaka Yatsu, Yoshio Kawamata, Takashi Fujii
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Patent number: 4989163Abstract: A photo printer system comprises a magnetic storage for storing a print data sent from a host computer, a bit map memory for storing a print dot data, and a printer engine for printing the contents of the bit map memory. The system includes a program which operates on the magnetic storage to serve as an external storage for the host computer and on the bit map memory to serve as a cache memory in response to a data read/write command issued by the host computer, and a CPU which controls the execution of the program. At least in a non-print process mode, the system forms a data path so that the host computer can access to the bit map memory and magnetic storage so as to have a bidirectional data read/write operation. In another mode, the system forms a data path so that image data picked up with an image scanner is saved directly in the bit map memory and the image data is sent to the host computer by request.Type: GrantFiled: July 29, 1988Date of Patent: January 29, 1991Assignee: Hitachi, Ltd.Inventors: Yoshio Kawamata, Syoichi Ito, Katsufumi Takagishi
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Patent number: 4956125Abstract: Edible fats and oils are extracted from oil-bearing materials by loading the raw materials onto an inlet end of a flat and fixed conveying surface having elongate slits therein. The materials are conveyed from the inlet end to the outlet end of the conveying surface by scrapers moved by endless chains. Oil extracting solvent is sprayed onto the material on the conveying surface, to produce miscella, which flows through the slits in the surface and into hoppers beneath the surface. The miscella is circulated back to additional sprayers located upstream of the solvent sprayers for spraying the miscella onto the upstream end of the conveying surface. The resulting concentrated miscella is collected in hoppers beneath the surface and delivered to a further use.Type: GrantFiled: May 2, 1989Date of Patent: September 11, 1990Assignee: Showa Sangyo Co., Ltd.Inventors: Yoshio Kawamata, Kiyoshi Iwai
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Patent number: 4868553Abstract: Disclosed is a raster operation device including a word boundary checking circuit which operates on a hardware basis to check as to whether the writing of data across the word boundary of frame buffer occurs, basing on the shift width, bit width, etc.Type: GrantFiled: October 23, 1987Date of Patent: September 19, 1989Assignee: Hitachi, Ltd.Inventor: Yoshio Kawamata
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Patent number: 4857279Abstract: Edible fats and oils are extracted from oil-bearing materials by loading the raw materials onto an inlet end of a flat and fixed conveying surface having elongate slits therein. The materials are conveyed from the inlet end to the outlet end of the conveying surface by scrapers moved by endless chains. Oil extracting solvent is sprayed onto the material on the conveying surface, to produce miscella, which flows through the slits in the surface and into hoppers beneath the surface. The miscella is circulated back to additional sprayers located upstream of the solvent sprayers for spraying the miscella onto the upstream end of the conveying surface. The resulting concentrated miscella is collected in hoppers beneath the surface and delivered to a further use.Type: GrantFiled: December 24, 1986Date of Patent: August 15, 1989Assignee: Showa Sangyo Co., Ltd.Inventors: Yoshio Kawamata, Kiyoshi Iwai