Patents by Inventor Yoshio Kawamata

Yoshio Kawamata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11127574
    Abstract: A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: September 21, 2021
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Yoshio Kawamata, Yu Kambe
  • Patent number: 11004665
    Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.
    Type: Grant
    Filed: March 30, 2018
    Date of Patent: May 11, 2021
    Assignee: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Yoshio Kawamata, Daisuke Ono
  • Publication number: 20180286645
    Abstract: A plasma processing apparatus includes a conveyance unit that has a rotator in a vacuum container, and circulating carries a workpiece by the rotator along a circular conveyance path, a cylindrical member extended in a direction toward the conveyance path in the vacuum container, a window member that divides a gas space where a process gas is introduced and an exterior, and an antenna causing the process gas to generate inductive coupling plasma for plasma processing when power is applied. The cylindrical member is provided with an opposing part with the opening and faces the rotator, a dividing wall is provided between the opposing part and the rotator so as not to contact the opposing part and the rotator and not to move relative to the vacuum container, and the dividing wall is provided with an adjustment opening that faces the opening, and adjusts a range of the plasma processing.
    Type: Application
    Filed: March 30, 2018
    Publication date: October 4, 2018
    Inventors: Yoshio KAWAMATA, Yu KAMBE
  • Publication number: 20180286644
    Abstract: A plasma processing apparatus includes a vacuum container, a conveyance unit including a rotator and circulating and carrying a workpiece through the conveyance path, a cylindrical member having an opening at one end extended in the direction toward the conveyance path, a window member provided at the cylindrical member, and dividing a gas space from the exterior thereof, a supply unit supplying the process gas in the gas space, and an antenna generating inductive coupling plasma on the workpiece. The supply unit supplies the process gas from plural locations where a passing time at which the surface of the rotator passes through a process region is different, and the plasma processing apparatus further includes an adjusting unit individually adjusting the supply amounts of the process gas from the plural locations of the supply unit per a unit time in accordance with the passing time.
    Type: Application
    Filed: March 30, 2018
    Publication date: October 4, 2018
    Inventors: Yoshio KAWAMATA, Daisuke ONO
  • Patent number: 8137511
    Abstract: A film forming apparatus and a film forming method includes: a vacuum chamber; a holder for a film formation object, the holder being rotatably provided in the vacuum chamber; and a sputter source capable of holding a plurality of targets, the sputter source being spinnably provided so that the opposed area of the target with respect to the film formation object can be varied. They can perform uniform and efficient film formation in accordance with the size of a film formation object using a simple configuration, with less possibility of contamination and easy maintenance.
    Type: Grant
    Filed: June 6, 2007
    Date of Patent: March 20, 2012
    Assignee: Shibaura Mechatronics Corporation
    Inventor: Yoshio Kawamata
  • Patent number: 8022011
    Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.
    Type: Grant
    Filed: April 28, 2010
    Date of Patent: September 20, 2011
    Assignee: Shibaura Mechatronics Corporation
    Inventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
  • Patent number: 7799731
    Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: September 21, 2010
    Assignee: Shibaura Mechatronics Corporation
    Inventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
  • Publication number: 20100230273
    Abstract: A film forming apparatus and a film forming method includes: a vacuum chamber; a holder for a film formation object, the holder being rotatably provided in the vacuum chamber; and a sputter source capable of holding a plurality of targets, the sputter source being spinnably provided so that the opposed area of the target with respect to the film formation object can be varied. They can perform uniform and efficient film formation in accordance with the size of a film formation object using a simple configuration, with less possibility of contamination and easy maintenance.
    Type: Application
    Filed: June 6, 2007
    Publication date: September 16, 2010
    Applicant: SHIBAURA MECHATRONICS CORPORATION
    Inventor: Yoshio Kawamata
  • Publication number: 20100206723
    Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.
    Type: Application
    Filed: April 28, 2010
    Publication date: August 19, 2010
    Applicant: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Junji HIRAOKA, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
  • Publication number: 20100210447
    Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.
    Type: Application
    Filed: April 28, 2010
    Publication date: August 19, 2010
    Applicant: Shibaura Mechatronics Corporation
    Inventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
  • Patent number: 7608562
    Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.
    Type: Grant
    Filed: November 20, 2008
    Date of Patent: October 27, 2009
    Assignee: Shibaura Mechatronics Corporation
    Inventors: Junji Hiraoka, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
  • Publication number: 20090134022
    Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.
    Type: Application
    Filed: November 20, 2008
    Publication date: May 28, 2009
    Applicant: SHIBAURA MECHATRONICS CORPORATION
    Inventors: Junji HIRAOKA, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
  • Patent number: 7462578
    Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.
    Type: Grant
    Filed: November 29, 2002
    Date of Patent: December 9, 2008
    Assignee: Shibaura Mechatronics Corporation
    Inventors: Junji Hiraoka, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
  • Publication number: 20050020444
    Abstract: A method of producing a photocatalyst according to the invention comprises forming an amorphous titanium oxide and heat-treating it in an atmosphere containing oxygen, whereby a photocatalyst having a good photocatalysis can be obtained. In particular, the amorphous titanium oxide is obtained by using the reactive sputtering method and via deposition at a low temperature and at a high film formation rate. This apparatus can be provided with cooling means to allow enhancement of the throughput of the film formation process.
    Type: Application
    Filed: November 29, 2002
    Publication date: January 27, 2005
    Inventors: Junji Hiraoka, Minoru Takashio, Tetsuya Fukushima, Daisuke Noguchi, Yoshio Kawamata
  • Publication number: 20040248725
    Abstract: A photocatalyst according to the invention comprises a photocatalytic film of a compound of titanium and oxygen and is characterized in that the photocatalytic film is made porous and has 0.02 or higher value as a value calculated by dividing the arithmetical mean deviation of profile Ra with the film thickness. The photocatalytic film can also be specified by the intensity ratio between x-ray diffraction peaks of the anatase structure of titanium oxide. Such a porous photocatalytic material can be obtained by a reactive sputtering method in conditions of adjusting film formation parameters such as the film formation rate, the sputtering pressure, the substrate temperature, the oxygen partial pressure and the like in proper ranges, respectively, and the photocatalyst material is provided with excellent decomposition and hydrophilization capability.
    Type: Application
    Filed: July 22, 2004
    Publication date: December 9, 2004
    Inventors: Junji Hiraoka, Takahiro Doke, Hisato Haraga, Daisuke Noguchi, Yoshio Kawamata
  • Patent number: 6416638
    Abstract: The present invention is such that, in a circuit for preventing an arc discharge through the application of a reverse voltage pulse, in the case where, after the application of the reverse voltage pulse has been ended, the generation of an arc discharge is detected by an arc discharge detecting means (23), a reverse voltage generated by a reverse voltage generating means (12) is applied within 1 to 10 &mgr;s to a sputtering source to lower the probability of generating a continuous arc discharge and, through a diode (D10) connected in series with the sputtering source (14) and a resistor (r10) connected in parallel with the diode (D10), a current at a time of applying the reverse voltage is restricted, thus lowering a continuous arc discharge resulting from the reverse arc discharge.
    Type: Grant
    Filed: July 28, 1999
    Date of Patent: July 9, 2002
    Assignee: Shibaura Mechatronics Corporation
    Inventors: Noboru Kuriyama, Yutaka Yatsu, Yoshio Kawamata, Takashi Fujii
  • Patent number: 4989163
    Abstract: A photo printer system comprises a magnetic storage for storing a print data sent from a host computer, a bit map memory for storing a print dot data, and a printer engine for printing the contents of the bit map memory. The system includes a program which operates on the magnetic storage to serve as an external storage for the host computer and on the bit map memory to serve as a cache memory in response to a data read/write command issued by the host computer, and a CPU which controls the execution of the program. At least in a non-print process mode, the system forms a data path so that the host computer can access to the bit map memory and magnetic storage so as to have a bidirectional data read/write operation. In another mode, the system forms a data path so that image data picked up with an image scanner is saved directly in the bit map memory and the image data is sent to the host computer by request.
    Type: Grant
    Filed: July 29, 1988
    Date of Patent: January 29, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Yoshio Kawamata, Syoichi Ito, Katsufumi Takagishi
  • Patent number: 4956125
    Abstract: Edible fats and oils are extracted from oil-bearing materials by loading the raw materials onto an inlet end of a flat and fixed conveying surface having elongate slits therein. The materials are conveyed from the inlet end to the outlet end of the conveying surface by scrapers moved by endless chains. Oil extracting solvent is sprayed onto the material on the conveying surface, to produce miscella, which flows through the slits in the surface and into hoppers beneath the surface. The miscella is circulated back to additional sprayers located upstream of the solvent sprayers for spraying the miscella onto the upstream end of the conveying surface. The resulting concentrated miscella is collected in hoppers beneath the surface and delivered to a further use.
    Type: Grant
    Filed: May 2, 1989
    Date of Patent: September 11, 1990
    Assignee: Showa Sangyo Co., Ltd.
    Inventors: Yoshio Kawamata, Kiyoshi Iwai
  • Patent number: 4868553
    Abstract: Disclosed is a raster operation device including a word boundary checking circuit which operates on a hardware basis to check as to whether the writing of data across the word boundary of frame buffer occurs, basing on the shift width, bit width, etc.
    Type: Grant
    Filed: October 23, 1987
    Date of Patent: September 19, 1989
    Assignee: Hitachi, Ltd.
    Inventor: Yoshio Kawamata
  • Patent number: 4857279
    Abstract: Edible fats and oils are extracted from oil-bearing materials by loading the raw materials onto an inlet end of a flat and fixed conveying surface having elongate slits therein. The materials are conveyed from the inlet end to the outlet end of the conveying surface by scrapers moved by endless chains. Oil extracting solvent is sprayed onto the material on the conveying surface, to produce miscella, which flows through the slits in the surface and into hoppers beneath the surface. The miscella is circulated back to additional sprayers located upstream of the solvent sprayers for spraying the miscella onto the upstream end of the conveying surface. The resulting concentrated miscella is collected in hoppers beneath the surface and delivered to a further use.
    Type: Grant
    Filed: December 24, 1986
    Date of Patent: August 15, 1989
    Assignee: Showa Sangyo Co., Ltd.
    Inventors: Yoshio Kawamata, Kiyoshi Iwai