Abstract: An exposure apparatus which includes a projection optical system configured to project light from an original onto a substrate and performs an exposure of the substrate to light via a liquid that fills a gap between a final optical element of the projection optical system and the substrate, the apparatus comprises a controller configured so that 1) an exposure condition for the substrate is input to the controller, the exposure condition including a shot area layout and a dose for a shot area, and 2) the controller obtains a contact time during which the shot area is to be kept in contact with the liquid based on the input exposure condition, and corrects the input dose based on the obtained contact time.

Abstract: An exposure apparatus having a stage configured to hold a substrate and to be moved, and a projection optical system configured to project light from a reticle to the substrate held by the stage, and exposing the substrate to light via liquid filled in a gap between the substrate and a final surface of the projection optical system is disclosed. The apparatus comprises a first nozzle configured to supply liquid to the gap; a second nozzle configured to selectively perform recovery of liquid from the gap and supply of liquid to a gap between the stage and the final surface of the projection optical system; and a third nozzle configured to recover liquid supplied via at least the second nozzle.

Abstract: An immersion exposure apparatus for exposing a substrate via liquid is disclosed. The apparatus comprises a projection optical system configured to project an image of a pattern of a reticle onto the substrate, a first recovery nozzle arranged at a periphery of a final optical element of the projection optical system and configured to recover liquid from a gap between the final optical element and the substrate, and a detector configured to detect a foreign particle in the liquid recovered via the first recovery nozzle.

Abstract: A method of detecting focus information about an image projecting optical system includes performing mark projection through the optical system, and, based on illumination lights having different chief ray incidence directions, the mark projection is carried out so that mark images formed by the illumination lights, respectively, are superposed one upon another approximately upon an imaging plane, and detecting focus information about the optical system on the basis of information related to a deviation between the mark images superposed.

Abstract: Disclosed is a method of detecting focus information about an image projecting optical system, in which mark projection is made through the optical system and based on illumination lights having different chief ray incidence directions, the mark projection being carried out so that mark images formed by the illumination lights, respectively, are superposed one upon another approximately upon an imaging plane, and focus information about the optical system is detected on the basis of information related to a deviation between the mark images superposed.