Abstract: According to one embodiment, a bonding apparatus includes first and second stages, first and second measuring devices, a stress generator, and a controller. The controller generates a focus map for each deformation amount of the first stage based on a deformation amount of the first stage deformed by the stress generator and the shape of the first substrate held by the deformed first stage. In the alignment processing of the first substrate, when causing the first measuring device to measure an alignment mark arranged on the first substrate held by the first stage, the controller uses a focus setting based on the focus map corresponding to the deformation amount applied to the first stage.

Abstract: An exposure apparatus according to an embodiment is configured to implement an exposure process for exposing a substrate to light. The exposure apparatus includes a stage, a storage device, and a controller. The stage is configured to hold the substrate. The storage device is configured to store a plurality of correction maps each having an alignment correction value that differs from each other. The controller is configured to control in the exposure process an exposure position relative to the substrate by selecting a correction map from the correction maps based on measurement results of a plurality of alignment marks arranged on the substrate or an amount of warpage of the substrate and moving the stage based on the selected correction map.

Abstract: An apparatus includes a first and second stages. The first and second stages respectively hold a first and second substrates. The second stage being opposed to the first stage. A stress application portion applies a stress to the first substrate based on a first magnification value. A calculator calculates the first magnification value based on a flatness of the first substrate and a first equation. The first equation represents a relation between flatness of a third substrate, a second magnification value, and an amount of pattern misalignment between the third substrate and a fourth substrate bonded to the third substrate. A controller controls the stress application portion to apply a stress to the first substrate on the first stage based on the first magnification value while the first and second substrates are bonded to each other.

Abstract: According to one embodiment, an exposure device includes a stage, a measurement device, and a control device. For exposing a substrate, the control device calculates a first coefficient corresponding to a magnification positional misalignment in a first direction and a second coefficient corresponding to a magnification positional misalignment in a second direction based on measurement of at least three alignment marks. The control device can use the first coefficient to correct the magnification positional misalignment in the first direction and a third coefficient set based on the first correction coefficient to correct the magnification positional misalignment in the second direction. The control device can use a fourth coefficient set based on the second coefficient to correct the magnification positional misalignment in the first direction and the second coefficient to correct the magnification positional misalignment in the second direction.

Abstract: A bonding apparatus according to an embodiment includes a first chuck, a second chuck, and a pushpin arranged in a center portion of the second chuck. The first chuck includes a first area and a second area in a plane view. The first chuck includes a first rib arranged to divide the first area and the second area from each other in the plane view. The first area includes an area that overlaps the pushpin in the plane view. The second area encircles an outer perimeter of the first area in the plane view. The first chuck has a plurality of pins arranged at intervals in the second area, and has no pin in the area of the first area that overlaps the pushpin in the plane view.

Abstract: A laser processing apparatus includes a light source which outputs a laser light, and a waveform control unit which controls a pulse waveform of the laser light irradiating the workpiece, in which the pulse waveform of the laser light controlled by the waveform control unit includes a main pulse and a foot pulse temporally preceding the main pulse, and a peak intensity of the foot pulse is smaller than a peak intensity of the main pulse, and a peak position of the main pulse is positioned in a retention time period of plasma generated due to an incidence of the foot pulse on the workpiece.

Abstract: An apparatus includes a first and second stages. The first and second stages respectively hold a first and second substrates. The second stage being opposed to the first stage. A stress application portion applies a stress to the first substrate based on a first magnification value. A calculator calculates the first magnification value based on a flatness of the first substrate and a first equation. The first equation represents a relation between flatness of a third substrate, a second magnification value, and an amount of pattern misalignment between the third substrate and a fourth substrate bonded to the third substrate. A controller controls the stress application portion to apply a stress to the first substrate on the first stage based on the first magnification value while the first and second substrates are bonded to each other.

Abstract: An engine control device is provided, which includes an oxidation catalyst provided in an exhaust passage to oxidize unburned fuel within exhaust gas, a NOx catalyst provided integrally with or downstream of the oxidation catalyst, a PM filter provided in the exhaust passage downstream of the oxidation catalyst to capture fine particulate matter within the exhaust gas, a fuel injector, and a controller. When the particulate matter is accumulated by a given amount, the controller starts a PM filter regeneration control to remove the particulate matter, and after this control is started and when the accumulation amount decreases by a given amount, the controller starts a NOx catalyst regeneration control to switch between a first state in which an air-fuel ratio of the exhaust gas is a stoichiometric air-fuel ratio or less and a second state in which the air-fuel ratio is higher than the stoichiometric air-fuel ratio.

Abstract: According to an embodiment, focus sensitivity information in which focus sensitivity expressing a relation between an aberration correction value set in an exposure device and a best focus when a pattern is formed on a first substrate by exposure of the exposure device using the aberration correction value, and the pattern are correlated is input. Moreover, on the basis of the focus sensitivity information and a surface height difference of a second substrate, the aberration correction value in which best focuses for a pattern group to be formed on the second substrate by exposure satisfy a first condition is calculated. In addition, the second substrate is exposed by the exposure device using the aberration correction value satisfying the first condition.

Abstract: An engine control device is provided, which includes an oxidation catalyst provided in an exhaust passage to oxidize unburned fuel within exhaust gas, a NOx catalyst provided integrally with or downstream of the oxidation catalyst, a PM filter provided in the exhaust passage downstream of the oxidation catalyst to capture fine particulate matter within the exhaust gas, a fuel injector, and a controller. When the particulate matter is accumulated by a given amount, the controller starts a PM filter regeneration control to remove the particulate matter, and after this control is started and when the accumulation amount decreases by a given amount, the controller starts a NOx catalyst regeneration control to switch between a first state in which an air-fuel ratio of the exhaust gas is a stoichiometric air-fuel ratio or less and a second state in which the air-fuel ratio is higher than the stoichiometric air-fuel ratio.

Abstract: A laser processing apparatus includes a light source which outputs a laser light, and a waveform control unit which controls a pulse waveform of the laser light irradiating the workpiece, in which the pulse waveform of the laser light controlled by the waveform control unit includes a main pulse and a foot pulse temporally preceding the main pulse, and a peak intensity of the foot pulse is smaller than a peak intensity of the main pulse, and a peak position of the main pulse is positioned in a retention time period of plasma generated due to an incidence of the foot pulse on the workpiece.

Abstract: According to an embodiment, focus sensitivity information in which focus sensitivity expressing a relation between an aberration correction value set in an exposure device and a best focus when a pattern is formed on a first substrate by exposure of the exposure device using the aberration correction value, and the pattern are correlated is input. Moreover, on the basis of the focus sensitivity information and a surface height difference of a second substrate, the aberration correction value in which best focuses for a pattern group to be formed on the second substrate by exposure satisfy a first condition is calculated. In addition, the second substrate is exposed by the exposure device using the aberration correction value satisfying the first condition.

Abstract: In an imprinting apparatus according to one embodiment, rear surfaces of first and second templates are suctioned. A correction information calculating device calculates a second response coefficient of the second template out of first response coefficients based on a flatness relational expression and flatness of the second template. The first response coefficients are actual amounts of positional slippage of the first template from a first input adjustment value. The flatness relational expression indicates a relationship between flatness of the first template and the first response coefficients. A shape and a size of the second template are adjusted using the second response coefficient.

Abstract: Provided is a system where a composite catalyst into which an LNT catalyst and an oxidation catalyst are combined, a catalyzed particulate filter, an injector configured to inject a urea water solution into an exhaust gas passage, and an SCR catalyst are arranged in this order in an upstream-to-downstream direction of the flow of the exhaust gas.

Abstract: In an imprinting apparatus according to one embodiment, rear surfaces of first and second templates are suctioned. A correction information calculating device calculates a second response coefficient of the second template out of first response coefficients based on a flatness relational expression and flatness of the second template. The first response coefficients are actual amounts of positional slippage of the first template from a first input adjustment value. The flatness relational expression indicates a relationship between flatness of the first template and the first response coefficients. A shape and a size of the second template are adjusted using the second response coefficient.

Abstract: Provided is a system where a composite catalyst into which an LNT catalyst and an oxidation catalyst are combined, a catalyzed particulate filter, an injector configured to inject a urea water solution into an exhaust gas passage, and an SCR catalyst are arranged in this order in an upstream-to-downstream direction of the flow of the exhaust gas.