Patents by Inventor Yoshio Seqi

Yoshio Seqi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of cleaning a film deposition apparatus, method of dry etching a film deposition apparatus, and an article production method including a process based on the cleaning or dry etching method
    Patent number: 6453913
    Abstract: A method for performing a cleaning process uses a cleaning gas and high-frequency power upon a film deposition apparatus for depositing a film on a substrate placed in a reactor chamber which can be evacuated to a low pressure. Supplying of high-frequency power is temporarily stopped in the middle of the cleaning process, and the cleaning process is restarted by again supplying high-frequency power. This method is capable of effectively removing by-products from the inside of a reactor chamber and makes it possible to form a high-quality deposition film, in particular, a high-quality electrophotographic photosensitive drum.
    Type: Grant
    Filed: April 20, 2001
    Date of Patent: September 24, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Katagiri, Yoshio Seqi, Hideaki Matsuoka, Koji Hitsuishi, Tetsuya Karaki
  • Method of cleaning a film deposition apparatus, method of dry etching a film deposition apparatus, and an article production method including a process based on the cleaning or dry etching method
    Publication number: 20010054430
    Abstract: A method for performing a cleaning process uses a cleaning gas and high-frequency power upon a film deposition apparatus for depositing a film on a substrate placed in a reactor chamber which can be evacuated to a low pressure. Supplying of high-frequency power is temporarily stopped in the middle of the cleaning process, and the cleaning process is restarted by again supplying high-frequency power. This method is capable of effectively removing by-products from the inside of a reactor chamber and makes it possible to form a high-quality deposition film, in particular, a high-quality electrophotographic photosensitive drum.
    Type: Application
    Filed: April 20, 2001
    Publication date: December 27, 2001
    Inventors: Hiroyuki Katagiri, Yoshio Seqi, Hideaki Matsuoka, Koji Hitsuishi, Tetsuya Karaki