Abstract: A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein an outer edge of light-shielding member defines four sides having a shape in which a center of each side bulges outward with respect to a rectangle surrounding the outer edge of the pattern surface in the plan view, and wherein the shape of each side bulges outwardly in a stepwise manner from the ends of each side to the center of each side.

Abstract: The present invention provides a processing apparatus comprising: a generator configured to generate, based on image data of a measurement target, position information of the measurement target in a first direction; and a determinator configured to determine, based on a feature quantity of the image data related to a second direction different from the first direction, confidence of the position information of the measurement target generated by the generator.

Abstract: A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein the light-shielding member is disposed at least in an entire region within a depressed portion of an outer edge of the jigsaw shape.

Abstract: A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.

Abstract: A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.

Abstract: Disclosed is a method of producing a block mask, which is employed in an electron-beam lithography apparatus, with high precision irrespective of the size of openings. The electron-beam lithography apparatus is of a type that produces a unit pattern at a time by transmitting an electron beam through openings selected from among a plurality of kinds of openings of a block mask, links the unit pattern with a previous one, and repeats this process to delineate a desired pattern. The method consists of four steps. At the first step, a resist is applied to the surface of a substrate of a block mask. At the next step, the resist is exposed to delineate patterns of a plurality of kinds of openings. At the next step, the exposed resist is developed. At the next step, the substrate of the block mask is etched.