Patents by Inventor Yoshiro Ohta

Yoshiro Ohta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8206573
    Abstract: Provided is an electrode for electrolysis with excellent corrosion resistance and durability which can be used sustainably in the production of a high-purity quaternary ammonium hydroxide by the electrolysis of a quaternary ammonium inorganic acid salt in an electrolytic cell partitioned by a cation exchange membrane on a commercial scale with reduced electric power consumption at low cost. The electrode for electrolysis is useful for the production of a quaternary ammonium hydroxide by the electrolysis of a quaternary ammonium inorganic acid salt in an electrolytic cell partitioned by a cation exchange membrane and comprises an electrode base material of an electrically conductive metal, an electrode active layer containing an electrode active material covering the electrode base material, and an intermediate layer of a mixed oxide of an oxide of at least one kind of metal selected from In, Ir, Ta, Ti, Ru, and Nb and an oxide of Sn disposed between the electrode base material and the electrode active layer.
    Type: Grant
    Filed: September 8, 2005
    Date of Patent: June 26, 2012
    Assignee: Tama Chemicals Co., Ltd.
    Inventors: Yoshiro Ohta, Toshitsura Cho
  • Publication number: 20080035491
    Abstract: Provided is an electrode for electrolysis with excellent corrosion resistance and durability which can be used sustainably in the production of a high-purity quaternary ammonium hydroxide by the electrolysis of a quaternary ammonium inorganic acid salt in an electrolytic cell partitioned by a cation exchange membrane on a commercial scale with reduced electric power consumption at low cost. The electrode for electrolysis is useful for the production of a quaternary ammonium hydroxide by the electrolysis of a quaternary ammonium inorganic acid salt in an electrolytic cell partitioned by a cation exchange membrane and comprises an electrode base material of an electrically conductive metal, an electrode active layer containing an electrode active material covering the electrode base material, and an intermediate layer of a mixed oxide of an oxide of at least one kind of metal selected from In, Ir, Ta, Ti, Ru, and Nb and an oxide of Sn disposed between the electrode base material and the electrode active layer.
    Type: Application
    Filed: September 8, 2005
    Publication date: February 14, 2008
    Applicant: TAMA CHEMICALS CO., LTD.
    Inventors: Yoshiro Ohta, Toshitsura Cho
  • Patent number: 5783609
    Abstract: A process which comprises reacting a high molecular weight polyorganosiloxane or a composition containing the same with an alkoxysilane and/or a partially hydrolyzed condensate thereof at a temperature of lower than 300.degree. C. in the presence of an alcoholate compound and recovering the resulting organoalkoxysilane and, in addition thereto, at least one of a distillable polyorganosiloxane low molecular weight compound, a non-volatile liquid polyorganosiloxane and a silica; and a process which comprises reacting a high molecular weight polyorganosiloxane or a composition containing the same with an alcoholate compound at a temperature of 50.degree. to 150.degree. C. in an anhydrous state and recovering the resulting distillable polyorganosiloxane low molecular weight compound and, in addition thereto, at least one of an organoalkoxysilane and a non-volatile liquid polyorganosiloxane.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: July 21, 1998
    Assignees: Tama Chemicals Co., Ltd., Toshiba Silicone Co., Ltd.
    Inventors: Tsurahide Cho, Yoshiro Ohta, Toshitsura Cho, Tohru Yamashita, Nobuaki Ohkawa, Makoto Nishida
  • Patent number: 5611848
    Abstract: This invention provides a process for preparing a refractory molded article comprising the steps of (a) forming a molded article matrix from an aggregate and the first binder, (b) impregnating the molded article matrix formed in step (a) with the second binder consisting of an alcoholic solution of one kind or two or more kinds of metal alkoxides selected from alkoxides of metals of Group 4A or Group 4B (excepting carbon) and Group 3A or Group 3B of the periodic table and their partial hydrolysates and an alkaline compound of alkali metal or alkaline earth metal (one kind or a mixture of two or more kinds selected from alkoxides, hydroxides and salts of the metal) and (c) drying and firing the molded article matrix at high temperature and also provides a binder for the preparation of such refractory molded article.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: March 18, 1997
    Assignees: Cadic Corporation, KSP Inc., Tama Chemicals Co., Ltd.
    Inventors: Nobuyoshi Sasaki, Tetsuya Yokokawa, Yoshikazu Hashimoto, Yoshiro Ohta, Hideo Sekiguchi
  • Patent number: 5569320
    Abstract: This invention provides a process for preparing a refractory molded article comprising the steps of (a) forming a molded article matrix from an aggregate and the first binder, (b) impregnating the molded article matrix formed in step (a) with the second binder consisting of an alcoholic solution of one kind or two or more kinds of metal alkoxides selected from alkoxides of metals of Group 4A or Group 4B (excepting carbon) and Group 3A or Group 3B of the periodic table and their partial hydrolysates and an alkaline compound of alkali metal or alkaline earth metal (one kind or a mixture of two or more kinds selected from alkoxides, hydroxides and salts of the metal) and (c) drying and firing the molded article matrix at high temperature and also provides a binder for the preparation of such refractory molded article.
    Type: Grant
    Filed: December 28, 1994
    Date of Patent: October 29, 1996
    Assignees: Cadic Corporation, KSP Inc., Tama Chemicals Co., Ltd.
    Inventors: Nobuyoshi Sasaki, Tetsuya Yokokawa, Yoshikazu Hashimoto, Yoshiro Ohta, Hideo Sekiguchi
  • Patent number: 5103034
    Abstract: This invention relates to a process for preparing alkoxysilanes of the general formula (R.sup.2) .sub.a SiH(OR.sup.1).sub.b in which R.sup.1 is a lower alkyl group with 1 to 6 carbon atoms, R.sup.2 is an aliphatic or aromatic hydrocarbon radical with 1 to 8 carbon atoms, a is 0 or 1, and b is 2 or 3 by the reaction of metallic silicon, an alcohol, and an acetal and/or an orthocarboxylic acid ester in the presence of a copper catalyst and provides a novel process for preparing directly and advantageously alkoxysilanes having one hydrogen atom linked to the silicon atom, particularly alkyldialkoxysilanes and trialkoxysilanes.
    Type: Grant
    Filed: March 19, 1991
    Date of Patent: April 7, 1992
    Assignee: Tama Chemicals Co., Ltd.
    Inventors: Tsurahide Cho, Yoshiro Ohta, Osamu Yagi, Ryuichi Oyama
  • Patent number: 4931578
    Abstract: This invention is concerned with an improved process for producing trialkoxysilanes comprising (i) an activation step where elemental silicon and a copper catalyst are activated, (ii) a reaction step where an alcohol is contacted with elemental silicon and the copper catalyst to allow it to react with the elemental silicon and (iii) a purification step where reaction product obtained is separated and/or refined, which is characterized in that a halide is introduced into the reaction system and/or mixture in one or more of the above steps (i) to (iii). With the introduction of a halide, the lowering in the selectivity of trialkoxysilanes can be prevented, and the percentage of elemental silicon reacted can be increased. In addition, the trialkoxysilanes contained in the reaction product can be stabilized.
    Type: Grant
    Filed: February 22, 1988
    Date of Patent: June 5, 1990
    Inventors: Yoshiro Ohta, Mamoru Yoshizako
  • Patent number: D244604
    Type: Grant
    Filed: December 31, 1975
    Date of Patent: June 7, 1977
    Assignee: Esquire Trading Co., Ltd.
    Inventor: Yoshiro Ohta