Patents by Inventor Yoshiro Shiokawa

Yoshiro Shiokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020053636
    Abstract: An ionization apparatus and ionization method, wherein an ion trap type structural unit is used as the ion source and an ion emitter for emitting metal ions is provided inside or outside the ion source, metal ions are attached to ingredients of a sample gas to ionize the sample gas, a separation parameter is changed to separate ions relating to a target substance for analysis and the metal ions, the metal ions are trapped and accumulated inside the ion source, and the ions relating to a target substance are ejected to a mass spectrometry unit. Due to this configuration, in ion mass spectrometry, it is possible to accurately separate the ions desired to be analyzed and the ions desired to be trapped by a simple configuration and relatively low resolution and possible to improve the sensitivity of analysis.
    Type: Application
    Filed: November 5, 2001
    Publication date: May 9, 2002
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Yoshiki Hirano, Toshihiro Fujii
  • Publication number: 20020036263
    Abstract: A mass spectrometry apparatus is provided with a mass spectrometry mechanism for analyzing the mass of ionized detected gas. The mass spectrometry apparatus is further provided with two ion sources, that is, a first ion source for attaching positive charge metal ions to cause ionization, and a second ion source for causing electrons to impact to cause ionization. Based on the configuration, it becomes possible to simultaneously or separately measure the molecular weight and analyze the molecular structure of the detected gas with a high sensitivity. The second ion source is positioned between the first ion source and the mass spectrometry mechanism and the detected gas is introduced into the first ion source. According to the above mass spectrometry apparatus, it is possible to measure the accurate molecular weight of the detected gas with a sufficient sensitivity and to simultaneously analyze the molecular structure with a sufficient sensitivity.
    Type: Application
    Filed: March 23, 2001
    Publication date: March 28, 2002
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
  • Publication number: 20020027196
    Abstract: A Q-pole type mass spectrometer which can be used under a high-pressure atmosphere of more than 0.1 Pa is provided. The said Q-pole type mass spectrometer can analyze mass of gas molecule continuously, and can separate mass properly even if ion is injected at high speed in order to reduce an influence of an end electric field near an end face (fringing) of the Q-pole.
    Type: Application
    Filed: April 3, 2001
    Publication date: March 7, 2002
    Inventor: Yoshiro Shiokawa
  • Publication number: 20020020813
    Abstract: Metal ions are attached to a sample gas in an ionization chamber to produce ions of the sample gas. The ions of the sample gas pass through a mass spectrometer formed by an electromagnetic field for separation by mass. The mass separated ions of the sample gas are detected and measured by a detector as an ion current. Further, a metal ion emitter for emitting metal ions is arranged at the upstream side of a region controlled to a reduced pressure atmosphere where the flow of gas becomes viscous, a sample gas inflow part for introducing the sample gas to the downstream side where the metal ions are transported, and the sample gas ionized by attachment of the metal ions passes through the opening of the aperture plate and transported to the mass spectrometer. A second gas inflow part is arranged at the upstream side of the metal ion producing region. A second gas supplied by the second inflow part flows through the metal ion producing region and sample gas ionization region.
    Type: Application
    Filed: August 8, 2001
    Publication date: February 21, 2002
    Applicant: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Publication number: 20010048074
    Abstract: An apparatus for ion attachment mass spectrometry provided with a reaction chamber for causing positively charged metal ions to attach to a gas to be detected; a mass spectrometer for mass separation and detection of the detection gas; an analysis chamber in which the mass spectrometer is placed; differential evacuation chambers for connecting the reaction chamber and analysis chamber; a data processor for receiving and processing the mass signal from the mass spectrometer; and vacuum gauges for measuring the total pressure of the reduced pressure atmosphere of the reduced pressure atmosphere reaction chamber, a differential evacuation chamber, and an analysis chamber. The total pressure signal from the vacuum gauge measured during the measurement is input to one of the data processor, introduction mechanism, and evacuation mechanism.
    Type: Application
    Filed: June 1, 2001
    Publication date: December 6, 2001
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Tohru Sasaki, Toshihiro Fujii
  • Publication number: 20010044033
    Abstract: A method for the surface treatment of vacuum materials reduces the H2O sticking probability on the surface of the vacuum material. The H2O sticking probability is reduced by selectively depositing silicon oxide, for example, and covering the regions which are in an active state on the surface of the vacuum material, and by setting the coverage to less than 100% of the state where film formation is achieved. If the abovementioned coverage is within the range from 40 to 80%, then it is possible to reduce the H2O sticking probability to a minimum.
    Type: Application
    Filed: June 22, 2001
    Publication date: November 22, 2001
    Inventor: Yoshiro Shiokawa
  • Patent number: 6316052
    Abstract: A method for the surface treatment of vacuum materials reduces the H2O sticking probability on the surface of the vacuum material. The H2O sticking probability is reduced by selectively depositing silicon oxide, for example, and covering the regions which are in an active state on the surface of the vacuum material, and by setting the coverage to less than 100% of the state where film formation is achieved. If the abovementioned coverage is within the range from 40 to 80%, then it is possible to reduce the H2O sticking probability to a minimum.
    Type: Grant
    Filed: December 14, 1999
    Date of Patent: November 13, 2001
    Assignee: Anelva Corporation
    Inventor: Yoshiro Shiokawa
  • Publication number: 20010023922
    Abstract: An ion source of an ion attachment mass spectrometry apparatus has an emitter and a voltage-impressed portion for impressing a bias voltage to the emitter. In the ion source, the emitter is heated to emit positive charge metal ions that are attached to a detected gas to ionize it. By changing the material of the emitter, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced. By shortening the distance between the reference-voltage-impressed portion and the ion emission point, the electrical resistance between the ion emission point of the emitter and the reference-voltage-impressed portion of the voltage-impressed portion is reduced to not more than 1010&OHgr;. It is also possible to form a thin film emitter on the surface of the reference-voltage-impressed portion.
    Type: Application
    Filed: March 23, 2001
    Publication date: September 27, 2001
    Applicant: ANELVA CORPORATION
    Inventors: Yoshiro Shiokawa, Megumi Nakamura, Toshihiro Fujii
  • Publication number: 20010004102
    Abstract: A mass spectrometry apparatus is provided with an emitter for emitting metal ions, a reaction chamber where the detected gas is introduced and ionized by the metal ions, an aperture for guiding molecules of the ionized detected gas, and a mass spectrometer for measuring the guided molecules. The metal ions emitted from the emitter are caused to fly to the reaction chamber to ionize said detected gas. The detected gas is a halide compound. Further provision is made of a sample gas source for feeding a halide compound to the reaction chamber and an N2 gas source for feeding to the reaction chamber a gas (N2 etc.) to which the metal ions attach less easily than to the halide compound. It is therefore made possible to apply cation attachment of the Fujii system to mass spectrometry of a halide compound and enable precise measurement of fluoride compounds etc. having a large impact on global warming.
    Type: Application
    Filed: December 15, 2000
    Publication date: June 21, 2001
    Inventors: Yoshiro Shiokawa, Toshihiro Fujii
  • Patent number: 5916388
    Abstract: The invention includes an apparatus and associated method of increasing the pump-out efficiency of H.sub.2 O by, for example, reducing the staying time or the probability of sticking of H.sub.2 O or analogous molecules on a stainless steel surface. The method for the vacuum treatment of stainless steel surfaces includes an annealing treatment carried out under conditions of at least 500.degree. C. while maintaining an H.sub.2 O partial pressure of not more than 1.times.10.sup.-5 torr, or at least 400.degree. C. while maintaining an H.sub.2 partial pressure of at least ten times the H.sub.2 O partial pressure, or at least 300.degree. C. while maintaining an H.sub.2 partial pressure at least the same as the H.sub.2 O partial pressure and activating the H.sub.2. Furthermore, during the interval after the annealing treatment and before use, the surface is stored in an environment such that the product of the relative humidity and the number of days is not more than 500.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: June 29, 1999
    Assignee: Anelva Corporation
    Inventor: Yoshiro Shiokawa
  • Patent number: 4785173
    Abstract: An element analyzing apparatus includes a secondary ion excitation source such as an ion gun, an ion optical system such as an imaging type energy filter and a mass spectrometer. A quadrupole mass spectrometer is used as the spectrometer. The quadrupole mass spectrometer has a construction in relation to (L.times.F).sup.2 >0.2, where L (meter) is a length of a quadrupole of the spectrometer and F (MHz) is frequency. Secondary ions emitted from a sample are accelerated to cause them to pass through the ion optical system and the quadrupole mass spectrometer under a condition with an energy more than a secondary ion energy constant in addition to an energy of the secondary ions emitting from the sample. The first mentioned energy may be ten times or twenty times the secondary ion energy constant. The element analyzing apparatus is capable of effecting the elementary analysis with high sensitivity and accuracy without lowering space resolution.
    Type: Grant
    Filed: March 9, 1987
    Date of Patent: November 15, 1988
    Assignee: Anelva Corporation
    Inventor: Yoshiro Shiokawa
  • Patent number: 4752685
    Abstract: A photoelectron spectrometer includes a target, an electron gun, a crystal plate, a spectrum-analyzer and a detector. The target and the sample to be inspected are aligned with a reference line. The electron gun is positioned on the coaxially line with respect to the reference axis. The crystal plate is arranged in a circular region with respect to the reference axis, so that X-ray beams emitted from the target are omnidirectionally irradiated to the sample surface in an electron shower form. The sensitivity of the photoelectron spectrometer is increased.
    Type: Grant
    Filed: June 9, 1986
    Date of Patent: June 21, 1988
    Assignee: Anelva Corporation
    Inventors: Yoshiro Shiokawa, Kiyoshi Hoshino
  • Patent number: 4652753
    Abstract: In a mass spectrometer comprising an ion gun for radiating an ion beam onto a surface of an object to make the surface emit secondary ions, a detector for the secondary ions, and a directing member for directing the secondary ions to the detector, a specific energy bandwidth is defined in an energy distribution of the secondary ions in consideration of a peak of the energy distribution. An analyzable energy range is expanded to at least twice the specific energy bandwidth by the use of an expanding member coupled to the directing member. The expanding member may be used to expand a transmissible bandwidth of an energy filter included in the directing member by raising a resolution and a center transmission energy. The expanding member may be used to raise a maximum analyzable energy of a quadrupole mass filter included in the mass filter. Specifically, the expanding member may be implemented by changing a length of each electrode member of the mass filter and/or a frequency of an a.c.
    Type: Grant
    Filed: December 21, 1984
    Date of Patent: March 24, 1987
    Assignee: Anelva Corporation
    Inventor: Yoshiro Shiokawa
  • Patent number: 4639597
    Abstract: In an Auger electron spectrometer for use in analyzing a surface of an object by the use of Auger electrons resulting from impingement of an electron beam, an electron gun comprises an electron beam source for generating the electron beam and an electron lens system for guiding the electron beam towards the surface. The electron lens system comprises a combination of a condenser lens and a permanent magnet member nearer to the surface than the condenser lens. The permanent magnet member may comprise either a plurality of permanent magnet pieces radially and azimuthally spaced apart from one another or a single permanent magnet piece. An ion gun may be disposed in the vicinity of the electron gun to generate an ion beam oblique to the electron beam and substantially concurrent with the electron beam on the surface. Magnetic pole pieces may be attached to each permanent magnet piece and bypassed to control a magnetic field generated by each permanent magnet piece.
    Type: Grant
    Filed: October 23, 1984
    Date of Patent: January 27, 1987
    Assignee: Anelva Corporation
    Inventor: Yoshiro Shiokawa
  • Patent number: 4562352
    Abstract: In an analyzing apparatus for use in analyzing a surface of an object by the use of Auger electrons resulting from impingement of an electron beam, outer and inner cylindrical electrode members are placed to define outer and inner rooms, respectively, and have a common cylindrical axis. The outer and the inner rooms have first outer and first inner ends adjacent to the object, respectively, and second outer and second inner ends remote from the object, respectively. An electron gun is operable to radiate the electron beam and is entered at least partly in the outer room with an electron gun axis noncoincident with the common cylinder axis. The electron gun axis and the common cylinder axis form a predetermined angle. An ion gun is also entered at least partly in the outer room with an ion gun axis noncoincident with the electron gun axis. Various kinds of detectors may be placed in the inner room.
    Type: Grant
    Filed: August 9, 1984
    Date of Patent: December 31, 1985
    Assignee: Anelva Corporation
    Inventor: Yoshiro Shiokawa