Abstract: Provided is a feature for highly precisely manufacturing a concave diffraction grating that has a uniform diffraction grating pattern. This method for manufacturing a concave diffraction grating includes: preparing a flat diffraction grating that has a lattice groove and that also has an elongated section, a thin-film section, or a low-friction section formed outside of a region for forming a mold for the concave diffraction grating; mounting the flat diffraction grating on a convex substrate and acquiring the mold for the concave diffraction grating; and transferring the lattice groove in the mold to the concave substrate.

Abstract: The present invention provides a concave diffraction grating and an optical device using the concave diffraction grating, the concave diffraction grating being capable of preventing deformation of a reflection film due to the influence of temperature, and preventing deterioration in optical characteristic due to temperature. This concave diffraction grating is provided with: a reflection film (22) having a plurality of grating grooves (21); a holding film (25) comprising metal and having one surface on which the reflection film (22) is provided; a concave substrate (24) having a concave surface (24a); and an affixing layer (23) provided between the concave surface (24a) and the other surface of the holding film (25), and affixing the holding film (25) and the reflection film (22) to the concave substrate (24).

Abstract: An objective of the present invention is to improve a diffraction grating. A molding member including a substrate and a resist pattern having a surface shape including grooves is prepared. The grooves include bottom portions BP1 and top portions TP1 that are alternately repeated in an X direction, and that each extend in a Y direction. The bottom portions adjacent to each other have an interval that changes stepwise. Next, a metal film is formed on a surface of the resist pattern to cover the grooves, and then the metal film is peeled off from the molding member. As a result, the metal film is formed to have a surface shape reverse to the surface shape of the resist pattern is formed. Top portions TP2 and bottom portions BP2 of the metal film correspond to bottom portions BP1 and top portions TP1 of the resist pattern respectively.

Abstract: Easy and accurate mating of a groove interval of a groove pattern of a diffraction grating with a position on a convex fixing substrate is enabled. For this purpose, a concave diffraction grating is fabricated by: transferring a groove pattern formed on a plane diffraction grating and having unequal groove intervals onto a metal thin film; forming a first alignment mark on a convex surface of a fixing substrate having the convex surface to fix the metal thin film; mating a second alignment mark formed on an adhesive surface of the metal thin film with the first alignment mark to perform alignment; bonding the adhesive surface of the metal thin film and the convex surface of the fixing substrate to each other to fabricate a master; and transferring a groove pattern of a metal thin film of the master.

Abstract: The present invention provides a concave diffraction grating capable of improved diffraction efficiency by suppressing spherical aberration. The concave diffraction grating is a concave diffraction grating 2 for dispersing and focusing light and comprises sawtooth grating grooves 21 on a concave substrate 24, with the sawtooth grating grooves 21 being unequally spaced. The concave diffraction grating 2 for dispersing and focusing light is formed by preparing a planar diffraction grating with a sawtooth shape which is formed on a planar substrate by photo-lithography and etching or machining and which forms unequally spaced grating grooves 21, deforming and mounting the planar diffraction grating along a fixed convex substrate to obtain a mold of a concave diffraction grating, and transferring the mold of the concave diffraction grating to the surface of a metal or a resin.

Abstract: A spectrophotometer 300 includes a white light source 212, condenser lenses 242a, 242b that collect light emitted from the white light source 212, a slit 245 that diffracts the light collected by the condenser lenses 242a, 242b, a concave diffraction grating 246 that splits the light having passed through the slit 245, and a multi-wavelength detector 248 having a plurality of photodetection elements 304 that detect the light split by the concave diffraction grating 246, and each of the plurality of photodetection elements 304 included in the multi-wavelength detector 248 is arranged at an image position of the concave diffraction grating 246.

Abstract: A method for manufacturing a concave diffraction grating is provided. The method includes the steps of: positioning a flat mold and a concave substrate such that a pressing surface, having a groove pattern of a diffraction grating, of the flat mold faces a concave surface, coated with a resin, of the concave substrate; pressing the pressing surface against the resin coated over the concave surface by pressurizing the flat mold using a fluid; and curing the resin having the groove pattern transferred thereto by being pressed by the pressing surface. This makes it possible to improve load non-uniformity and manufacture a concave diffraction grating with high surface accuracy.

Abstract: The present invention provides a concave diffraction grating capable of improved diffraction efficiency by suppressing spherical aberration. The concave diffraction grating is a concave diffraction grating 2 for dispersing and focusing light and comprises sawtooth grating grooves 21 on a concave substrate 24, with the sawtooth grating grooves 21 being unequally spaced. The concave diffraction grating 2 for dispersing and focusing light is formed by preparing a planar diffraction grating with a sawtooth shape which is formed on a planar substrate by photo-lithography and etching or machining and which forms unequally spaced grating grooves 21, deforming and mounting the planar diffraction grating along a fixed convex substrate to obtain a mold of a concave diffraction grating, and transferring the mold of the concave diffraction grating to the surface of a metal or a resin.

Abstract: Easy and accurate mating of a groove interval of a groove pattern of a diffraction grating with a position on a convex fixing substrate is enabled. For this purpose, a concave diffraction grating is fabricated by: transferring a groove pattern formed on a plane diffraction grating and having unequal groove intervals onto a metal thin film; forming a first alignment mark on a convex surface of a fixing substrate having the convex surface to fix the metal thin film; mating a second alignment mark formed on an adhesive surface of the metal thin film with the first alignment mark to perform alignment; bonding the adhesive surface of the metal thin film and the convex surface of the fixing substrate to each other to fabricate a master; and transferring a groove pattern of a metal thin film of the master.

Abstract: A technique is provided which enables preparation of a curved grating having a desired curvature, by plastically deforming, along a curved substrate, a flat grating prepared by a semiconductor process on a silicon substrate, and which thus prepares a diffraction grating with high accuracy. A silicon flat grating prepared by a semiconductor process is transferred to an amorphous material, and the amorphous material substrate is curved and mounted on a curved fixed substrate, thus providing a curved grating having a crystalline material in which the generation of a dislocation line is restrained.

Abstract: A curved surface diffraction grating fabrication method for fabricating a curved surface diffraction grating having a desired curvature with high accuracy, includes: a step of forming a diffraction grating pattern on a flat-shaped silicon substrate; a step of curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a fixing substrate having a shape with a desired curved surface onto the silicon substrate and of fixing the silicon substrate on which the diffraction grating pattern is formed to the fixing substrate having the shape with the curved surface, to fabricate a curved surface diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved surface diffraction grating cast, to transfer the diffraction grating pattern to the member.

Abstract: A technique is provided which enables preparation of a curved grating having a desired curvature, by plastically deforming, along a curved substrate, a flat grating prepared by a semiconductor process on a silicon substrate, and which thus prepares a diffraction grating with high accuracy. A silicon flat grating prepared by a semiconductor process is transferred to an amorphous material, and the amorphous material substrate is curved and mounted on a curved fixed substrate, thus providing a curved grating having a crystalline material in which the generation of a dislocation line is restrained.

Abstract: A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.

Abstract: In order to exposure interference fringes to photoresist and form a desired irregular pattern, it is necessary to know the cycle of the interference fringes in advance. In order to confirm the cycle of the interference fringes beforehand, conventional techniques include observing the formed irregular pattern with the use of a microscope or measuring a diffraction angle of incident light and repeating processes of exposure, development, and observation (measurement) while slightly changing incident angles of light fluxes for the formation of the interference fringes until a desired cycle is confirmed. These operations take considerable amount of time. The fact that it takes considerable amount of time to confirm the interference fringes has not been considered in the conventional techniques. Observation of a moire generated by a standard sample containing a fluorescent sample that can be repeatedly used and adjustment of the cycle of interference fringes reduce time for the adjustment.

Abstract: A curved surface diffraction grating fabrication method for fabricating a curved surface diffraction grating having a desired curvature with high accuracy, includes: a step of forming a diffraction grating pattern on a flat-shaped silicon substrate; a step of curving the silicon substrate on which the diffraction grating pattern is formed, by pressing, in a heated state, a fixing substrate having a shape with a desired curved surface onto the silicon substrate and of fixing the silicon substrate on which the diffraction grating pattern is formed to the fixing substrate having the shape with the curved surface, to fabricate a curved surface diffraction grating cast; and a step of bringing a member having flexibility into contact with the curved surface diffraction grating cast, to transfer the diffraction grating pattern to the member.

Abstract: In order to exposure interference fringes to photoresist and form a desired irregular pattern, it is necessary to know the cycle of the interference fringes in advance. In order to confirm the cycle of the interference fringes beforehand, conventional techniques include observing the formed irregular pattern with the use of a microscope or measuring a diffraction angle of incident light and repeating processes of exposure, development, and observation (measurement) while slightly changing incident angles of light fluxes for the formation of the interference fringes until a desired cycle is confirmed. These operations take considerable amount of time. The fact that it takes considerable amount of time to confirm the interference fringes has not been considered in the conventional techniques. Observation of a moire generated by a standard sample containing a fluorescent sample that can be repeatedly used and adjustment of the cycle of interference fringes reduce time for the adjustment.

Abstract: A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.

Abstract: The present invention has been made in view of the above, and an object thereof is to provide a manufacturing technique capable of manufacturing a diffraction grating which is suitable for use in a spectrophotometer and has an apex angle of a convex portion of about 90° and can satisfy high diffraction efficiency and a low stray light amount. A method of manufacturing a diffraction grating, the method including: setting an exposure condition such that a sectional shape of a convex portion of a resist on a substrate, which has been formed by exposure, is an asymmetric triangle with respect to an opening portion shape of a mask having an opening portion with a periodic structure and an angle formed by a long side and a short side of the triangle is about 90°; and performing exposure.

Abstract: In a spectrophotometer of the single-beam type, highly stable transmission and absorption spectra can be obtained with a high SNR while drifting is suppressed and for a long time even when the amount of light from the light source is varied over time. The spectrophotometer includes: a light source; a sample cell; a polychromator that generates a transmission spectrum of a sample in the sample cell by dispersing a portion of light from the light source that has passed through the sample into a plurality of spectral components; an image sensor that detects the transmission spectrum of the sample; a light source monitoring photodetector that detects a portion of the light from the light source that has not passed through the sample cell; and an operation unit that corrects the transmission spectrum of the sample by using an output signal from the light source monitoring photodetector.

Abstract: In order to improve spectral measurement accuracy during high-speed wavelength shifting, the appropriate sensitivity of the detection system is maintained by, prior to measurement of a sample, measuring the voltage value, then storing this value into a table, and maintaining the voltage value to be applied to the photodetector, and during measurement of the sample, reading out the maintained voltage value and applying it to the photodetector.