Abstract: This invention provides a resist removing apparatus for removing a resist comprising a deteriorated layer and an undeteriorated layer from a substrate. The apparatus carries out the step of bringing radicals, reduced by subjecting any one of or a mixture of two or more of nitrogen, oxygen, hydrogen, and steam to plasma treatment under a low pressure, into contact with the substrate to remove the resist, and the step of bringing ozone water into contact with the substrate to remove the resist. In the step of removing the resist by radicals, a large part of the undeteriorated layer is allowed to remain by regulating the radical contact time depending upon conditions for the formation of the deteriorated layer on the resist surface. Alternatively, a large part of the undeteriorated layer may be allowed to remain by conducting process control according to the results of analysis of a reactant gas discharged during the removal of the resist.

Abstract: The invention relates to an ozone water production apparatus capable of producing ozone water with a highly versatile and simpler configuration and further producing ozone water having a higher concentration with decomposition by heat suppressed. O2 gas and N2 gas are introduced into an ozonizer (2), and ozone is generated in the ozonizer (2). The generated ozone is mixed with supplied water, and thereafter the mixture is introduced into a circulation pump (4) to dissolve ozone in water. A pipe from the ozonizer (2) is connected to a water pipe connected to the circulation pump (4) using a T-shaped union joint to mix water and the generated ozone gas. Further, the ozone water is heated to a predetermined temperature by a heat exchanger (5a) using hot water as a heat medium.