Patents by Inventor Yoshitaka Hotta

Yoshitaka Hotta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11289621
    Abstract: A method includes preparing a wafer including a substrate and a semiconductor structure, and irradiating an inner portion of the substrate at a predetermined depth in a thickness direction a plurality of times with laser pulses at a first time interval and a predetermined distance interval between irradiations. Each irradiation performed at the first time intervals in the step of irradiating the substrate with laser pulses includes irradiating the substrate at a first focal position in the thickness direction with a first laser pulse having a first pulse-energy; and after irradiating with the first laser pulse, irradiating the substrate with a second laser pulse performed after a second time interval, the second time interval being shorter than the first time interval and being in a range of 3 ps to 900 ps, and the second laser pulse having a second pulse-energy 0.5 to 1.5 times the first pulse-energy.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: March 29, 2022
    Assignees: NICHIA CORPORATION, IMRA AMERICA, INC.
    Inventors: Minoru Yamamoto, Naoto Inoue, Hiroaki Tamemoto, Yoshitaka Hotta, Hideyuki Ohtake
  • Publication number: 20200365758
    Abstract: A method includes preparing a wafer including a substrate and a semiconductor structure, and irradiating an inner portion of the substrate at a predetermined depth in a thickness direction a plurality of times with laser pulses at a first time interval and a predetermined distance interval between irradiations. Each irradiation performed at the first time intervals in the step of irradiating the substrate with laser pulses includes irradiating the substrate at a first focal position in the thickness direction with a first laser pulse having a first pulse-energy; and after irradiating with the first laser pulse, irradiating the substrate with a second laser pulse performed after a second time interval, the second time interval being shorter than the first time interval and being in a range of 3 ps to 900 ps, and the second laser pulse having a second pulse-energy 0.5 to 1.5 times the first pulse-energy.
    Type: Application
    Filed: November 26, 2018
    Publication date: November 19, 2020
    Applicants: NICHIA CORPORATION, IMRA AMERICA, INC.
    Inventors: Minoru YAMAMOTO, Naoto INOUE, Hiroaki TAMEMOTO, Yoshitaka HOTTA, Hideyuki OHTAKE
  • Patent number: 8149677
    Abstract: An optical pickup unit comprises a diffraction grating that divides light into at least three luminous fluxes and condenses the three luminous fluxes to apply at least three focusing spots, independent of each other, onto a signal side of a medium. The diffraction grating is divided into at least four regions, a first region, a second region, a third region, and a fourth region.
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: April 3, 2012
    Assignees: Sanyo Electric Co., Ltd., Sanyo Optec Design Co., Ltd.
    Inventors: Ryoichi Kawasaki, Yoshitaka Hotta
  • Publication number: 20090022032
    Abstract: An optical pickup unit comprises a diffraction grating that divides light into at least three luminous fluxes and condenses the three luminous fluxes to apply at least three focusing spots, independent of each other, onto a signal side of a medium. The diffraction grating is divided into at least four regions, a first region, a second region, a third region, and a fourth region.
    Type: Application
    Filed: October 16, 2006
    Publication date: January 22, 2009
    Applicants: Sanyo Electric Co., Ltd., Sanyo Optec Design Co., Ltd.
    Inventors: Ryouichi Kawasaki, Yoshitaka Hotta