Patents by Inventor Yoshitaka KITAGAWA

Yoshitaka KITAGAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cover for swing member of substrate processing apparatus, swing member of substrate processing apparatus, and substrate processing apparatus
    Patent number: 11626299
    Abstract: A cover for a swing member of a substrate processing apparatus includes an upper surface including a first groove, and a first side edge and a second side edge located respectively at both ends of the upper surface in the short-length direction of the cover, where a bottom portion of the first groove is located lower than the first side edge and the second side edge.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: April 11, 2023
    Assignee: EBARA CORPORATION
    Inventors: Yoshitaka Kitagawa, Hisajiro Nakano, Tomoatsu Ishibashi
  • COVER FOR SWING MEMBER OF SUBSTRATE PROCESSING APPARATUS, SWING MEMBER OF SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING APPARATUS
    Publication number: 20200402820
    Abstract: A cover for a swing member of a substrate processing apparatus includes an upper surface including a first groove, and a first side edge and a second side edge located respectively at both ends of the upper surface in the short-length direction of the cover, where a bottom portion of the first groove is located lower than the first side edge and the second side edge.
    Type: Application
    Filed: June 22, 2020
    Publication date: December 24, 2020
    Inventors: Yoshitaka KITAGAWA, Hisajiro NAKANO, Tomoatsu ISHIBASHI
  • Substrate cleaning apparatus and substrate processing apparatus X
    Patent number: 10361101
    Abstract: A substrate cleaning apparatus for bringing an elongated roll cleaning member into sliding contact with a flat plate type substrate to perform cleaning processing on the substrate includes a roll holder for supporting the roll cleaning member so that the roll cleaning member is rotatable, an elevating mechanism that has a linking member for supporting the roll holder, and moves the roll holder up and down so that the roll cleaning member applies a predetermined roll load to the substrate, a sensor member that is provided to the linking member and measures frictional force between the roll cleaning member and the substrate, and a controller for performing feedback control on the frictional force between the roll cleaning member and the substrate based on a measured value of the sensor member.
    Type: Grant
    Filed: September 26, 2017
    Date of Patent: July 23, 2019
    Assignee: EBARA CORPORATION
    Inventors: Yoshitaka Kitagawa, Hisajiro Nakano, Junji Kunisawa
  • SUBSTRATE CLEANING APPARATUS AND SUBSTRATE PROCESSING APPARATUS X
    Publication number: 20180090347
    Abstract: A substrate cleaning apparatus for bringing an elongated roll cleaning member into sliding contact with a flat plate type substrate to perform cleaning processing on the substrate includes a roll holder for supporting the roil cleaning member so that the roll cleaning member is rotatable, an elevating mechanism that has a linking member for supporting the roll holder, and moves the roll holder up and down so that the roll cleaning member applies a predetermined roll load to the substrate, a sensor member that is provided to the linking member and measures frictional force between the roll cleaning member and the substrate, and a controller for performing feedback control on the frictional force between the roll cleaning member and the substrate based on a measured value of the sensor member.
    Type: Application
    Filed: September 26, 2017
    Publication date: March 29, 2018
    Inventors: Yoshitaka KITAGAWA, Hisajiro NAKANO, Junji KUNISAWA