Patents by Inventor Yoshitaka Matsuda

Yoshitaka Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230197475
    Abstract: A substrate processing apparatus includes: a substrate holder configured to hold a substrate while being locally superimposed on a back surface of the substrate; a light irradiator configured to irradiate the back surface with light so as to remove an organic substance on the back surface of the substrate; a light shielding member provided at a back side of the substrate while being spaced apart from the back surface so as to prevent the light from being supplied to a front surface of the substrate; and a holding position changing mechanism configured to change a holding position by the substrate holder on the back surface of the substrate so as to irradiate the entire back surface of the substrate with the light.
    Type: Application
    Filed: December 19, 2022
    Publication date: June 22, 2023
    Inventors: Teruhiko KODAMA, Yuzo OHISHI, Yoshitaka MATSUDA
  • Patent number: 11667811
    Abstract: The present invention is a coating composition containing (A) a fluorine-containing copolymer and (B) a polycarbonate diol.
    Type: Grant
    Filed: September 1, 2020
    Date of Patent: June 6, 2023
    Assignee: KANTO DENKA KOGYO CO., LTD.
    Inventors: Yoshimasa Hikobe, Yoshitaka Matsuda
  • Publication number: 20230109353
    Abstract: An object is to provide a fluorine-containing copolymer composition that exhibits long-term stability as well as a fluororesin paint or varnish prepared using the composition. Provided are: a composition comprising a fluorine-containing copolymer synthesized through copolymerization of 0.001 to 50 mol % of particular ethylenically unsaturated organosilicon compound polymerization units relative to 5 to 85 mol % of fluoroolefin polymerization units by a solution polymerization method, a solvent, and an amine compound; a fluororesin paint or varnish prepared using the composition; and a method of producing the fluorine-containing copolymer composition.
    Type: Application
    Filed: February 24, 2021
    Publication date: April 6, 2023
    Inventors: Yoshitaka MATSUDA, Katsuya FUKAE
  • Publication number: 20220282117
    Abstract: The present invention is a coating composition containing (A) a fluorine-containing copolymer and (B) a polycarbonate diol.
    Type: Application
    Filed: September 1, 2020
    Publication date: September 8, 2022
    Inventors: Yoshimasa HIKOBE, Yoshitaka MATSUDA
  • Publication number: 20200157373
    Abstract: The present invention is a paint composition containing (A) a fluorine-containing copolymer, (B) a solvent and (C) a resin particle satisfying the following conditions 1 to 5: condition 1: an average particle size of the resin particle is 0.1 to 50 ?m; condition 2: a refractive index of the resin particle at 20° C. is 0.8 to 1.2 times that of a film composed of the fluorine-containing copolymer (A) at 20° C.; condition 3: a 10% compression strength of the resin particle is 40 MPa or less; condition 4: a compressibility of the resin particle is 20% or more; and condition 5: the resin particle does not suffer from brittle fracture under a load force of 0.1 mN.
    Type: Application
    Filed: March 26, 2018
    Publication date: May 21, 2020
    Applicant: Kanto Denka Kogyo Co., Ltd.
    Inventors: Takumi FUKADA, Yoshitaka MATSUDA, Yoshimasa HIKOBE
  • Publication number: 20200157372
    Abstract: The present invention is a fluorine-containing copolymer including (A) a fluoroolefin in an amount of 15 to 85 mol % of all constituent monomers; (B) a specific organosilicon compound in an amount of 0.001 to 10 mol % of all the constituent monomers; (C) one or more monomers selected from vinyl ethers, vinyl esters, methacrylic esters and acrylic esters, the one or more monomers not having a curing reactive group and having an aliphatic saturated hydrocarbon group with 1 to 20 carbons, a glass transition temperature of a homopolymer of the monomer being lower than 0° C., in an amount of 5 to 40 mol % of all the constituent monomers; and (D) one or more monomers selected from vinyl ethers, vinyl esters, allyl ethers, methacrylic esters and acrylic esters, and having a curing reactive group, in an amount of 1 to 25 mol % of all the constituent monomers, wherein the fluorine-containing copolymer has a glass transition temperature of ?30° C. to 20° C., a number average molecular weight of 2.0×104 to 7.
    Type: Application
    Filed: April 11, 2018
    Publication date: May 21, 2020
    Inventors: Takumi FUKADA, Yoshitaka MATSUDA, Yoshimasa HIKOBE
  • Patent number: 7673805
    Abstract: A mini card adapter for removably holding and fixing a mini card in a secure manner is provided. The mini card adapter holds a mini card having the same thickness as the standard card and outline dimensions smaller than those of the standard card. The mini card comprises a reference wall having the same thickness as the standard card and a bulging section formed on the top surface of the reference wall. In the reference wall, a card pocket for is formed for loading therein the mini card. The land section is formed in a region corresponding to the emboss section of the standard card, and a part of the land section bulges over the card pocket. As a result, an eaves wall for supporting one side of the mini card is formed. The eaves wall has a boss which fits in a hole formed in the mini card. A receiving nail for receiving the periphery of the mini card in corporation with the eaves wall is provided on the peripheral lower surface of the card pocket.
    Type: Grant
    Filed: March 10, 2005
    Date of Patent: March 9, 2010
    Assignees: JCB Co., Ltd, Maxell Seiki, Ltd.
    Inventors: Masayoshi Onishi, Yasuaki Wakizaka, Yoshitaka Matsuda, Koichi Ozaki
  • Publication number: 20070278317
    Abstract: A mini card adapter for removably holding and fixing a mini card in a secure manner is provided. The mini card adapter holds a mini card having the same thickness as the standard card and outline dimensions smaller than those of the standard card. The mini card comprises a reference wall 8 having the same thickness as the standard card and a bulging section 9 formed on the top surface of the reference wall 8. In the reference wall 8, a card pocket 10 for is formed for loading therein the mini card 1. The land section 9 is formed in a region Z corresponding to the emboss section of the standard card, and a part of the land section 9 bulges over the card pocket 10. As a result, an eaves wall 15 for supporting one side of the mini card 1 is formed. The eaves wall 15 has a boss 16 which fits in a hole 3 formed in the mini card 1. A receiving nail 17 for receiving the periphery of the mini card 1 in corporation with the eaves wall 15 is provided on the peripheral lower surface of the card pocket 10.
    Type: Application
    Filed: March 10, 2005
    Publication date: December 6, 2007
    Applicants: JCB CO., LTD., MAXELL SEIKI, LTD.
    Inventors: Masayoshi Onishi, Yasuaki Wakizaka, Yoshitaka Matsuda, Koichi Ozaki
  • Publication number: 20020187423
    Abstract: A substrate coated with a coating solution, for example, a resist solution is heated at a predetermined temperature, thereafter putted in a non-heated state, and then heated at a second predetermined temperature. Alternatively, a heating process in which a substrate coated with a resist solution is heated and a non-heated process in which the substrate is putted in a non-heated state are repeated a plurality of times. The adoption of the above treating methods can prevent the occurrence of transfer which is an index of ununiformity of film thickness of a resist solution and the like and change in line width of a circuit pattern, thus improving yield in substrate treatment.
    Type: Application
    Filed: August 7, 2002
    Publication date: December 12, 2002
    Inventors: Hideyuki Takamori, Kiyohisa Tateyama, Kengo Mizosaki, Noriyuki Anai, Yoshitaka Matsuda
  • Patent number: 6451515
    Abstract: A substrate coated with a coating solution, for example, a resist solution is heated at a predetermined temperature, thereafter putted in a non-heated state, and then heated at a second predetermined temperature. Alternatively, a heating process in which a substrate coated with a resist solution is heated and a non-heated process in which the substrate is putted in a non-heated state are repeated a plurality of times. The adoption of the above treating methods can prevent the occurrence of transfer which is an index of ununiformity of film thickness of a resist solution and the like and change in line width of a circuit pattern, thus improving yield in substrate treatment.
    Type: Grant
    Filed: August 4, 1999
    Date of Patent: September 17, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Hideyuki Takamori, Kiyohisa Tateyama, Kengo Mizosaki, Noriyuki Anai, Yoshitaka Matsuda
  • Patent number: 6398879
    Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: June 4, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Fumio Satou, Mitsuhiro Sakai, Takeshi Tsukamoto, Yoichi Honda, Kiyomitsu Yamaguchi, Kimio Motoda, Yoshitaka Matsuda
  • Publication number: 20010049070
    Abstract: A substrate coated with a coating solution, for example, a resist solution is heated at a predetermined temperature, thereafter putted in a non-heated state, and then heated at a second predetermined temperature. Alternatively, a heating process in which a substrate coated with a resist solution is heated and a non-heated process in which the substrate is putted in a non-heated state are repeated a plurality of times. The adoption of the above treating methods can prevent the occurrence of transfer which is an index of ununiformity of film thickness of a resist solution and the like and change in line width of a circuit pattern, thus improving yield in substrate treatment.
    Type: Application
    Filed: August 4, 1999
    Publication date: December 6, 2001
    Inventors: HIDEYUKI TAKAMORI, KIYOHISA TATEYAMA, KENGO MIZOSAKI, NORIYUKI ANAI, YOSHITAKA MATSUDA
  • Patent number: 6261378
    Abstract: A cleaning unit for cleaning a substrate is disclosed, that comprises a holding mechanism for rotatably and horizontally holding the substrate, a first traveling means for holding both sides of a cleaning mechanism having at least one cleaning member and for moving the cleaning mechanism in such a manner that the first traveling means is kept in parallel with the substrate held by the holding mechanism, and a second traveling means for holding both sides of a processing solution supplying mechanism having supplying mechanisms for supplying different types of processing solution and for moving the cleaning mechanism in such a manner that the second traveling means is kept in parallel with the substrate held by the holding mechanism. Thus, the strength of the cleaning unit according to the present invention is higher than the strength of a conventional cleaning unit that holds an arm on one side thereof.
    Type: Grant
    Filed: March 19, 1999
    Date of Patent: July 17, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Hashimoto, Yoshitaka Matsuda, Norio Uchihira, Masaaki Yoshida, Fumio Satou
  • Patent number: 6159288
    Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: December 12, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Fumio Satou, Mitsuhiro Sakai, Takeshi Tsukamoto, Yoichi Honda, Kiyomitsu Yamaguchi, Kimio Motoda, Yoshitaka Matsuda, Tetsuya Sada, Kiyohisa Tateyama
  • Patent number: 5945161
    Abstract: Disclosed is a processing apparatus comprising holding means, support means, process solution supply means, life means, and rotating means. A substrate to be processed is rotatably held by the holding means. An overhanging portion of the substrate extending over an edge of the holding means is supported by the support means to maintain a front surface of the substrate horizontally flat. A process solution is supplied from the process solution supply means onto the front surface of the substrate held by the holding means and supported by the support means. The substrate held by the holding means is vertically moved by the lift means relative to the support means. Further, the substrate moved upward relative to the support means is rotated by the rotating means.
    Type: Grant
    Filed: December 18, 1997
    Date of Patent: August 31, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Hiroshi Hashimoto, Kiyohisa Tateyama, Kiyomitsu Yamaguchi, Yoshitaka Matsuda, Norio Uchihira, Mitsuhiro Sakai, Fumio Satou
  • Patent number: 5906860
    Abstract: The invention provides an apparatus for treating a substrate with resist, comprising a spin chuck for horizontally holding a substrate, a first motor for variably rotating the spin chuck, a nozzle for applying resist solution onto the upper surface of the substrate held on the spin chuck, a cup having an upper opening through which the substrate is put in or taken out of the cup and a lower opening through which extends the driving shaft of the spin chuck, the cup positioned to surround the substrate held on the spin chuck to receive liquid centrifugally separated from the substrate which is rotated about its axis, a lid to close the upper opening of the cup to define a space around the substrate, a second motor for variably rotating the cup independently of the spin chuck rotation, a liftable cylinder for relatively moving at least one of the spin chuck and cup, which are positioned apart from each other, toward each other to achieve mutual contact, and an O-ring for hermetically sealing the mutual contact p
    Type: Grant
    Filed: April 4, 1997
    Date of Patent: May 25, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Kimio Motoda, Kiyomitsu Yamaguchi, Yoshitaka Matsuda, Tetsu Kawasaki
  • Patent number: 5395003
    Abstract: A covered airtight container capable of preventing a soup from leaking therefrom. The covered airtight container comprises a body made of hard plastics and a cover made of soft plastics wherein the cover has a reverse channel-shaped edge portion piece formed by bending the upper end edge thereof upward and reversing it downward so as to cover the upper end portion of the body. The body has an annular stepped portion to which the cover is retained at the inner peripheral surface of the upper end portion of the peripheral wall. The cover has an annularly projected fin for elastically contacting the edge of said annular stepped portion. The covered airtight container may be formed square shaped with circumferential surfaces of the body and cover being slightly curved shape close to a circle. Particularly, the leaking prevention effect can be conspicuous since the sealing effect or state is assured at the inner and outer surfaces of the peripheral wall of the body.
    Type: Grant
    Filed: January 4, 1994
    Date of Patent: March 7, 1995
    Assignee: Kabushiki Kaisha Maruwa Seisakusho
    Inventor: Yoshitaka Matsuda
  • Patent number: 5338143
    Abstract: This invention relates to a car storage apparatus in a car carrier having a plurality of stages of car storage decks. The car storage apparatus comprises a car loading port installed at the ship side on one of the decks, a loading/unloading berth extending from the loading port into the ship, elevator shafts extending vertically through the car storage decks, a lifter which is disposed in each elevator shaft and moves up and down with a car being mounted thereon, and conveyors which are installed on the loading/unloading berth, lifters, and car storage decks for transferring a car between them.
    Type: Grant
    Filed: July 17, 1992
    Date of Patent: August 16, 1994
    Assignees: Mitsubishi Jukogyo Kabushiki Kaisha, Seiryo Engineering Co., Ltd.
    Inventors: Yoshitaka Matsuda, Koichi Kondo, Shuhei Kuribayashi, Akiko Noda, Takuya Nakashima, Ryutaro Saito, Kae Tsuji, Hideo Mori, Yoshinori Mori