Patents by Inventor Yoshitaka Minami

Yoshitaka Minami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5795550
    Abstract: A catalyst packing apparatus with which a desired packed density can be easily and surely obtained by use of a suspended type catalyst ejector, wherein correlated data giving a scattering height from which a desired packed density can be obtained has been determined and stored beforehand in a memory part 74, and by setting a desired packed density, prior to the scattering of catalyst, a selecting part 75 selects a scattering height corresponding to the desired packed density from the correlated data in the memory part 74 and delivers the same to an adjusting part 76 which controls the catalyst ejector 30 so as to obtain this scattering height, thereby the catalyst 11 in a reaction tower 10 can be packed at the desired packed density.
    Type: Grant
    Filed: February 9, 1996
    Date of Patent: August 18, 1998
    Assignee: Idemitsu Engineering Co., Ltd.
    Inventor: Yoshitaka Minami
  • Patent number: 5753585
    Abstract: Provided are a catalyst packing method and a catalyst packing apparatus with which a desired packed density can be easily and surely obtained by use of a suspended type catalyst ejector, wherein correlated data giving a scattering height from which a desired packed density can be obtained has been determined and stored beforehand in a memory part 74, and by setting a desired packed density, prior to the scattering of catalyst, a selecting part 75 selects a scattering height corresponding to the desired packed density from the correlated data in the memory part 74 and delivers the same to an adjusting part 76 which controls the catalyst ejector 30 so as to obtain this scattering height, thereby the catalyst bed 11 in a reaction tower 10 can be packed at the desired packed density.
    Type: Grant
    Filed: June 30, 1997
    Date of Patent: May 19, 1998
    Assignee: Idemitsu Engineering Co., Ltd.
    Inventor: Yoshitaka Minami
  • Patent number: 5687780
    Abstract: A rotation driving system drives unitedly and rotatably sprinkle rotors, which the disk sprinkle rotors having plural partitive members extending in predetermined distances in a radial direction to the rotating axis are arranged in multistage state with a predetermined distance in a longitudinal direction. In the aforementioned state, by supplying the catalyst to the center of the sprinkle rotor, the catalyst is fed into a reaction tank while releasing in a radial direction of the sprinkle rotor. When the catalyst is fed, a rotation frequency of the sprinkle rotor is defined to be a speed constituent in a radial direction of over zero when the catalyst settles down and to be periodically changed between a maximum rotation frequency and a minimum rotation frequency.
    Type: Grant
    Filed: November 7, 1995
    Date of Patent: November 18, 1997
    Assignee: Idemitsu Engineering Co., Ltd
    Inventor: Yoshitaka Minami
  • Patent number: 5424828
    Abstract: A method for measuring and analyzing interference fringes using a hologram interferometer. The hologram interferometer is provided with a holographic optical element which includes a first pattern for diffracting a laser beam as a reference beam in a direction which is different from the surface of an object to be measured and a second pattern for diffracting a laser beam as a measuring beam which is to be radiated onto the surface to be measured, and measures interference fringes resulting from interference between the reference beam and the beam reflected from the measured surface of the object. Interference fringes are measured while the phase of the interference fringes is successively changed by moving the holographic optical element parallel to a surface thereof by given amounts in a direction normal to the gratings of the first pattern, and the configuration of the measured surface is obtained by analyzing the fringes.
    Type: Grant
    Filed: July 19, 1993
    Date of Patent: June 13, 1995
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Yoshitaka Minami
  • Patent number: 5403698
    Abstract: A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.
    Type: Grant
    Filed: October 11, 1991
    Date of Patent: April 4, 1995
    Assignees: Hitachi Chemical Company, Ltd., Dai Nippon Toryo Co., Ltd.
    Inventors: Sigeo Tachiki, Masahiko Hiro, Toshihiko Akahori, Takuro Kato, Hajime Kakumaru, Yoshitaka Minami, Yuhji Yamazaki, Toshiya Takahashi, Toshihiko Shiotani, Yoshihisa Nagashima
  • Patent number: 5372900
    Abstract: A reflecting master hologram is illuminated with collimated coherent beams at an incident angle to provide regular reflected beams and diffracted beams. The regular reflected beams and the diffracted beams are directed to a reflective photoresist plate at the same angles as those at which they are, respectively, reflected by the reflecting master hologram so as to form an intensity pattern, i.e. a bright and dark pattern, of interference fringes on the reflective photoresist plate. The exposed photoresist plate is developed and etched to form a reflective hologram on the plate.
    Type: Grant
    Filed: March 29, 1993
    Date of Patent: December 13, 1994
    Assignee: Fuji Photo Optical Co., Ltd.
    Inventor: Yoshitaka Minami
  • Patent number: 5334484
    Abstract: A photopolymerizable composition comprising: (a) 100 parts by weight of a compound having at least one ethylenically unsaturated group, (b) 0 to 400 parts by weight of a thermoplastic organic polymer and (c) 0.01 to 20 parts by weight of a photoinitiator, characterized in that an acridine compound of the following general formula (I) is used as the photoinitiator: ##STR1## wherein R represents an alkylene, oxadialkylene or thiodialkylene group having 2 to 20 carbon atoms,and a photopolymerizable element comprising a layer of the photopolymerizable composition formed on a support.
    Type: Grant
    Filed: June 15, 1992
    Date of Patent: August 2, 1994
    Assignees: Hitachi Chemical Co., Ltd., Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Yoshitaka Minami, Hajime Kakumaru, Naohiro Kubota, Nobuhide Tominaga, Koji Ishizaki
  • Patent number: 5089377
    Abstract: Acridine compounds such as 1,4-butylenebis-.beta.-(acridin-9-yl)acrylate, or the like, are high in light sensitivity and suitable as a photopolymerization initiator.
    Type: Grant
    Filed: December 12, 1990
    Date of Patent: February 18, 1992
    Assignee: Asahi Denka Kogyo K.K.
    Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo
  • Patent number: 5045433
    Abstract: A substituted acridine derivative represented by ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7 and R.sub.8 are independently hydrogen atoms, alkyl groups, substituted alkyl groups, aryl groups, substituted aryl groups, halogen atoms, or alkoxy groups, and Z.sub.1 is a six-membered heteroaromatic group which has one or two nitrogen atoms in its ring and may have an alkyl substituent having 1 to 8 carbon atoms, or a quinolyl group; and a photopolymerizable composition comprising 0.01 to 10 parts by weight of said derivative, 100 parts by weight of a photopolymerizable compound having a boiling point of 100.degree. C. or higher at atmospheric pressure and at least one kind of ethylenic unsaturated group, and 0 to 400 parts by weight of a thermoplastic organic polymer.
    Type: Grant
    Filed: May 30, 1990
    Date of Patent: September 3, 1991
    Assignees: Hitachi Chemical Co., Ltd., Adeka Argus Chemical Co., Ltd.
    Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo
  • Patent number: 4985564
    Abstract: Acridine compounds such as 1,4-butylene-bis-.beta.-(acridin-9-yl)acrylate, or the like are high in light sensitivity and suitable as a photopolymerization initiator.
    Type: Grant
    Filed: September 1, 1989
    Date of Patent: January 15, 1991
    Assignees: Hitachi Chemical Co., Ltd., Adeka Argus Chemical Co., Ltd.
    Inventors: Hajime Kakumaru, Yoshitaka Minami, Naohiro Kubota, Shinya Mashimo
  • Patent number: 4980266
    Abstract: A photosensitive resin composition comprising (A) a carboxyl group-containing film-forming property imparting polymer, (B) a copolymerizable vinyl compound, (C) a photopolymerization initiator, and (D) a 1,2,3-benzotriazole derivative is useful for forming a photosensitive film excellent in resistance to plating and stability.
    Type: Grant
    Filed: May 15, 1990
    Date of Patent: December 25, 1990
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Taku Kawaguchi, Yoshitaka Minami, Tatsuya Ichikawa