Abstract: Reflected light from the measurement object is received by a plurality of pixel columns arranged in an X2 direction in a light receiving unit 121, and a plurality of light receiving amount distributions is output. One or a plurality of peak candidate positions of light receiving amounts in a Z2 direction is detected by a peak detection unit 1 for each pixel column based on the plurality of light receiving amount distributions. A peak position to be adopted to a profile is selected from the peak candidate positions detected for each pixel column based on a relative positional relationship with a peak position of another pixel column adjacent to the pixel column, and profile data indicating the profile is generated by the profile generation unit 3 based on the selected peak position.

Abstract: A light source irradiates the measuring object with slit light having a width in an X direction. An image sensor receives reflected light from the measuring object, has a plurality of pixels two-dimensionally arranged in a U direction corresponding to the X direction and a V direction corresponding to a Z direction, and outputs a light receiving amount of the reflected light. A detecting unit detects a position of a pixel in the V direction. A generating unit generates a profile of the X-Z cross section from each position of the plurality of pixel rows in the U direction and the peak position in the V direction. A resolution in the V direction of the image sensor is lower than a resolution in the U direction of the image sensor.

Abstract: Reflected light from the measurement object is received by a plurality of pixel columns arranged in an X2 direction in a light receiving unit 121, and a plurality of light receiving amount distributions is output. One or a plurality of peak candidate positions of light receiving amounts in a Z2 direction is detected by a peak detection unit 1 for each pixel column based on the plurality of light receiving amount distributions. A peak position to be adopted to a profile is selected from the peak candidate positions detected for each pixel column based on a relative positional relationship with a peak position of another pixel column adjacent to the pixel column, and profile data indicating the profile is generated by the profile generation unit 3 based on the selected peak position.

Abstract: A light source irradiates the measuring object with slit light having a width in an X direction. An image sensor receives reflected light from the measuring object, has a plurality of pixels two-dimensionally arranged in a U direction corresponding to the X direction and a V direction corresponding to a Z direction, and outputs a light receiving amount of the reflected light. A detecting unit detects a position of a pixel in the V direction. A generating unit generates a profile of the X-Z cross section from each position of the plurality of pixel rows in the U direction and the peak position in the V direction. A resolution in the V direction of the image sensor is lower than a resolution in the U direction of the image sensor.

Abstract: Reflected light from the measurement object is received by a plurality of pixel columns arranged in an X2 direction in a light receiving unit 121, and a plurality of light receiving amount distributions is output. One or a plurality of peak candidate positions of light receiving amounts in a Z2 direction is detected by a peak detection unit 1 for each pixel column based on the plurality of light receiving amount distributions. A peak position to be adopted to a profile is selected from the peak candidate positions detected for each pixel column based on a relative positional relationship with a peak position of another pixel column adjacent to the pixel column, and profile data indicating the profile is generated by the profile generation unit 3 based on the selected peak position.

Abstract: There is provided an optical displacement meter capable of accurately measuring a profile of a measurement object even when multiple reflections are caused. At the time of setting, reference data indicating a reference profile of a measurement object is registered by a registration unit, and a mask region is set to the reference data by a setting unit. At the time of measurement, reflected light from the measurement object is received by a light receiving unit, and a peak in an output light receiving amount distribution is detected by a peak detection unit. Temporary profile data of the measurement object is generated by a profile generation unit based on a position of the detected peak. A position of the mask region for the temporary profile is corrected by a correction unit.

Abstract: Reflected light from the measurement object is received by a plurality of pixel columns arranged in an X2 direction in a light receiving unit 121, and a plurality of light receiving amount distributions is output. One or a plurality of peak candidate positions of light receiving amounts in a Z2 direction is detected by a peak detection unit 1 for each pixel column based on the plurality of light receiving amount distributions. A peak position to be adopted to a profile is selected from the peak candidate positions detected for each pixel column based on a relative positional relationship with a peak position of another pixel column adjacent to the pixel column, and profile data indicating the profile is generated by the profile generation unit 3 based on the selected peak position.

Abstract: There is provided an optical displacement meter capable of accurately measuring a profile of a measurement object even when multiple reflections are caused. At the time of setting, reference data indicating a reference profile of a measurement object is registered by a registration unit 1, and a mask region is set to the reference data by a setting unit 2. At the time of measurement, reflected light from the measurement object is received by a light receiving unit 121, and a peak in an output light receiving amount distribution is detected by a peak detection unit 3. Temporary profile data of the measurement object is generated by a profile generation unit 4 based on a position of the detected peak. A position of the mask region for the temporary profile is corrected by a correction unit 5.