Abstract: A performance of a semiconductor device is improved. A method of manufacturing a semiconductor device according to one embodiment includes a step of mounting a cover member via a bonding material on an upper surface of a frame member fixed on a wiring substrate, and a step of curing the bonding material by irradiating the bonding material mounted on the frame member with an ultraviolet ray. The wiring substrate has a base member and an insulating film covering the base member, and the frame member and a semiconductor chip are mounted (fixed) onto an upper surface of the insulating film. The frame member contains glass fibers. Moreover, a roughness of the upper surface of the frame member is equal to or less than a roughness of the upper surface of the insulating film.

Abstract: A performance of a semiconductor device is improved. A method of manufacturing a semiconductor device according to one embodiment includes a step of mounting a cover member via a bonding material on an upper surface of a frame member fixed on a wiring substrate, and a step of curing the bonding material by irradiating the bonding material mounted on the frame member with an ultraviolet ray. The wiring substrate has a base member and an insulating film covering the base member, and the frame member and a semiconductor chip are mounted (fixed) onto an upper surface of the insulating film. The frame member contains glass fibers. Moreover, a roughness of the upper surface of the frame member is equal to or less than a roughness of the upper surface of the insulating film.

Abstract: A performance of a semiconductor device is improved. A method of manufacturing a semiconductor device according to one embodiment includes a step of mounting a cover member via a bonding material on an upper surface of a frame member fixed on a wiring substrate, and a step of curing the bonding material by irradiating the bonding material mounted on the frame member with an ultraviolet ray. The wiring substrate has a base member and an insulating film covering the base member, and the frame member and a semiconductor chip are mounted (fixed) onto an upper surface of the insulating film. The frame member contains glass fibers. Moreover, a roughness of the upper surface of the frame member is equal to or less than a roughness of the upper surface of the insulating film.

Abstract: A semiconductor device includes a semiconductor chip having a first main surface, a second main surface opposite to the first main surface, a side surface arranged between the first main surface and the second main surface, and a magnetic storage device, a first magnetic shield overlaying on the first main surface, a second magnetic shield overlaying on the second main surface, and a third magnetic shield overlaying on the side surface. The first and second magnetic shields are mechanically connected via the third magnetic shield.

Abstract: A semiconductor device includes a semiconductor chip having a first main surface, a second main surface opposite to the first main surface, a side surface arranged between the first main surface and the second main surface, and a magnetic storage device, a first magnetic shield overlaying on the first main surface, a second magnetic shield overlaying on the second main surface, and a third magnetic shield overlaying on the side surface. The first and second magnetic shields are mechanically connected via the third magnetic shield.

Abstract: A semiconductor chip includes a magnetic storage device and includes an electrode pad on a first face. The semiconductor chip is coated with a magnetic shield layer in a state in which at least the electrode pad is exposed. The semiconductor chip is mounted on an interconnect substrate through a bump. At least one of the semiconductor chip and the interconnect substrate includes a convex portion, and the bump is disposed over the convex portion.

Abstract: A semiconductor chip includes a magnetic storage device and includes an electrode pad on a first face. The semiconductor chip is coated with a magnetic shield layer in a state in which at least the electrode pad is exposed. The semiconductor chip is mounted on an interconnect substrate through a bump. At least one of the semiconductor chip and the interconnect substrate includes a convex portion, and the bump is disposed over the convex portion.

Abstract: It is desired to provide an electronic device which can be easily taken out of a mold after a resin sealing processing. The electronic device include: an insulating layer; a wiring formed on the insulating layer; and a solder resist layer formed to cover the insulation layer and the wiring and including particles of an elastomer. An asperity is formed on a surface of the solder resist layer.

Abstract: A dry film includes a first solder resist film, a second solder resist film and a supporting film. The first solder resist film includes first particles of first elastomer. The supporting film supports the first solder resist film and the second solder resist film. Adhesion strength of a surface of the second solder resist film is weaker than adhesion strength of a surface of the first solder resist film at a glass transition point of the first elastomer. According to the dry film, it is possible to form a wiring board including a solder resist film which is arranged at a surface of the wiring board and hard to be adhered to a body such as a die upon heating.

Abstract: It is desired to provide an electronic device which can be easily taken out of a mold after resin sealing processing. The electronic device includes: an insulating layer; a wiring layer formed on a surface of the insulating layer; a first solder resist formed to cover the insulating layer and the wiring layer and including a particle of a first elastomer; and a second solder resist formed to cover a surface of the first solder resist. A surface of the second solder resist has smaller adhesive strength than the surface of the second solder resist at a glass transition point of the first elastomer.