Patents by Inventor Yoshitaka Yanagi

Yoshitaka Yanagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
    Patent number: 7109311
    Abstract: A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: September 19, 2006
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda
  • Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
    Patent number: 7101651
    Abstract: A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
    Type: Grant
    Filed: February 12, 2004
    Date of Patent: September 5, 2006
    Assignee: Shin-Etsu Chemical Co.,Ltd.
    Inventors: Youichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda
  • Resist composition and patterning method
    Patent number: 6818148
    Abstract: A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.
    Type: Grant
    Filed: September 22, 1999
    Date of Patent: November 16, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Watanabe, Toyohisa Sakurada, Yoshitaka Yanagi, Shigehiro Nagura, Toshinobu Ishihara
  • Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
    Publication number: 20040166432
    Abstract: A chemical amplification type resist composition comprising a specific sulfonyldiazomethane containing long-chain alkoxyl groups has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
    Type: Application
    Filed: February 12, 2004
    Publication date: August 26, 2004
    Inventors: Youichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda
  • Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
    Publication number: 20040167322
    Abstract: A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
    Type: Application
    Filed: February 12, 2004
    Publication date: August 26, 2004
    Inventors: Youichi Ohsawa, Katsuhiro Kobayashi, Yoshitaka Yanagi, Kazunori Maeda
  • Photoresist compositions and patterning method
    Patent number: 6395453
    Abstract: There are disclosed a photoresist composition containing at least an &agr;,&bgr;-unsaturated ketone compound, and a patterning method comprising a step of application of a photoresist composition containing at least an &agr;,&bgr;-unsaturated ketone compound to a substrate, a step of, after a heat treatment, exposure with a high energy ray having a wavelength of 500 nm or less, X-ray or electron ray through a photomask, and a step of development with a developer. According to the present invention, there are provided a photoresist composition exhibiting excellent stability as for sensitivity against long term storage and environmental temperature variation, and a patterning method utilizing the photoresist composition.
    Type: Grant
    Filed: February 28, 2000
    Date of Patent: May 28, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tatsushi Kaneko, Kenji Koizumi, Satoshi Watanabe, Yoshitaka Yanagi
  • Drip drink maker
    Patent number: 4697503
    Abstract: An improved drip maker is provided which comprises a cup-shaped receiver containing, as the bottom surface, a drip wall, with apertures and having a hemisphere-shape protruding toward the opening of the receiver, forming a drip space between the drip wall and pack of drippable coffee or tea components positioned on the drip wall.
    Type: Grant
    Filed: February 3, 1986
    Date of Patent: October 6, 1987
    Assignee: Ajinomoto General Foods
    Inventors: Ryuichiro Okabe, Yoshitaka Yanagi