Abstract: A liquid immersion exposure apparatus in which a substrate is exposed via a projection optical system, includes: a liquid supply flow path; a first flow path which receives a first portion of immersion liquid from the liquid supply flow path; a second flow path which receive a second portion of the immersion liquid from the liquid supply flow path; a supply port via which the first portion of the immersion liquid is supplied; and an adjusting device provided downstream of the liquid supply flow path, which adjusts a quantity of the first portion of the immersion liquid. During the exposure of the substrate, the first portion of the immersion liquid is supplied to form a liquid immersion area covering a portion of an upper surface of the substrate, and the substrate is exposed with an exposure light through the liquid immersion area.

Abstract: A liquid immersion exposure apparatus includes a first flow path which receives a first portion of immersion liquid from a liquid supply path; a second flow path which receives a second portion of immersion liquid from the liquid supply path; a first supply port connected to the first flow path and from which a portion of the first portion of the immersion liquid can be supplied and a second supply port connected to the second flow path and from which a portion of the second portion of the immersion liquid can be supplied; first and second adjusting devices which adjust a quantity of the immersion liquid to be supplied from the first and second supply ports; and third and fourth flow paths which allow receipt of the immersion liquid that has not been introduced to the first and second supply ports from the first and second flow paths.

Abstract: A liquid immersion exposure apparatus includes a first flow path which receives a first portion of immersion liquid from a liquid supply path; a second flow path which receives a second portion of immersion liquid from the liquid supply path; a first supply port connected to the first flow path and from which a portion of the first portion of the immersion liquid can be supplied and a second supply port connected to the second flow path and from which a portion of the second portion of the immersion liquid can be supplied; first and second adjusting devices which adjust a quantity of the immersion liquid to be supplied from the first arid second supply ports; and third and fourth flow paths which allow receipt of the immersion liquid that has not been introduced to the first and second supply ports from the first and second flow paths.

Abstract: An exposure apparatus exposes a substrate via a projection optical system and liquid. The exposure apparatus includes a first pipe section that flows liquid supplied from a liquid supplying device, and a second pipe section that is disposed at an outside of the first pipe section so as to surround the first pipe section and flows liquid supplied from the liquid supplying device.

Abstract: An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.

Abstract: An exposure apparatus exposes a substrate via a projection optical system and liquid. The exposure apparatus includes a first pipe section that flows liquid supplied from a liquid supplying device, and a second pipe section that is disposed at an outside of the first pipe section so as to surround the first pipe section and flows liquid supplied from the liquid supplying device.

Abstract: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.

Abstract: An exposure apparatus includes; a supply outlet that supplies a liquid to an optical path space of exposure light, and a liquid supply system that supplies an ionized ionic liquid to the supply outlet.

Abstract: An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.

Abstract: An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and the projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space, a supply path configured to supply the liquid to the supply nozzle, a bypass which branches from the supply path, and a supply control valve configured to change a flow rate of the liquid supplied from the supply path to the supply nozzle and a flow rate of the liquid supplied from the supply path to the bypass.

Abstract: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.

Abstract: An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.

Abstract: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.

Abstract: An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.

Abstract: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes it possible to prevent destruction of the circuit pattern or malfunction of the device which would otherwise caused by charging of the liquid.

Abstract: An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.

Abstract: A filter apparatus for improving gas temperature stability while maintaining a high impurity removal capacity. The filter apparatus includes a filter for removing impurities from a gas and a temperature adjuster for adjusting the temperature of the gas to a predetermined temperature. The filter apparatus further includes a humidity detector, arranged at the upstream side of the filter, for adjusting the humidity of the gas before the gas passes through the filter.

Abstract: An atmosphere control apparatus includes an air introducing mechanism which introduces air from an air introducing port, and a first impurity removing mechanism which removes impurities from the air. The air introducing mechanism is disposed between the air introducing port and the first impurity removing mechanism. By doing this, it is made possible to provide an atmosphere control apparatus which can prevent external atmosphere from entering a chamber containing a device-manufacturing apparatus so that the atmosphere in the chamber can be controlled accurately.

Abstract: A projection exposure apparatus transfers a pattern formed on a mask onto a substrate via a projection optical system. The projection exposure apparatus includes electricity removal units which removes electricity from a liquid supplied to a space between the projection optical system and the surface of a substrate. This makes it possible to prevent destruction of the circuit pattern or malfunction of the device which would otherwise caused by charging of the liquid.

Abstract: An exposure apparatus has a projection optical system configured to project a pattern of a reticle onto a substrate, and exposes the substrate to light via the reticle and the projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle configured to supply liquid to the space, a supply path configured to supply the liquid to the supply nozzle, a bypass which branches from the supply path, and a supply control valve configured to change a flow rate of the liquid supplied from the supply path to the supply nozzle and a flow rate of the liquid supplied from the supply path to the bypass.