Patents by Inventor Yoshiyuki Fukumoto

Yoshiyuki Fukumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11965903
    Abstract: An automated analyzer includes a reagent dispensing probe that dispenses a reagent to a reaction vessel, a sample dispensing probe that dispenses a sample to the reaction vessel, a stirring rod that stirs a sample and a reagent in the reaction vessel, and a storage unit that stores special washing information including information about a condition for performing special washing to prevent sample carryover and a washing method. The automated analyzer further includes: a determination unit that determines whether the special washing is required based on information about the sample dispensed by the sample dispensing probe and the special washing information; and a controller that causes the reagent dispensing probe to dispense a wash liquid to the reaction vessel and causes the stirring rod to stir the wash liquid in the reaction vessel based on the special washing information, when the special washing is performed.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: April 23, 2024
    Assignee: JEOL Ltd.
    Inventors: Kazushige Kojima, Yoshiyuki Nakayama, Masato Nakayama, Arihiro Toyoda, Hiroo Sugimura, Yuta Ikarashi, Yasuhiro Fukumoto, Makoto Asakura
  • Patent number: 11951742
    Abstract: A substrate joined body including: a first substrate; a second substrate; an organic film that comprises silicon and carbon and joins the first substrate and the second substrate; and a protective film that comprises an inorganic element and is formed over the organic film from at least a part of the surface of the first substrate and at least a part of the surface of the second substrate, wherein the protective film comprises a region in which the ratio of carbon to silicon based on atomic percentage is from 0.0 to 5.0 in a region within 50 nm in a thickness direction from a surface of the organic film on the protective film side, when the surface is measured by X-ray photoelectron spectroscopy.
    Type: Grant
    Filed: May 24, 2022
    Date of Patent: April 9, 2024
    Assignee: Canon Kabushiki Kaisha
    Inventors: Taichi Yonemoto, Yoshiyuki Fukumoto, Atsunori Terasaki
  • Publication number: 20230008405
    Abstract: Provided is a method of manufacturing a substrate including an alignment mark, including: forming the alignment mark and a recess portion on the substrate, the alignment mark not penetrating the substrate and including a bottom portion with a lower infrared transmittance than that of a first surface and a second surface of the substrate; and aligning the substrate by orthogonally arranging predetermined positions of the first surface and the second surface of the substrate in a horizontal direction and an infrared ray camera and by image-identifying the alignment mark formed on the substrate with transmitted light of infrared rays emitted from the infrared ray camera.
    Type: Application
    Filed: July 5, 2022
    Publication date: January 12, 2023
    Inventors: Mitsunori Toshishige, Yoshiyuki Fukumoto
  • Publication number: 20220379606
    Abstract: A substrate joined body including: a first substrate; a second substrate; an organic film that comprises silicon and carbon and joins the first substrate and the second substrate; and a protective film that comprises an inorganic element and is formed over the organic film from at least a part of the surface of the first substrate and at least a part of the surface of the second substrate, wherein the protective film comprises a region in which the ratio of carbon to silicon based on atomic percentage is from 0.0 to 5.0 in a region within 50 nm in a thickness direction from a surface of the organic film on the protective film side, when the surface is measured by X-ray photoelectron spectroscopy.
    Type: Application
    Filed: May 24, 2022
    Publication date: December 1, 2022
    Inventors: Taichi Yonemoto, Yoshiyuki Fukumoto, Atsunori Terasaki
  • Patent number: 11440326
    Abstract: A liquid ejection apparatus includes at least one ink tank which is ink-refillable from outside, a liquid ejection head that ejects an ink supplied from the ink tank, and a housing that contains the ink tank and the liquid ejection head inside. The at least one ink tank is fixed to a housing wall of at least one surface out of surfaces forming the housing. Moreover, one surface out of surfaces forming the ink tank, which is attached to the housing wall, is either a surface having the largest area of the ink tank or a surface opposed to the surface having the largest area.
    Type: Grant
    Filed: January 7, 2021
    Date of Patent: September 13, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshiyuki Fukumoto, Hiroshi Higuchi
  • Publication number: 20210221142
    Abstract: A liquid ejection apparatus includes at least one ink tank which is ink-refillable from outside, a liquid ejection head that ejects an ink supplied from the ink tank, and a housing that contains the ink tank and the liquid ejection head inside. The at least one ink tank is fixed to a housing wall of at least one surface out of surfaces forming the housing. Moreover, one surface out of surfaces forming the ink tank, which is attached to the housing wall, is either a surface having the largest area of the ink tank or a surface opposed to the surface having the largest area.
    Type: Application
    Filed: January 7, 2021
    Publication date: July 22, 2021
    Inventors: Yoshiyuki FUKUMOTO, Hiroshi HIGUCHI
  • Patent number: 10669628
    Abstract: A method for manufacturing a laminate has a process of forming a film on a substrate by an atomic layer deposition method and a process of forming a layer containing a compound polymerizable with acid and an acid generator, and then curing the layer to form resin layer on the film, in which the nitrogen atom atomic composition ratio of the film is 2.5% or less.
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: June 2, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshiyuki Fukumoto, Atsunori Terasaki, Ryoji Kanri
  • Patent number: 10661566
    Abstract: A method for manufacturing a bonded substrate body in which an end portion of an adhesive is located at a position retreated in a direction to the inside of the bonded substrate body from an end surface of a bonding region of a first substrate and a second substrate includes forming a film on the end portion of the adhesive.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: May 26, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshiyuki Fukumoto, Atsunori Terasaki, Ryoji Kanri, Atsushi Hiramoto
  • Patent number: 10442202
    Abstract: A manufacturing method for a bonded-substrate article includes a first bonding where a first bonding region of a first substrate and a third bonding region of a second substrate are bonded at a first temperature, and a second bonding, following the first bonding, where a second bonding region of the first substrate and a fourth bonding region of the second substrate are bonded at a second temperature. The first temperature is lower than the second temperature.
    Type: Grant
    Filed: June 4, 2018
    Date of Patent: October 15, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yoshiyuki Fukumoto
  • Patent number: 10315426
    Abstract: A method for forming a patterned film on a substrate includes: step of patterning a mask material on the substrate, thereby covering, with the mask material, the region except a patterned film forming region on a substrate surface on which the patterned film is to be formed; step of covering, with a protective member, at least a part of the surface of the mask material opposite to the substrate so as to allow the patterned film forming region to communicate with outside air, thereby forming a workpiece to be subjected to film formation in following step; step of forming a film on at least the patterned film forming region of the surface of the workpiece communicating with the outside air; step of releasing the protective member from the mask material; and step of removing the mask material and a part of the film on the mask material.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: June 11, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Atsushi Teranishi, Yoshiyuki Fukumoto
  • Patent number: 10286664
    Abstract: A liquid election head including a silicon substrate and an element for generating energy that is utilized for electing a liquid on the silicon substrate, wherein a protective layer A containing a metal oxide is disposed on a first surface of the silicon substrate, a structure containing an organic resin and constituting part of a liquid flow passage is disposed on the protective layer A, and an intermediate layer A containing a silicon compound is disposed between the protective layer A and the structure.
    Type: Grant
    Filed: May 19, 2017
    Date of Patent: May 14, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Atsunori Terasaki, Yoshiyuki Fukumoto, Masaya Uyama, Takeru Yasuda
  • Patent number: 10155385
    Abstract: A liquid ejection head includes: a substrate including an energy-generating element; a flow path forming member including a discharge port and having a liquid flow path formed between the flow path forming member and the substrate; and a plurality of through-passages passing through the substrate, each of the through-passages including a first through-passage part serving as a common liquid chamber and a plurality of second through-passage parts communicating with the first through-passage part, wherein a separation wall separating the adjacent first through-passage parts includes a plate-shaped member separating the adjacent first through-passage parts and approximately vertical to a substrate in-plane direction and, at least one protrusion protruding from the plate-shaped member in the substrate in-plane direction and contacting a bottom portion of the first through-passage part.
    Type: Grant
    Filed: December 1, 2017
    Date of Patent: December 18, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Atsushi Hiramoto, Ryoji Kanri, Yoshiyuki Fukumoto, Atsunori Terasaki, Atsushi Teranishi, Masahiko Kubota
  • Publication number: 20180354267
    Abstract: A manufacturing method for a bonded-substrate article includes a first bonding where a first bonding region of a first substrate and a third bonding region of a second substrate are bonded at a first temperature, and a second bonding, following the first bonding, where a second bonding region of the first substrate and a fourth bonding region of the second substrate are bonded at a second temperature. The first temperature is lower than the second temperature.
    Type: Application
    Filed: June 4, 2018
    Publication date: December 13, 2018
    Inventor: Yoshiyuki Fukumoto
  • Patent number: 10150292
    Abstract: A liquid discharge head comprising a silicon substrate; an insulating layer A formed on a first surface of the silicon substrate, a protective layer A that includes metal oxide and is formed on the insulating layer A, the structure that is formed on the protective layer A by direct contact with the protective layer A, includes organic resin, and forms a part of a flow path for liquid, and an element that is formed on a second surface of the silicon substrate on a side opposite to the first surface, and is configured to generate energy used for discharging the liquid.
    Type: Grant
    Filed: May 23, 2017
    Date of Patent: December 11, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Ryoji Kanri, Yoshiyuki Fukumoto, Atsunori Terasaki, Tetsushi Ishikawa, Masaya Uyama
  • Publication number: 20180312971
    Abstract: A method for manufacturing a laminate has a process of forming a film on a substrate by an atomic layer deposition method and a process of forming a layer containing a compound polymerizable with acid and an acid generator, and then curing the layer to form resin layer on the film, in which the nitrogen atom atomic composition ratio of the film is 2.5% or less.
    Type: Application
    Filed: April 23, 2018
    Publication date: November 1, 2018
    Inventors: Yoshiyuki Fukumoto, Atsunori Terasaki, Ryoji Kanri
  • Publication number: 20180281414
    Abstract: A method for manufacturing a bonded substrate body in which an end portion of an adhesive is located at a position retreated in a direction to the inside of the bonded substrate body from an end surface of a bonding region of a first substrate and a second substrate includes forming a film on the end portion of the adhesive.
    Type: Application
    Filed: March 27, 2018
    Publication date: October 4, 2018
    Inventors: Yoshiyuki Fukumoto, Atsunori Terasaki, Ryoji Kanri, Atsushi Hiramoto
  • Publication number: 20180170047
    Abstract: A liquid ejection head includes: a substrate including an energy-generating element; a flow path forming member including a discharge port and having a liquid flow path formed between the flow path forming member and the substrate; and a plurality of through-passages passing through the substrate, each of the through-passages including a first through-passage part serving as a common liquid chamber and a plurality of second through-passage parts communicating with the first through-passage part, wherein a separation wall separating the adjacent first through-passage parts includes a plate-shaped member separating the adjacent first through-passage parts and approximately vertical to a substrate in-plane direction and, at least one protrusion protruding from the plate-shaped member in the substrate in-plane direction and contacting a bottom portion of the first through-passage part.
    Type: Application
    Filed: December 1, 2017
    Publication date: June 21, 2018
    Inventors: Atsushi Hiramoto, Ryoji Kanri, Yoshiyuki Fukumoto, Atsunori Terasaki, Atsushi Teranishi, Masahiko Kubota
  • Publication number: 20180170054
    Abstract: A method for forming a patterned film on a substrate includes: step of patterning a mask material on the substrate, thereby covering, with the mask material, the region except a patterned film forming region on a substrate surface on which the patterned film is to be formed; step of covering, with a protective member, at least a part of the surface of the mask material opposite to the substrate so as to allow the patterned film forming region to communicate with outside air, thereby forming a workpiece to be subjected to film formation in following step; step of forming a film on at least the patterned film forming region of the surface of the workpiece communicating with the outside air; step of releasing the protective member from the mask material; and step of removing the mask material and a part of the film on the mask material.
    Type: Application
    Filed: November 2, 2017
    Publication date: June 21, 2018
    Inventors: Atsushi Teranishi, Yoshiyuki Fukumoto
  • Patent number: 9914295
    Abstract: A method for manufacturing a structure having a substrate in which holes are formed and a photosensitive resin layer provided on the substrate in such a manner as to cover at least a part of the holes includes a process of preparing a substrate in which holes formed by a surface in which a wavelike shape is formed and a photosensitive resin layer provided on the substrate in such a manner as to cover at least a part of the holes and an exposure process of exposing the photosensitive resin layer on the substrate.
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: March 13, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroshi Higuchi, Masataka Kato, Yoshinao Ogata, Toshiyasu Sakai, Takayuki Kamimura, Tetsushi Ishikawa, Atsunori Terasaki, Masahiko Kubota, Ryoji Kanri, Yoshiyuki Fukumoto, Yasuaki Tominaga, Tamaki Sato, Masafumi Morisue
  • Publication number: 20170341389
    Abstract: A liquid election head including a silicon substrate and an element for generating energy that is utilized for electing a liquid on the silicon substrate, wherein a protective layer A containing a metal oxide is disposed on a first surface of the silicon substrate, a structure containing an organic resin and constituting part of a liquid flow passage is disposed on the protective layer A, and an intermediate layer A containing a silicon compound is disposed between the protective layer A and the structure.
    Type: Application
    Filed: May 19, 2017
    Publication date: November 30, 2017
    Inventors: Atsunori Terasaki, Yoshiyuki Fukumoto, Masaya Uyama, Takeru Yasuda