Patents by Inventor Yoshiyuki Horikawa

Yoshiyuki Horikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing mask ROM and photomask used therefor
    Patent number: 5965302
    Abstract: According to the present invention, a photomask for providing a pattern to a resist applied on a substrate is provided. The photomask includes a light blocking region forming a boundary between a first region and a second region on the substrate. A width of the light blocking region is such that the light blocking region is not projected on the resist.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: October 12, 1999
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yoshiyuki Horikawa, Kenji Shimizu