Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.

Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.

Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.

Abstract: A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

Abstract: A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

Abstract: An optical disk with a substrate made of glass at least partially has its inner and outer peripheral surfaces polished to surface roughness of 5 .mu.m or less so as to reduce the amount of glass powder generated from these surfaces and to thereby improve the yield.

Abstract: A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion for forming pits of the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

Abstract: A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

Abstract: A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure, by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion, for forming pits on the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

Abstract: A solar cell including a semiconductor substrate, a diffused layer provided in the semiconductor substrate by diffusion of dopant impurities, and a contact made of metal paste formed on the diffusion layer. The metal paste includes metal powder which functions as the main contact material, glass frits, an organic binder, a solvent, and an element belonging to the fifth group of the periodic table.