Abstract: A wafer is held on the upper side of a chuck. The chuck is connected to a spin motor, a motor-pedestal seat and an air cylinder shaft. The spin motor functions to rotate the chuck while the air cylinder shaft functions to elevate the chuck. When a resist is dropped on the wafer, the air is supplied to the air cylinder concurrently with the rotation of the spin motor, thus causing the chuck to move upward while rotating. The upward movement causes a downward inertial force to act on the resist, which in turn causes the resist to be pressed against the wafer while being dispersed over the surface of the wafer.

Abstract: This invention provides a semiconductor manufacturing apparatus and a method for manufacturing a semiconductor device in which the resist application can be finished in a small quantity even on a resist with a high viscosity or a substrate with poor wettability. More specifically, this invention provides a semiconductor manufacturing apparatus and a method for manufacturing a semiconductor device having the following structure. A wafer 1 is held on the upper side of a chuck 13. The chuck 13 is connected to a spin motor 15, a motor-pedestal seat 17 and an air cylinder shaft 19. The spin motor 15 can rotate around vertical axis while the air cylinder shaft 19 can move vertically. When a resist 5 is dropped on the wafer 1, the air is supplied to the air cylinder 21 concurrently with the rotation of the spin motor 15, and the air cylinder 19 moves upward. Along with these operations, the chuck 13 moves upward rotating. The resist 5 is spread and applied on the wafer 1, pressed against by the wafer 1.

Abstract: A system is provided for controling a robot operating in association with a rotary table, including a robot, a rotary table, and a control circuit.

Abstract: Synchronous operation of a multi-joint robot and a rotating table is facilitated by the provision of a multi-joint robot controller. The robot controller detects the position of an arm of the multi-joint robot relative to a coordinate system assigned to the multijoint robot and the position of a specific point on the rotating table relative to the same coordinate system. The spatial relationship of the table relative to the multi-joint robot is calculated based on the coordinates of a plurality of positions of the specific point on the rotating table.

Abstract: A tracking robot apparatus has a robot for performing a predetermined operation, a movable device for moving an object of interest, a signal input device for designating operations of the robot and the movable device, an operation device for calculating an operation instruction value of the movable device in response to an input signal from the signal input device, a controller for driving the movable device in accordance with the calculated operation instruction value, an operation device for calculating a position/posture instruction value to keep relative position and posture of the robot and the movable device unchanged upon operation of the movable device, and a controller for driving a robot in accordance with the calculated position/posture instruction value. The movable device is operated in response to the signal from the signal input device, and at the same time the robot is operated such that the relative position and posture of the robot and the movable device are kept unchanged.