Patents by Inventor Yosimitu Kato

Yosimitu Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pattern-forming method and lithographic system
    Patent number: 6093931
    Abstract: A rough pattern exceeding the resolution limit of light exposure is formed by light resolution. A fine pattern not exceeding the resolution limit of light exposure is formed by charge-beam exposure. Combining the rough pattern and the fine pattern produces a desired pattern. The sharing of the work between light exposure and charge-beam exposure exhibits the high throughput of light exposure and the excellent resolving power of charge-beam exposure.
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: July 25, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazuyoshi Sugihara, Hiromi Niiyama, Shunko Magoshi, Atsushi Ando, Tetsuro Nakasugi, Shinji Sato, Yumi Watanabe, Yosimitu Kato, Toru Shibata, Katsuya Okumura
  • Pattern-forming method and lithographic system
    Patent number: 5994030
    Abstract: A rough pattern exceeding the resolution limit of light exposure is formed by light resolution. A fine pattern not exceeding the resolution limit of light exposure is formed by charge-beam exposure. Combining the rough pattern and the fine pattern produces a desired pattern. The sharing of the work between light exposure and charge-beam exposure exhibits the high throughput of light exposure and the excellent resolving power of charge-beam exposure.
    Type: Grant
    Filed: February 26, 1998
    Date of Patent: November 30, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazuyoshi Sugihara, Hiromi Niiyama, Shunko Magoshi, Atsushi Ando, Tetsuro Nakasugi, Shinji Sato, Yumi Watanabe, Yosimitu Kato, Toru Shibata, Katsuya Okumura