Abstract: Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF electrodes RF voltage. The amplitude of the RF voltage applied to inner pair of RF electrodes is lower than the RF voltage applied to outer pair of RF electrodes.

Abstract: A subcutaneous fat treatment system and method. An electrode is for application to a patient's epidermis above subcutaneous fat to be treated. There may optionally be a cooling subsystem for cooling the electrode. A sensor such as a microwave radiometer measures the temperature of the subcutaneous fat to be treated. In addition or in the alternative, a subcutaneous fat thickness measurement may be used. A radio frequency source is for applying radio frequency energy to the electrode. A controller subsystem is responsive to the sensor and/or the subcutaneous fat thickness measurement and controls the radio frequency source to determine the thermal dose applied to the subcutaneous fat being treated and automatically adjust the radio frequency energy supplied to the electrode subjecting the subcutaneous fat to a thermal dose of between 0.1 and 10.0.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: Disclosed is a system and a method for aesthetic skin treatment. The system includes an array of RF electrodes assembled on a flexible or rigid substrate. A plurality of RF voltage generators configured to address individually each of the RF electrodes of the array and supply to each pair of RF electrodes RF voltage. The amplitude of the RF voltage applied to inner pair of RF electrodes is lower than the RF voltage applied to outer pair of RF electrodes.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for skin treatment that includes a frame configured to be applied to a large skin segment. The frame includes a guide and a treatment head. The treatment head is configured to reciprocate on the guide. The treatment head includes a source of energy configured to deliver the energy to a treated skin segment. The energy is delivered in course of reciprocating movement of the treatment head.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: There is provided an image-based system for cosmetic procedures for skin including an applicator including a light energy emitter, a camera operative to capture and communicate to a computer an image of a segment of skin or blemish obtained of the applicator being in contact with the skin and wherein the computer employs information extracted from the image to determine specific optimal treatment doses of at least one of light energy and RF energy for one or more skin fractions within the segment of skin. The system could also include a remote image capturing and processing device with at least one camera.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: An apparatus for cosmetic RF skin treatment where the RF energy supply is isolated from the patient treated, such that in course of treatment no undesired current flows through the subject body.

Abstract: RF skin treatment is provided by applying to the skin an applicator that includes a tip populated by at least one voltage to skin delivering element and an isolating transformer located proximate to the tip to reduce ground currents through parasitic capacitance. The skin impedance is monitored during an RF treatment pulse to ensure that a sufficient amount of energy is delivered to the skin to cause a desired effect. The pulse energy can be increased if the skin impedance is too low. In addition, pain can be alleviated by cutting off the RF pulse if the skin impedance is too high. Further, inefficient RF pulses can be excluded by cutting off the RF energy supply if the skin impedance is too low.