Abstract: A substrate processing apparatus includes: a plurality of roller pairs configured to place a plurality of substrates, respectively, wherein the substrates are arranged side by side in a horizontal direction with a predetermined interval, and rotate the plurality of substrates, respectively, in a circumferential direction; a first, second, and third circulation groove that are disposed along outer peripheral portions of each of the plurality of substrates; a chemical solution supplier configured to supply a chemical solution to the outer peripheral portions of the plurality of substrates through the first circulation groove; a rinse solution supplier configured to supply a rinse solution to the outer peripheral portions of the plurality of substrates through the second circulation groove; and a fluid supplier configured to supply a fluid for drying the rinse solution to the outer peripheral portions of the plurality of substrates through the third circulation groove.

Abstract: A plurality of display panels having a curved surface are placed in a limited space. Two, or three or more display panels are combined to form one display region having a T-shaped outer edge as one screen, and a driver can curve part of the display panel as appropriate so that the driver can see the screen easily. A first display panel or a second display panel has flexibility and includes a position adjustment function of curving an end portion. That is, by curving part of the display panel, the user can see the display panel easily. The in-car design can also be varied.

Abstract: According to an embodiment, a substrate cleaning device includes a processing tank, at least one spray tube, and a scanning mechanism. The processing tank can accommodate a plurality of substrates arranged in a thickness direction of the substrates. The spray tube extends in the thickness direction and is configured to emit a cleaning liquid to each substrate accommodated in the processing tank. The scanning mechanism is configured to move the spray tube along an outer periphery of the substrate to perform a scan.

Abstract: In one embodiment, a semiconductor manufacturing apparatus includes a processor configured to process a film provided on an end portion of a substrate. The apparatus further includes a detector configured to detect information relating to a shape of the end portion of the substrate. The apparatus further includes a controller configured to control the processing of the film by the processor, based on the information relating to the shape of the end portion of the substrate.

Abstract: According to an embodiment, a substrate cleaning device includes a processing tank, at least one spray tube, and a scanning mechanism. The processing tank can accommodate a plurality of substrates arranged in a thickness direction of the substrates. The spray tube extends in the thickness direction and is configured to emit a cleaning liquid to each substrate accommodated in the processing tank. The scanning mechanism is configured to move the spray tube along an outer periphery of the substrate to perform a scan.

Abstract: The present invention aims to provide a coatable diffusing agent composition that can prevent the formation of precipitates, has a longer solution life than conventional PTG solutions free of water, and thus can be stably stored for a long period of time even when this PTG solution is produced in large quantities, and is highly cost effective. The coatable diffusing agent composition of the present invention includes a titanate, a phosphorus compound, water, and an organic solvent.