Patents by Inventor Yosuke OKUYA

Yosuke OKUYA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Processing liquid supplying apparatus, substrate processing apparatus and processing liquid supplying method
    Patent number: 11094564
    Abstract: A processing liquid supplying apparatus supplies a processing liquid to a processing unit which processes a substrate.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: August 17, 2021
    Inventors: Shota Iwahata, Ayumi Higuchi, Eri Fujita, Yoshiyuki Fujitani, Masako Mano, Yusuke Takematsu, Yosuke Okuya
  • Substrate processing apparatus
    Patent number: 10910234
    Abstract: The substrate processing apparatus includes first supply piping which guides a processing liquid from a first branching portion to a first chemical liquid nozzle, first return piping which guides the processing liquid from the first branching portion to a tank, a first pressure-loss setting unit which sets a pressure loss so that a pressure loss through the first supply piping is larger than a pressure loss through the first return piping, and a first discharge valve which switches between a first discharge execution state in which the pressure loss through the first return piping is larger than the pressure loss through the first supply piping and a first discharge stop state in which the pressure loss through the first return piping is smaller than the pressure loss through the first supply piping.
    Type: Grant
    Filed: January 18, 2018
    Date of Patent: February 2, 2021
    Inventor: Yosuke Okuya
  • PROCESSING LIQUID SUPPLYING APPARATUS, SUBSTRATE PROCESSING APPARATUS AND PROCESSING LIQUID SUPPLYING METHOD
    Publication number: 20190131144
    Abstract: A processing liquid supplying apparatus supplies a processing liquid to a processing unit which processes a substrate.
    Type: Application
    Filed: October 24, 2018
    Publication date: May 2, 2019
    Inventors: Shota IWAHATA, Ayumi HIGUCHI, Eri FUJITA, Yoshiyuki FUJITANI, Masako MANO, Yusuke TAKEMATSU, Yosuke OKUYA
  • SUBSTRATE PROCESSING APPARATUS
    Publication number: 20180240685
    Abstract: The substrate processing apparatus includes first supply piping which guides a processing liquid from a first branching portion to a first chemical liquid nozzle, first return piping which guides the processing liquid from the first branching portion to a tank, a first pressure-loss setting unit which sets a pressure loss so that a pressure loss through the first supply piping is larger than a pressure loss through the first return piping, and a first discharge valve which switches between a first discharge execution state in which the pressure loss through the first return piping is larger than the pressure loss through the first supply piping and a first discharge stop state in which the pressure loss through the first return piping is smaller than the pressure loss through the first supply piping.
    Type: Application
    Filed: January 18, 2018
    Publication date: August 23, 2018
    Inventor: Yosuke OKUYA