Patents by Inventor Yosuke Ono

Yosuke Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11042085
    Abstract: Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: June 22, 2021
    Assignees: MITSUI CHEMICALS, INC., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Yosuke Ono, Atsushi Okubo, Kazuo Kohmura, Atsuko Sekiguchi, Yuichi Kato, Takeo Yamada
  • Patent number: 10990001
    Abstract: Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.
    Type: Grant
    Filed: December 18, 2018
    Date of Patent: April 27, 2021
    Assignees: MITSUI CHEMICALS, INC., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Yosuke Ono, Atsushi Okubo, Kazuo Kohmura, Atsuko Sekiguchi, Yuichi Kato, Takeo Yamada
  • Publication number: 20210080824
    Abstract: A support frame for pellicle is provided including a first support frame part, a second support frame part, and a filter, wherein the filter has a flat plate-shaped frame shape and is sandwiched by the first support frame part and the second support frame part, the first support frame part includes a first body part having a flat plate-shaped frame shape and a first engaging portion protruded from the first body part to a thickness direction of the support frame for pellicle, and the second support frame part includes a second body part having a flat plate-shaped frame shape and a second engaging portion of the second body part engaging with the first engaging portion being arranged in a concave part provided in the thickness direction of the support frame for pellicle.
    Type: Application
    Filed: November 20, 2020
    Publication date: March 18, 2021
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Akira ISHIKAWA, Atsushi OKUBO, Yosuke ONO, Kazuo KOHMURA
  • Patent number: 10895805
    Abstract: A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
    Type: Grant
    Filed: October 26, 2017
    Date of Patent: January 19, 2021
    Assignees: MITSUI CHEMICALS, INC., TAZMO CO., LTD.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20210011372
    Abstract: Provided is a supporting frame in which a vent hole detachably arranging a filter and to which a pellicle film for extreme ultraviolet lithography can be attached. A support frame according to an embodiment of the present invention is a support frame for arranging a pellicle film, the support frame has a through hole being made from a hole extending along a first direction, the first direction being almost parallel to a surface direction of the pellicle film, and a hole extending along a second direction, the second direction not being parallel to the first direction; and the support frame includes a filter, the filter arranged at an inside of the through hole or at an end of the through hole, and the filter is arranged apart from the pellicle film.
    Type: Application
    Filed: September 25, 2020
    Publication date: January 14, 2021
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Akira ISHIKAWA, Atsushi OKUBO, Yosuke ONO, Kazuo KOHMURA
  • Publication number: 20200401039
    Abstract: To provide a pellicle in which outgas from an adhesive layer is suppressed. The pellicle includes a pellicle film, a support frame for supporting the pellicle film, a protrusion part arranged in the support frame, a first adhesive layer arranged on the protrusion part; and an inorganic material layer arranged at a position closer to the pellicle film than the first adhesive layer. The inorganic material layer may include a first inorganic material layer arranged at a first side surface of the first adhesive layer, the first side surface of the first adhesive layer intersecting the pellicle film, and arranged at a position closer to the pellicle film.
    Type: Application
    Filed: September 3, 2020
    Publication date: December 24, 2020
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Yosuke ONO, Kazuo KOHMURA, Atsushi OKUBO, Daiki TANEICHI, Hisako ISHIKAWA, Tsuneaki BIYAJIMA
  • Patent number: 10606169
    Abstract: The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: March 31, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Takashi Kozeki, Daiki Taneichi, Shintaro Maekawa, Yosuke Ono, Tsuneaki Biyajima
  • Patent number: 10585348
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a method for producing the same, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame supporting the first frame; a through-hole running through the first frame; and a filter covering the through-hole on the side of a surface of the first frame on which the pellicle film is located. The through-hole may run through the pellicle film; and the filter may be located on the pellicle film. The filter may be located, adjacent to the pellicle film, on the first frame.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: March 10, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Takashi Kozeki, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Atsushi Okubo, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20200064729
    Abstract: A pellicle for EUV exposure that has a high transmittance to EUV light, causes little outgassing, and is not much contaminated, and a method for manufacturing the same are provided. A pellicle (100) includes a pellicle film (101); a support frame (103); and a first adhesive layer (109) provided at an end of the support frame, the end being opposite to an end on which the pellicle film is extended. The pellicle further includes an inorganic layer (111) on a side surface of the first adhesive layer, the side surface extending in a direction crossing a surface of the pellicle film, and the pellicle film being extended on the side surface. The inorganic layer has a mass absorption coefficient (?m) in the range of 5×103 cm2/g to 2×105 cm2/g.
    Type: Application
    Filed: February 9, 2018
    Publication date: February 27, 2020
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Kazuo KOHMURA, Yosuke ONO, Atsushi OKUBO, Daiki TANEICHI, Hisako ISHIKAWA, Tsuneaki BIYAJIMA
  • Patent number: 10488751
    Abstract: Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: November 26, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Daiki Taneichi, Yosuke Ono, Hisako Ishikawa, Tsuneaki Biyajima, Atsushi Okubo, Yasuyuki Sato, Toshiaki Hirota
  • Publication number: 20190129300
    Abstract: Provided are a pellicle film, a pellicle frame and a pellicle having a higher EUV transmittance. An exposure pattern plate capable of performing EUV lithography with the pellicle film, the pellicle frame or the pellicle, and a method for producing a semiconductor device, are provided. A pellicle film for exposure extendable over an opening of a support frame and having a thickness of 200 nm or less is provided. The film includes a carbon nanotube sheet. The carbon nanotube sheet includes bundles each including a plurality of carbon nanotubes, the bundles each have a diameter of 100 nm or shorter, and the bundles are aligned in a planar direction in the carbon nanotube sheet.
    Type: Application
    Filed: December 18, 2018
    Publication date: May 2, 2019
    Applicants: MITSUI CHEMICALS, INC., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Yosuke Ono, Atsushi Okubo, Kazuo Kohmura, Atsuko Sekiguchi, Yuichi Kato, Takeo Yamada
  • Publication number: 20190121229
    Abstract: Provided is a pellicle film, a pellicle frame and a pellicle for EUV decreased in the amount of dust or the like attached thereto, and a method for producing the same. Provided is a method for producing a pellicle including forming a pellicle film above a substrate; forming a metal mask on a surface of the substrate opposite to a surface having the pellicle film formed thereon; removing a part of the substrate from the side of the metal mask; and removing the metal mask. In an embodiment, the present invention provides a pellicle film, a pellicle frame and a pellicle for EUV decreased in the amount of dust or the like attached thereto, and a method for producing the same.
    Type: Application
    Filed: December 17, 2018
    Publication date: April 25, 2019
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Atsushi Okubo, Yosuke Ono, Kazuo Kohmura, Yasuhisa Fujii, Wataru Yoshikawa
  • Patent number: 10261411
    Abstract: A pellicle is contaminated with dust or the like for various reasons during the production thereof. Especially, there is a problem that the risk that the dust or the like is attached is high during trimming or various other processes performed on a pellicle film. The present invention provides a method for producing a pellicle for EUV that decreases the attachment of dust or the like. A method for producing a pellicle includes forming a pellicle film on a substrate; trimming the substrate; and removing at least a part of the substrate after trimming the substrate. Before the part of the substrate is removed, at least particles attached to a surface of the pellicle film are removed.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: April 16, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Atsushi Okubo, Tsuneaki Biyajima, Yosuke Ono, Kazuo Kohmura, Yasuhisa Fujii, Nobuko Matsumoto
  • Patent number: 10216081
    Abstract: A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: February 26, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Yosuke Ono, Daiki Taneichi, Yasuyuki Sato, Toshiaki Hirota
  • Patent number: 10185217
    Abstract: A pellicle frame containing a frame body, the frame body having a groove formed in one end surface of the frame body, the one end surface being an end surface in a thickness direction of the frame body that is located at a side configured to support a pellicle membrane, and a through-hole that penetrates through a portion between an outer circumferential surface of the frame body and a wall surface of the groove formed in the one end surface.
    Type: Grant
    Filed: April 27, 2015
    Date of Patent: January 22, 2019
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kazuo Kohmura, Yosuke Ono, Daiki Taneichi, Yasuyuki Sato, Toshiaki Hirota
  • Patent number: 10108084
    Abstract: A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.
    Type: Grant
    Filed: May 12, 2015
    Date of Patent: October 23, 2018
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Yosuke Ono, Kazuo Kohmura
  • Patent number: 10106660
    Abstract: Disclosed is a film composed of a resin having a thiourethane bond, wherein the molar ratio (S/N) of sulfur to nitrogen contained in the resin is equal to or more than 0.8 and less than 3. A method for manufacturing a film is also disclosed. The disclosed film is excellent in a balance among high refractive index, low birefringence and light transmittance, and further excellent in a balance of mechanical characteristics such as toughness, hardness and dimensional stability, so that effects of deformation and the like during processing are very small, and the film is further excellent in solvent resistance as well.
    Type: Grant
    Filed: May 20, 2016
    Date of Patent: October 23, 2018
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Hisako Ishikawa, Toshinori Matsuda, Yosuke Ono, Kazuo Yagi, Akifumi Kagayama
  • Publication number: 20180239242
    Abstract: The purpose of the present invention is to provide: a pellicle frame which is not susceptible to deterioration even if irradiated with short-wavelength light such as excimer light, and which is not susceptible to generation of an outgas or foreign substance; and a pellicle which uses this pellicle frame. In order to achieve the above-described purpose, this pellicle frame for supporting the outer periphery of a pellicle film is configured to comprise a frame and a film that is formed on the surface of the frame and contains a polyimide resin.
    Type: Application
    Filed: August 15, 2016
    Publication date: August 23, 2018
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kazuo KOHMURA, Takashi KOZEKI, Daiki TANEICHI, Shintaro MAEKAWA, Yosuke ONO, Tsuneaki BIYAJIMA
  • Publication number: 20180046071
    Abstract: A method for producing a pellicle according to the one embodiment of the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
    Type: Application
    Filed: October 26, 2017
    Publication date: February 15, 2018
    Applicants: MITSUI CHEMICALS, INC., TAZMO CO., LTD.
    Inventors: Kazuo KOHMURA, Daiki TANEICHI, Yosuke ONO, Hisako ISHIKAWA, Tsuneaki BIYAJIMA, Yasuyuki SATO, Toshiaki HIROTA
  • Patent number: 9841670
    Abstract: Provided is a support frame for pellicles which includes an aluminum alloy-made frame body with a pellicle film bonded to a front surface of the frame body, and with a glass substrate bonded to a back surface of the frame body. A front-side recessed groove extending in a circumferential direction of the frame body is formed on the front surface of the frame body, and a front-side suction hole extending from an outer peripheral surface of the frame body to an inner surface of the front-side recessed groove is formed on the frame body.
    Type: Grant
    Filed: May 11, 2015
    Date of Patent: December 12, 2017
    Assignee: NIPPON LIGHT METAL COMPANY, LTD.
    Inventors: Kazuo Kohmura, Yosuke Ono, Daiki Taneichi, Yasuyuki Sato, Toshiaki Hirota, Kiyokazu Koga