Abstract: An information processing apparatus includes an acquisition unit configured to acquire a plurality of pieces of collected data collected in a state where lithographic processing is executed by a lithography apparatus for forming a pattern by applying a plurality of processing conditions, a classification unit configured to classify the acquired data based on the processing conditions, a judgement unit configured to judge that an abnormality has occurred in the acquired collected data by judging whether the collected data falls within an allowable range specified based on the processing conditions.

Abstract: The present invention provides an imprint apparatus which forms a relief pattern in an imprint material on a substrate using a mold, the apparatus including a curing unit configured to cure the imprint material, a moving unit configured to relatively move the mold and the substrate, a detection unit configured to detect a pattern of light reflected by the mold and light reflected by the substrate, and a processing unit configured to obtain information on a separation state of the mold and the cured imprint material on the substrate based on the pattern detected by the detection unit while separating the mold from the imprint material by widening, using the moving unit, an interval between the mold and the substrate.

Abstract: An information processing apparatus includes an acquisition unit configured to acquire a plurality of pieces of collected data collected in a state where lithographic processing is executed by a lithography apparatus for forming a pattern by applying a plurality of processing conditions, a classification unit configured to classify the acquired data based on the processing conditions, a judgement unit configured to judge that an abnormality has occurred in the acquired collected data by judging whether the collected data falls within an allowable range specified based on the processing conditions.

Abstract: The present invention provides an imprint apparatus which forms a relief pattern in an imprint material on a substrate using a mold, the apparatus including a curing unit configured to cure the imprint material, a moving unit configured to relatively move the mold and the substrate, a detection unit configured to detect a pattern of light reflected by the mold and light reflected by the substrate, and a processing unit configured to obtain information on a separation state of the mold and the cured imprint material on the substrate based on the pattern detected by the detection unit while separating the mold from the imprint material by widening, using the moving unit, an interval between the mold and the substrate.