Abstract: A processing system is a processing system that is configured to process an object by irradiating the object with an energy beam, and includes: a placing apparatus on which the object is placed; an irradiation apparatus that is configured to irradiate the object with the energy beam; and a light reception apparatus that includes: a beam passing member having an attenuation area in which the energy beam is attenuated and a plurality of passing areas through each of which the energy beam is allowed to pass; and a light reception part that is configured to optically receive the energy beam that has passed through the plurality of passing areas.

Abstract: A processing apparatus is a processing apparatus that irradiates a surface of an object with processing light to process an object and is provided with: a light irradiation apparatus that emits first processing light to form a first irradiation area on the surface and emits second processing light to form a second irradiation area, at least a part of which overlaps with the first irradiation area, on the surface, and has a change member that is configured to change a state of an overlap between the first and second irradiation areas.

Abstract: A processing system has: an irradiation optical system irradiating an object with an energy beam from a light source; an object placing apparatus on which the object is placed; a light receiving apparatus that is disposed at the object placing apparatus and that optically receives the energy beam from the irradiation optical system; and a measurement apparatus that measures at least one of the light receiving apparatus and a part that is related to the light receiving apparatus. The processing system moves the object placing apparatus to a position at which the light receiving apparatus optically receives the energy beam and moves the object placing apparatus to a position at which the measurement apparatus measures a position of the light receiving apparatus. .

Abstract: A processing apparatus has: a light irradiation apparatus configured to irradiate a coat formed on a base member with a processing light; and a controlling apparatus configured to control the light irradiation apparatus. The processing apparatus is configured to change a thickness of at least a part of the coat by irradiating the coat with the processing light so that the base member is not exposed from the coat.

Abstract: A processing system has: a housing that houses an object; a processing apparatus that is disposed in the housing and that processes the object; a measurement apparatus that is disposed in the housing and that measures the object processed by the processing apparatus; and a control apparatus that sets a processing condition by using a measured result of the object.

Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a plurality of processing lights; and a first change apparatus that changes a relative positional relationship between light concentration positions of the plurality of processing lights in a direction that intersects with the surface of the object, the processing apparatus changes a thickness of a part of the object by irradiating the surface of the object with the plurality of processing lights.

Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a partition member that surrounds a space including an optical path between the surface of the object and an optical member that is disposed at the most object side in an optical system of the light irradiation apparatus that allows the processing light to pass therethrough.

Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.

Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; a first position change apparatus that changes a position of at least one of the object and an irradiation area that is formed on the surface of the object by the light irradiation apparatus; and a control apparatus that controls the first position change apparatus to form a structure for reducing a frictional resistance of the surface of the object to a fluid by irradiating the surface of the object with the processing light while changing the position of at least one of the irradiation area and the object to change a thickness of a part of the object.

Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a plurality of processing lights; and a first change apparatus that changes an intensity distribution of the plurality of processing lights from the light irradiation apparatus on the surface of the object, the processing apparatus changes a thickness of a part of the object by irradiating the surface of the object with the plurality of processing lights.

Abstract: A processing apparatus has: a light irradiation apparatus that irradiates a surface of an object with a processing light; and a measurement apparatus that measures a position of an irradiation area, which is formed on the surface of the object by the light irradiation apparatus, relative to the object.

Abstract: An apparatus and method effectively isolate vibrations in a lithography machine. The apparatus and method include a first control for actively reducing the vibrations in a first frequency range and a second control for actively reducing the vibrations in a second frequency range. The first control further includes a first actuator such as a force actuator and a static reference object with which relatively low-frequency vibrations are reduced. The second control further includes a second actuator such as a Piezo actuator and an air spring in which relatively high-frequency vibrations are reduced. The apparatus and method are applied to substantially prevent the vibrations on the floor from traveling to the mask stage in one embodiment.

Abstract: A high performance pneumatic spring apparatus is provided without increasing the sizes of the apparatus. The pneumatic spring apparatuses KB1-KB4 are provided with gas chambers AR filled with a gas at a prescribed pressure. The gas chamber AR is provided with an adjustment apparatus SW for adjusting a temperature change due to the capacity change of the gas chamber AR.