Patents by Inventor You-Dong Lim

You-Dong Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor manufacturing device
    Patent number: 7862659
    Abstract: The present invention relates to a semiconductor manufacturing device that a maintenance or a repairing is easy so that an efficiency of manufacturing can be enhanced because a high temperature of a susceptor can be rapidly down. The present invention relates to a semiconductor manufacturing device that an efficiency of manufacturing can be enhanced because a heater for heating the semiconductor is heated by an external heating device.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: January 4, 2011
    Assignee: TTS Co., Ltd.
    Inventors: You-Dong Lim, Jae-Ho Byun
  • SEMICONDUCTOR MANUFACTURING DEVICE
    Publication number: 20090013933
    Abstract: The present invention relates to a semiconductor manufacturing device that a maintenance or a repairing is easy so that an efficiency of manufacturing can be enhanced because a high temperature of a susceptor can be rapidly down. The present invention relates to a semiconductor manufacturing device that an efficiency of manufacturing can be enhanced because a heater for heating the semiconductor is heated by an external heating device.
    Type: Application
    Filed: June 12, 2008
    Publication date: January 15, 2009
    Inventors: You-Dong Lim, Jae-Ho Byun
  • Gas heating apparatus for chemical vapor deposition process and semiconductor device fabrication method using same
    Patent number: 6845732
    Abstract: The present invention provides a gas heating apparatus that activates reaction gases for a chemical vapor deposition. The gas heating apparatus includes a chamber becoming enclosures of the gas heating apparatus; a heat insulating material 20 formed on an inner surface of the chamber so as to thermally insulate the inside of the chamber from the outside; a quartz tube having a gas inflow pipe, a gas outflow pipe, enlarged-pipe portions and abridged-pipe portion, wherein the enlarged-pipe portions and the abridged-pipe portions are alternately repeated and constitute a zigzag shape in an up-and-down direction in the chamber; a plurality of ceramic balls located inside the enlarged-pipe portions of the quartz tube; and a heater having a shape of coil spring and surrounding the zigzag shape of the quartz tube in the chamber.
    Type: Grant
    Filed: March 12, 2003
    Date of Patent: January 25, 2005
    Assignee: Jusung Engineering Co., Ltd.
    Inventor: You-Dong Lim
  • Gas heating apparatus for chemical vapor deposition process and semiconductor device fabrication method using same
    Publication number: 20030221617
    Abstract: The present invention provides a gas heating apparatus that activates reaction gases for a chemical vapor deposition. The gas heating apparatus includes a chamber becoming enclosures of the gas heating apparatus; a heat insulating material 20 formed on an inner surface of the chamber so as to thermally insulate the inside of the chamber from the outside; a quartz tube having a gas inflow pipe, a gas outflow pipe, enlarged-pipe portions and abridged-pipe portion, wherein the enlarged-pipe portions and the abridged-pipe portions are alternately repeated and constitute a zigzag shape in an up-and-down direction in the chamber; a plurality of ceramic balls located inside the enlarged-pipe portions of the quartz tube; and a heater having a shape of coil spring and surrounding the zigzag shape of the quartz tube in the chamber.
    Type: Application
    Filed: March 12, 2003
    Publication date: December 4, 2003
    Inventor: You-Dong Lim