Abstract: An integrated circuit chip is provided. The integrated circuit chip includes a pad, a first resistor, a second resistor, a first switch, a second switch and a controller. The first resistor and the first switch are serially connected between the pad and a first reference voltage terminal. The second resistor and the second switch are serially connected between the pad and a second reference voltage terminal. The controller selectively turns on and off the first and second switches according to an error determining mechanism. The error determining mechanism determines whether an error condition associated with the pad is present.

Abstract: An integrated circuit chip is provided. The integrated circuit chip includes a pad, a first resistor, a second resistor, a first switch, a second switch and a controller. The first resistor and the first switch are serially connected between the pad and a first reference voltage terminal. The second resistor and the second switch are serially connected between the pad and a second reference voltage terminal. The controller selectively turns on and off the first and second switches according to an error determining mechanism. The error determining mechanism determines whether an error condition associated with the pad is present.

Abstract: A semiconductor device and its method of manufacture are provided. Embodiments forming an active region in a semiconductor substrate, wherein the active region is bounded by an isolation region; forming a first doped region within the active region; forming a gate electrode over the active region, wherein the gate electrode overlies a portion of the first doped region; forming at least one dielectric layer over sidewalls of the gate electrode; forming a pair of spacers on the dielectric layer; and forming a second doped region substantially within the portion of the first doped region adjacent the one of the spacers and spaced apart from the one of the spacers. The first and second doped regions may form a double diffused drain structure as in an HVMOS transistor.

Abstract: A multi-chip module package is provided, which includes a first chip mounted on via a first conductive adhesive and electrically connected to a first chip carrier, a second chip mounted on via a second conductive adhesive and electrically connected to a second chip carrier which is spaced apart from the first chip carrier, wherein the second conductive adhesive is made of an adhesive material the same as that of the first conductive material, a plurality of conductive elements to electrically connect the first chip to the second chip and an encapsulant encapsulating the first chip, the first chip carrier, the second chip, the second chip carrier and the plurality of conductive elements, allowing a portion of both chip carriers to be exposed to the encapsulant, so that the first chip and second chip are able to be insulated by the separation of the first and second chip carriers.

Abstract: A Schottky device and a semiconductor process of making the same are provided. The Schottky device comprises a substrate, a deep well, a Schottky contact, and an Ohmic contact. The substrate is doped with a first type of ions. The deep well is doped with a second type of ions, and formed in the substrate. The Schottky contact contacts a first electrode with the deep well. The Ohmic contact contacts a second electrode with a heavily doped region with the second type of ions in the deep well. Wherein the deep well has a geometry gap with a width formed under the Schottky contact, the first type of ions and the second type of ions are complementary, and the width of the gap adjusts the breakdown voltage.

Abstract: A semiconductor device and its method of manufacture are provided. Embodiments forming an active region in a semiconductor substrate, wherein the active region is bounded by an isolation region; forming a first doped region within the active region; forming a gate electrode over the active region, wherein the gate electrode overlies a portion of the first doped region; forming at least one dielectric layer over sidewalls of the gate electrode; forming a pair of spacers on the dielectric layer; and forming a second doped region substantially within the portion of the first doped region adjacent the one of the spacers and spaced apart from the one of the spacers. The first and second doped regions may form a double diffused drain structure as in an HVMOS transistor.

Abstract: A semiconductor device and its method of manufacture are provided. Embodiments include forming a first doped region and a second doped region. The first and second doped regions may form a double diffused drain structure as in an HVMOS transistor. A gate-side boundary of the first doped region underlies part of the gate electrode. The second doped region is formed within the first doped region adjacent the gate electrode. A gate-side boundary of the second doped region is separated from a closest edge of a gate electrode spacer by a first distance. An isolation region-side boundary of the second doped region is separated from a closest edge of a nearest isolation region by a second distance.

Abstract: A semiconductor device. The semiconductor device comprises an isolation structure and two heavily doped regions of a second conductivity type spaced apart from each other by the isolation structure. The isolation structure comprises an isolation region in a semiconductor substrate and a heavily doped region of the first conductivity type. The isolation region has an opening and the heavily doped region of the first conductivity type is substantially surrounded by the opening of the isolation region.

Abstract: The present invention discloses a semiconductor structure. A buried layer of a first polarity type is constructed on a semiconductor substrate. A first epitaxial layer of a second polarity type is formed on the buried layer. A second epitaxial layer of the second polarity type is formed on the buried layer. An isolation structure of the first polarity type is formed between the first and second epitaxial layers on the buried layer. A first well of the second polarity type is formed on the first epitaxial layer. A second well of the second polarity type is formed on the second epitaxial layer. A third well of the first polarity type is formed between the first and second wells, on the isolation structure. The isolation structure interfaces with the buried layer and the third well, thereby substantially blocking a leakage current path between the first and the second wells.

Abstract: The high voltage integrated circuit comprises a P substrate. An N well barrier is disposed in the substrate. Separated P diffusion regions forming P wells are disposed in the substrate for serving as the isolation structures. The low voltage control circuit is located outside the N well barrier. A floating circuit is located inside the N well barrier. In order to develop a high voltage junction barrier in between the floating circuit and the substrate, the maximum space of devices of the floating circuit is restricted.

Abstract: The present invention proposes a voltage-clipping device utilizing a pinch-off mechanism formed by two depletion boundaries. A clipping voltage of the voltage-clipping device can be adjusted in response to a gate voltage; a gap of a quasi-linked well; and a doping concentration and a depth of the quasi-linked well and a well with complementary doping polarity to the quasi-linked well. The voltage-clipping device can be integrated within a semiconductor device as a voltage stepping down device in a tiny size, compared to traditional transformers.

Abstract: A switching circuit for power converters is presented. It includes a voltage-clipping device, a resistive device, a first transistor and a second transistor. The voltage-clipping device is coupled to an input voltage. The first transistor is connected in series with the voltage-clipping device for switching the input voltage. The second transistor is coupled to control the first transistor and the voltage-clipping device in response to a control signal. The resistive device provides a bias voltage to turn on the voltage-clipping device and the first transistor when the second transistor is turned off. Once the second transistor is turned on, the first transistor is turned off and the voltage-clipping device is negatively biased. The voltage-clipping device is developed to clamp a maximum voltage for the first transistor.

Abstract: A multi-chip module package is provided, which includes a first chip mounted on via a first conductive adhesive and electrically connected to a first chip carrier, a second chip mounted on via a second conductive adhesive and electrically connected to a second chip carrier which is spaced apart from the first chip carrier, wherein the second conductive adhesive is made of an adhesive material the same as that of the first conductive material, a plurality of conductive elements to electrically connect the first chip to the second chip and an encapsulant encapsulating the first chip, the first chip carrier, the second chip, the second chip carrier and the plurality of conductive elements, allowing a portion of both chip carriers to be exposed to the encapsulant, so that the first chip and second chip are able to be insulated by the separation of the first and second chip carriers.

Abstract: A semiconductor device includes a substrate having a source, a drain, and a gate between the source and the drain. Both the source and the drain include a first edge, and the gate includes a first portion. A first deep trench structure is situated under the first portion of the gate and proximate to the first edge of the source and the first edge of the drain.

Abstract: A transistor of an integrated circuit is provided. A first doped well region is formed in a well layer at a first active region. At least part of the first doped well region is adjacent to a gate electrode of the transistor. A recess is formed in the first doped well region, and the recess preferably has a depth of at least about 500 angstroms. A first isolation portion is formed on an upper surface of the well layer at least partially over an isolation region. A second isolation portion is formed at least partially in the recess of the first doped well region. At least part of the second isolation portion is lower than the first isolation portion. A drain doped region is formed in the recess of the first doped well region. The second isolation portion is located between the gate electrode and the drain doped region.

Abstract: A Schottky device and a semiconductor process of making the same are provided. The Schottky device comprises a substrate, a deep well, a Schottky contact, and an Ohmic contact. The substrate is doped with a first type of ions. The deep well is doped with a second type of ions, and formed in the substrate. The Schottky contact contacts a first electrode with the deep well. The Ohmic contact contacts a second electrode with a heavily doped region with the second type of ions in the deep well. Wherein the deep well has a geometry gap with a width formed under the Schottky contact, the first type of ions and the second type of ions are complementary, and the width of the gap adjusts the breakdown voltage.

Abstract: The high voltage integrated circuit comprises a P substrate. An N well barrier is disposed in the substrate. Separated P diffusion regions forming P wells are disposed in the substrate for serving as the isolation structures. The low voltage control circuit is located outside the N well barrier. A floating circuit is located inside the N well barrier. In order to develop a high voltage junction barrier in between the floating circuit and the substrate, the maximum space of devices of the floating circuit is restricted.

Abstract: The present invention proposes a voltage-clipping device utilizing a pinch-off mechanism formed by two depletion boundaries. A clipping voltage of the voltage-clipping device can be adjusted in response to a gate voltage; a gap of a quasi-linked well; and a doping concentration and a depth of the quasi-linked well and a well with complementary doping polarity to the quasi-linked well. The voltage-clipping device can be integrated within a semiconductor device as a voltage stepping down device in a tiny size, compared to traditional transformers.

Abstract: A switching circuit for power converters is presented. It includes a voltage-clipping device, a resistive device, a first transistor and a second transistor. The voltage-clipping device is coupled to an input voltage. The first transistor is connected in series with the voltage-clipping device for switching the input voltage. The second transistor is coupled to control the first transistor and the voltage-clipping device in response to a control signal. The resistive device provides a bias voltage to turn on the voltage-clipping device and the first transistor when the second transistor is turned off. Once the second transistor is turned on, the first transistor is turned off and the voltage-clipping device is negatively biased. The voltage-clipping device is developed to clamp a maximum voltage for the first transistor.

Abstract: A semiconductor device includes a substrate having a source, a drain, and a gate between the source and the drain. Both the source and the drain include a first edge, and the gate includes a first portion. A first deep trench structure is situated under the first portion of the gate and proximate to the first edge of the source and the first edge of the drain.