Patents by Inventor You Mimura

You Mimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8174757
    Abstract: A multi-layer optical thin film filter comprising plural deposited optical thin films, wherein optical thin film thickness for each of said optical thin films has a predetermined wavelength spectrum in a predetermined gain equalization band and a predetermined wavelength spectrum in a pumping light transmission band other than said gain equalization band.
    Type: Grant
    Filed: July 26, 2010
    Date of Patent: May 8, 2012
    Assignee: The Furukawa Electric Co., Ltd.
    Inventors: Takahiro Itoh, You Mimura
  • Publication number: 20100284062
    Abstract: A multi-layer optical thin film filter comprising plural deposited optical thin films, wherein optical thin film thickness for each of said optical thin films has a predetermined wavelength spectrum in a predetermined gain equalization band and a predetermined wavelength spectrum in a pumping light transmission band other than said gain equalization band.
    Type: Application
    Filed: July 26, 2010
    Publication date: November 11, 2010
    Applicant: THE FURUKAWA ELECTRIC CO., LTD.
    Inventors: Takahiro ITOH, You MIMURA
  • Publication number: 20070223008
    Abstract: A multi-layer optical thin film filter comprising plural deposited optical thin films, wherein optical thin film thickness for each of said optical thin films has a predetermined wavelength spectrum in a predetermined gain equalization band and a predetermined wavelength spectrum in a pumping light transmission band other than said gain equalization band.
    Type: Application
    Filed: May 21, 2007
    Publication date: September 27, 2007
    Inventors: Takahiro Itoh, You Mimura
  • Publication number: 20040032591
    Abstract: A wavelength determining apparatus for thin film thickness monitoring light so as to determine the wavelength of the monitoring light which is projected to an optical thin film under deposition and transmitted through or reflecting from the optical thin film, comprising a means, related to optical intensity change of the monitoring light, to calculate a first stopping index value to stop deposition of said optical thin film whose thin film thickness reaches desired thin film thickness in each nominated wavelength of the plural monitoring light, and a means to determine the nominated wavelength of the monitoring light in the plural monitoring light based on the first stopping index value of each calculated nominated wavelength.
    Type: Application
    Filed: December 27, 2002
    Publication date: February 19, 2004
    Inventors: Takahiro Itoh, You Mimura