Patents by Inventor You Rim Shin

You Rim Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating composition for photoresist underlayer
    Patent number: 12055854
    Abstract: A coating composition comprising a crosslinkable polyester polymer comprising an isocyanurate group and a crosslinkable group; a crosslinker; and an acid catalyst, wherein at least one of the crosslinkable polyester polymer and the crosslinker comprises an iodine-containing polymer.
    Type: Grant
    Filed: December 30, 2020
    Date of Patent: August 6, 2024
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jin Hong Park, Yoo-Jin Ghang, Suwoong Kim, You Rim Shin, Jung June Lee, Jae Hwan Sim
  • PHOTORESIST UNDERLAYER COMPOSITION
    Publication number: 20240201591
    Abstract: A composition comprising a polymer, the polymer comprising: repeating units derived from a monomer of Formula A1, Formula A2, or Formula A3, repeating units derived from a monomer of Formula B1, Formula B2, Formula B3, or Formula B4, and repeating units derived from a monomer of Formula C1 or Formula C2, the structures of each as described herein. A coated substrate including a substrate, a photoresist underlayer formed from composition above, and a photoresist layer on the photoresist underlayer.
    Type: Application
    Filed: November 28, 2022
    Publication date: June 20, 2024
    Inventors: Yoo-Jin GHANG, Jae-Yun AHN, You Rim SHIN, Jung-June LEE, Jae-Hwan SIM
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20230418161
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Application
    Filed: September 11, 2023
    Publication date: December 28, 2023
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
  • Coating compositions for use with an overcoated photoresist
    Patent number: 11822248
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: November 21, 2023
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim
  • Underlying coating compositions for use with photoresists
    Patent number: 11500291
    Abstract: New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.
    Type: Grant
    Filed: October 31, 2017
    Date of Patent: November 15, 2022
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
    Inventors: Jung-June Lee, Jae-Yun Ahn, You-Rim Shin, Jin-Hong Park, Jae-Hwan Sim
  • COATING COMPOSITION FOR PHOTORESIST UNDERLAYER
    Publication number: 20210200093
    Abstract: A coating composition comprising a crosslinkable polyester polymer comprising an isocyanurate group and a crosslinkable group; a crosslinker; and an acid catalyst, wherein at least one of the crosslinkable polyester polymer and the crosslinker comprises an iodine-containing polymer.
    Type: Application
    Filed: December 30, 2020
    Publication date: July 1, 2021
    Inventors: Jin Hong Park, Yoo-Jin Ghang, Suwoong Kim, You Rim Shin, Jung June Lee, Jae Hwan Sim
  • UNDERLYING COATING COMPOSITIONS FOR USE WITH PHOTORESISTS
    Publication number: 20190129305
    Abstract: New composition and methods are provided that include antireflective compositions that can exhibit enhanced etch rates in standard plasma etchants. Preferred antireflective coating compositions of the invention have decreased carbon content relative to prior compositions.
    Type: Application
    Filed: October 31, 2017
    Publication date: May 2, 2019
    Inventors: Jung-June Lee, Jae-Yun Ahn, You-Rim Shin, Jin-Hong Park, Jae-Hwan Sim
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20180364575
    Abstract: In a preferred aspect, organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more substituted uracil moieties; and 2) one or more reacted dicarboxylic acid groups.
    Type: Application
    Filed: June 15, 2017
    Publication date: December 20, 2018
    Inventors: Hye-Won Lee, Jae Hwan Sim, Soo Jung Leem, Jin Hong Park, You Rim Shin
  • COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST
    Publication number: 20170123319
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that in a first aspect comprise a crosslinker component that comprises a structure of the following Formula (I):
    Type: Application
    Filed: October 28, 2016
    Publication date: May 4, 2017
    Inventors: Eui-Hyun Ryu, Jin Hong Park, You Rim Shin, Ji-Hon Kang, Jung-June Lee, Jae-Bong Lim