Abstract: A management method, a computer performs an acquisition of video data from a monitoring terminal, an acquisition of a first event and a detection time of the first event from the video data; and a display of the detection time of the first event and an icon corresponding to a type of the first event, in a form according to the importance of the first event, on a display devise.

Abstract: A management device that includes an instruction unit that acquires metadata of video data of an area to be monitored generated by a monitoring terminal that detects an event from the video data, outputs, in response to an acquisition of metadata including information about the event, an analysis instruction for the video data of the area to be monitored imaged in a time zone including a time of detection of the event to a video analysis device that detects the event from the video data, and acquires an analysis result including information about the event detected from the video data by an analysis by the video analysis device, and an estimation unit that estimates a case event that has occurred in the area to be monitored based on the event detected by the monitoring terminal and the event detected by the video analysis device.

Abstract: The present invention reduces the amount of processing related to the analysis of video data. A detection time determination unit (11) determines a detection time for detecting a second event before or after a first event in time series from the video data on the basis of a time when the first event is detected from the video data, and an event detection unit (12) detects the second event from the video data in the detection time.

Abstract: An appropriate response to an event is recommended to a monitoring person. An event detection unit (12) detects an event based on video data, and an alert unit (13) issues a first alert when a first event is detected, and issues a second alert that is distinguished from the first alert when a second event relating to the first event is further detected in addition to the first event.

Abstract: It is an object of the present invention to provide an agent for enhancing phagocytosis ability, specifically an agent for enhancing phagocytosis ability that functions as a therapeutic agent or therapeutic adjunct for various bacterial infectious diseases, viral infectious diseases, fungal infectious diseases, parasitic infectious diseases, and mixed infectious diseases thereof by enhancing phagocytosis ability of neutrophils. The above-mentioned object is achieved by an agent for enhancing phagocytosis ability including HRG as an active ingredient. The inventors of the present invention have focused attention on the function of HRG on regulation of neutrophil activities, and as the result of extensive investigations, have newly found that HRG effectively enhances phagocytosis ability against a pathogen or foreign matter derived from bacteria, viruses, fungi, parasites, and the like among the neutrophil activities.

Abstract: Polishing compositions are disclosed which contribute to improvement of level difference performance (in particular, erosion). The polishing composition used for polishing an object to be polished includes abrasive grains and a dispersing medium, wherein the abrasive grains have an average primary particle size of 40 nm or less, and the number of coarse particles having a particle size of 0.2 to 1,600 ?m in the abrasive grains is 20,000 or less per 1 cm3 of the polishing composition.

Abstract: To provide a novel polishing composition which contributes to improvement of level difference performance (in particular, erosion). The polishing composition used for polishing an object to be polished includes abrasive grains and a dispersing medium, wherein the abrasive grains have an average primary particle size of 40 nm or less, and the number of coarse particles having a particle size of 0.2 to 1,600 ?m in the abrasive grains is 20,000 or less per 1 cm3 of the polishing composition.

Abstract: A first grille member extends from the left side of the vehicular body toward the right side. A second grille member extends from the first grille member further toward the right side. A first pivot shaft is provided at the left side of the vehicular body. The first pivot shaft extends in the top-bottom direction of the vehicular body and pivotably supports the first grille member. A second pivot shaft extends in parallel with the first pivot shaft and couples the second grille member to the first grille member so that the second grille member is pivotable with respect to the first grille member. A fan module is pivotable about a third pivot shaft provided at the left side of the vehicular body and extending in parallel with the first pivot shaft, and at least a part of the fan module is movable to an outside of the vehicular body.

Abstract: A first grille member extends from the left side of the vehicular body toward the right side. A second grille member extends from the first grille member further toward the right side. A first pivot shaft is provided at the left side of the vehicular body. The first pivot shaft extends in the top-bottom direction of the vehicular body and pivotably supports the first grille member. A second pivot shaft extends in parallel with the first pivot shaft and couples the second grille member to the first grille member so that the second grille member is pivotable with respect to the first grille member. A fan module is pivotable about a third pivot shaft provided at the left side of the vehicular body and extending in parallel with the first pivot shaft, and at least a part of the fan module is movable to an outside of the vehicular body.

Abstract: A polishing composition of the present invention contains a water-soluble polymer having a hydrophilic group, and abrasive grains. A hydrophobic silicon-containing part after being polished with the polishing composition has a water contact angle lower than that of the hydrophobic silicon-containing part after being polished with another composition having the same makeup as the polishing composition except that the water-soluble polymer is not contained therein. Examples of the water-soluble polymer include polysaccharides and alcohol compounds. Another polishing composition of the present invention contains abrasive grains having a silanol group, and a water-soluble polymer. When this polishing composition is left to stand for one day in an environment at a temperature of 25° C., the water-soluble polymer is adsorbed on the abrasive grains at 5,000 or more molecules per 1 ?m2 of surface area of the abrasive grains.

Abstract: A polishing composition of the present invention contains a water-soluble polymer having a hydrophilic group, and abrasive grains. A hydrophobic silicon-containing part after being polished with the polishing composition has a water contact angle lower than that of the hydrophobic silicon-containing part after being polished with another composition having the same makeup as the polishing composition except that the water-soluble polymer is not contained therein. Examples of the water-soluble polymer include polysaccharides and alcohol compounds. Another polishing composition of the present invention contains abrasive grains having a silanol group, and a water-soluble polymer. When this polishing composition is left to stand for one day in an environment at a temperature of 25° C., the water-soluble polymer is adsorbed on the abrasive grains at 5,000 or more molecules per 1 ?m2 of surface area of the abrasive grains.

Abstract: Provided is a polishing composition containing an abrasive and water. The abrasive content in the polishing composition is no less than 0.1% by mass. The abrasive contains zirconium oxide particles. The zirconium oxide particles have a specific surface area of from 1 to 15 m2/g. The zirconium oxide particles preferably have a purity of no less than 99% by mass. The polishing composition is used in, for example, polishing a hard and brittle material, such as sapphire, silicon nitride, silicon carbide, silicon oxide, glass, gallium nitride, gallium arsenide, indium arsenide, and indium phosphide.