Patents by Inventor Youichiro Takeshima

Youichiro Takeshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8541488
    Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: September 24, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
  • Publication number: 20110186791
    Abstract: An ultraviolet absorbent composition, containing at least one kind of specific ultraviolet absorbent as exemplified below, and at least one kind of specific compound as exemplified below.
    Type: Application
    Filed: March 30, 2009
    Publication date: August 4, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima, Ichiro Amasaki
  • Publication number: 20110163284
    Abstract: A lighting unit cover, having a resin composition including ultraviolet absorbent A, the ultraviolet absorbent A being a compound represented by formula (1): in which, Het1 represents a bivalent five- or six-membered aromatic heterocyclic residue; the aromatic heterocyclic residue may have a substitutent; and R1a, R1b, R1c, R1d, R1e, R1f, R1g and R1h each independently represent a hydrogen atom or a monovalent substituent.
    Type: Application
    Filed: September 8, 2009
    Publication date: July 7, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Kazushi Furukawa, Youichiro Takeshima, Keizo Kimura
  • Publication number: 20110155976
    Abstract: An ultraviolet absorbent composition, having ultraviolet absorbent A and a silicon compound, in which the ultraviolet absorbent A has a maximum absorption wavelength from 350 nm to 400 nm, a half value width of 55 nm or less, and the molar extinction coefficient of 20000 or more at the maximum absorption wavelength.
    Type: Application
    Filed: August 31, 2009
    Publication date: June 30, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima
  • Publication number: 20110092619
    Abstract: A formed resin article, containing a compound and a polymer substance, wherein the compound has a maximum absorption wavelength in a range of 400 nm or less, measured in a solution of the compound, wherein the compound is contained in the polymer substance in a quantity of 5 g/m2 or less, and wherein a light transmittance of the article at a wavelength of 410 nm is 5% or less.
    Type: Application
    Filed: March 24, 2009
    Publication date: April 21, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Ichiro Amasaki, Keizo Kimura, Youichiro Takeshima
  • Publication number: 20110057155
    Abstract: An ultraviolet absorbent composition, containing: an ultraviolet absorbent A represented by formula (1); an ultraviolet absorbent B represented by formula (2-a) or (2-b); and a compound C, which is at least one kind of compound selected from the group consisting of a singlet oxygen scavenger, an antioxidant and a radical trapping agent: wherein Ra1 and Ra2 each independently represent a hydrogen atom or a specific substituent; Ra3 and Ra4 each independently represent a substituent having a Hammett substituent constant ?p value of 0.2 or more; Ra5 to Ra7 each represent a hydrogen atom or a monovalent substituent; X1 and X2 each independently represent a hydrogen atom or a specific substituent; s1 and s2 each independently represent an integer of 1 to 3; Lg represents a divalent substituent or a single bond; w represents 0 or 1; tb represents 1 or 2; and X3 represents, when tb is 1, a hydrogen atom or a specific substituent; and when tb is 2, X3 represents a divalent substituent.
    Type: Application
    Filed: May 7, 2009
    Publication date: March 10, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Kazushi Furuwaka, Youichiro Takeshima, Keizo Kimura
  • Publication number: 20110024701
    Abstract: An ultraviolet absorbent composition, comprising: at least one kind of ultraviolet absorbent (A) that is a compound represented by the following Formula (1); and at least one kind of ultraviolet absorbent (B) that is a compound where absorbance at 320 nm is 20% or more of absorbance at absorption maximum wavelength in the range of from 270 nm to 400 nm and the absorption maximum wavelength is 380 nm or less: wherein Het1 represents a bivalent five- or six-membered aromatic heterocyclic residue; the aromatic heterocyclic residue may have a substituent; Xa, Xb, Xc and Xd each independently represent a heteroatom; Xa to Xd may have a substituent; Ya, Yb, Yc, Yd, Ye and Yf each independently represent a heteroatom or a carbon atom; Ya to Yf may have a substituent; and the rings bound to Het1 may have a double bond at any position.
    Type: Application
    Filed: March 30, 2009
    Publication date: February 3, 2011
    Applicant: Fujifilm Corporation
    Inventors: Kazushi Furukawa, Keizo Kimura, Youichiro Takeshima, Ichiro Amasaki
  • Publication number: 20110015314
    Abstract: An ultraviolet absorbent containing a compound represented by the following formula (I), having an aluminum ion in a concentration of less than 2 ppm, and an iron ion in a concentration of less than 2 ppm. wherein R1 represents a substituent; n1 represents an integer of 0 to 4; R2 represents an n2-valent substituent or a linking group; and n2 represents an integer of 1 to 4.
    Type: Application
    Filed: March 30, 2009
    Publication date: January 20, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Youichiro Takeshima, Keizo Kimura