Patents by Inventor Youji Taguchi

Youji Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6469448
    Abstract: The present invention provides an inductively coupled RF plasma source that can improve the nonuniformity in substrate treatment by canceling out the radial electric fields generated between a plasma and an antenna coil. The inductively coupled RF plasma source comprises a plurality of one-turn antenna coils, each having one end connected to a RF supply along a circumferential side wall of a plasma generating chamber and the other end connected to a grounding potential, arranged at intervals in the longitudinal axial direction of the plasma generating chamber. One end of each one-turn antenna coil displaced at equal angles from each other in a circumferential direction.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: October 22, 2002
    Assignee: Nihon Shinku Gijutsu Kabushiki Kaisha
    Inventors: Youji Taguchi, Tomoyasu Kondo
  • Publication number: 20020096999
    Abstract: The present invention provides an inductively coupled RF plasma source that can improve the nonuniformity in substrate treatment by canceling out the radial electric fields generated between a plasma and an antenna coil. The inductively coupled RF plasma source comprises a plurality of one-turn antenna coils, each having one end connected to a RF supply along a circumferential side wall of a plasma generating chamber and the other end connected to a grounding potential, arranged at intervals in the longitudinal axial direction of the plasma generating chamber. One end of each one-turn antenna coil displaced at equal angles from each other in a circumferential direction.
    Type: Application
    Filed: January 25, 2001
    Publication date: July 25, 2002
    Inventors: Youji Taguchi, Tomoyasu Kondo