Patents by Inventor You-Jung PARK

You-Jung PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Monomer, organic layer composition, organic layer, and method of forming patterns
    Patent number: 10332751
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: June 25, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • Organic layer composition, organic layer, and method of forming patterns
    Patent number: 10066057
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: September 4, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yu-Shin Park, Yun-Jun Kim, Tae-Ho Kim, You-Jung Park, Yoo-Jeong Choi, Hyo-Young Kwon, Seung-Hyun Kim, Ran Namgung, Dominea Rathwell, Soo-Hyoun Mun, Hyun-Ji Song, Hyeon-Il Jung, Yu-Mi Heo
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 10018914
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B—*??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: July 10, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Mi-Young Kim, You-Jung Park, Yun-Jun Kim, Hea-Jung Kim, Joon-Young Moon, Hyun-Ji Song, Chung-Heon Lee, Yoo-Jeong Choi
  • Organic layer composition, organic layer, and method of forming patterns
    Patent number: 9908990
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: March 6, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Sun-Hae Kang, Youn-Hee Nam, Min-Soo Kim, Dominea Rathwell, You-Jung Park, Hyun-Ji Song, Sun young Yang
  • Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask composition
    Patent number: 9823566
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A, A? , X, Y, I, m and n are the same as described in the detailed description.
    Type: Grant
    Filed: May 8, 2013
    Date of Patent: November 21, 2017
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Yong-Woon Yoon, Sung-Jae Lee, Joon-Young Moon, You-Jung Park, Chul-Ho Lee, Youn-Jin Cho
  • Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
    Patent number: 9665003
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 30, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Hyun-Ji Song, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Seung-Hee Hong
  • Hard mask composition and method for forming pattern using same
    Patent number: 9529257
    Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: December 27, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung-Jae Lee, Youn-Jin Cho, Young-Min Kim, Chung-Heon Lee
  • Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
    Patent number: 9513546
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
    Type: Grant
    Filed: March 19, 2013
    Date of Patent: December 6, 2016
    Assignee: Cheil Industries, Inc.
    Inventors: You-Jung Park, Hea-Jung Kim, Yo-Choul Park, Yong-Woon Yoon, Sung-Jae Lee, Chul-Ho Lee, Youn-Jin Cho
  • ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160304700
    Abstract: An organic layer composition, an organic layer, and a method of forming patterns, the composition including a polymer that includes a substituted or unsubstituted fluorene structure, an additive represented by Chemical Formula 1, and a solvent:
    Type: Application
    Filed: November 25, 2015
    Publication date: October 20, 2016
    Inventors: Sun-Hae KANG, Youn-Hee NAM, Min-Soo KIM, Dominea RATHWELL, You-Jung PARK, Hyun-Ji SONG, Sun young YANG
  • ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160297932
    Abstract: An organic layer composition, an organic layer, and associated methods, the composition including a polymer that includes a moiety represented by Chemical Formula 1, a monomer represented by Chemical Formula 2, and a solvent,
    Type: Application
    Filed: November 30, 2015
    Publication date: October 13, 2016
    Inventors: Yu-Shin PARK, Yun-Jun KIM, Tae-Ho KIM, You-Jung PARK, Yoo-Jeong CHOI, Hyo-Young KWON, Seung-Hyun KIM, Ran NAMGUNG, Dominea RATHWELL, Soo-Hyoun MUN, Hyun-Ji SONG, Hyeon-Il JUNG, Yu-Mi HEO
  • MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS
    Publication number: 20160237306
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Application
    Filed: December 28, 2015
    Publication date: August 18, 2016
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • MONOMER, HARDMASK COMPOSITION COMPRISING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION
    Publication number: 20150362837
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A, A?, X, Y, l, m and n are the same as described in the detailed description.
    Type: Application
    Filed: May 8, 2013
    Publication date: December 17, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yong-Woon YOON, Sung-Jae LEE, Joon-Young MOON, You-Jung PARK, Chul-Ho LEE, Youn-Jin CHO
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150332931
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B-* ??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Application
    Filed: April 13, 2015
    Publication date: November 19, 2015
    Inventors: Youn-Hee NAM, Mi-Young KIM, You-Jung PARK, Yun-Jun KIM, Hea-Jung KIM, Joon-Young MOON, Hyun-Ji SONG, Chung-Heon LEE, Yoo-Jeong CHOI
  • MONOMER, HARD MASK COMPOSITION COMPRISING SAID MONOMER, AND METHOD FOR FORMING PATTERN USING SAID HARD MASK COMPOSITION
    Publication number: 20150301448
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
    Type: Application
    Filed: March 19, 2013
    Publication date: October 22, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: You-Jung Park, Hea-Jung Kim, Yo-Choul Park, Yong-Woon Yoon, Sung-Jae Lee, Chul-Ho Lee, Youn-Jin Cho
  • HARD MASK COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME
    Publication number: 20150205198
    Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
    Type: Application
    Filed: September 2, 2013
    Publication date: July 23, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung-Jae Lee, Youn-Jin Cho, Young-Min Kim, Chung-Heon Lee
  • HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS
    Publication number: 20150187566
    Abstract: A hardmask composition includes a polymer including a moiety represented by one of the following Chemical Formulae 1a to 1c, a monomer represented by the following Chemical Formula 2 and a solvent. In the above Chemical Formulae 1a, 1b, 1c, and 2, R1a, R1b, R4a, R4b, R2a, R2b, R5a, R5b and R3 are the same as defined in the specification.
    Type: Application
    Filed: November 5, 2014
    Publication date: July 2, 2015
    Inventors: Yu-Shin PARK, Yun-Jun KIM, Joon-Young MOON, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Yoo-Jeong CHOI
  • HARDMASK COMPOSITION, METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS
    Publication number: 20150004531
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Application
    Filed: April 28, 2014
    Publication date: January 1, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Seung-Hee HONG
  • MONOMER FOR HARDMASK COMPOSITION AND HARDMASK COMPOSITION INCLUDING THE MONOMER AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150001178
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Application
    Filed: April 22, 2014
    Publication date: January 1, 2015
    Inventors: Hyun-Ji SONG, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Yoo-Jeong CHOI, Seung-Hee HONG
  • Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewith
    Patent number: 8900997
    Abstract: Forming a dual damascene structure includes forming a first insulation layer and a second insulation layer, forming a resist mask, forming a via hole down to a lower end of the first insulation layer, forming a hardmask layer in the via hole and on the second insulation layer using a spin-coating method, forming a resist mask, forming a first trench hole down to a lower end of the second insulation layer, respectively removing a part of the hardmask layer in the via hole and a part of the hardmask layer on the second insulation layer, forming a second trench hole by removing a part of the first insulation layer between a top corner of the hardmask layer remaining in the via hole and a bottom corner of the first trench hole, removing the hardmask layer, and filling the via hole and the second trench hole with a conductive material.
    Type: Grant
    Filed: November 6, 2013
    Date of Patent: December 2, 2014
    Assignee: Cheil Industries, Inc.
    Inventors: Joon-Young Moon, Youn-Jin Cho, Sung-Jae Lee, You-Jung Park, Yong-Woon Yoon, Chul-Ho Lee, Chung-Heon Lee