Abstract: The present invention relates to a pharmaceutical composition for preventing or treating inflammatory diseases and a food for preventing or alleviating inflammatory diseases, both of which contain curvularin-type metabolites as an active ingredient and, more specifically to a pharmaceutical composition for preventing or treating inflammatory diseases and a food for preventing or alleviating inflammatory diseases, both of which contain, as an active ingredient, marine fungus Penicillium sp. SF-5859-derived curvularin-type metabolites. A pharmaceutical composition, according to the present invention, for preventing or treating inflammatory diseases, containing curvularin-type metabolites derived from marine fungus Penicillium sp. SF-5859 (KCTC 13354 BP) inhibits the production of proinflammatory cytokines and mediators, thereby being effectively usable for the prevention or treatment of inflammatory diseases.

Abstract: There is provided a novel polymer including a repeating unit expressed as a following formula 1: where each of R1 and R2 independently represents an alkylene group with 2 to 6 carbon atoms, and each of n and m independently represents 10 to 10,000.

Abstract: There is provided a novel polymer including a repeating unit expressed as a following formula 1: where each of R1 and R2 independently represents an alkylene group with 2 to 6 carbon atoms, and each of n and m independently represents 10 to 10,000.

Abstract: Provided is a chemical mechanical polishing (CMP) apparatus that includes a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval, a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad, a rotator rotatably installed on the other end of the connector, a CMP pad conditioner coupled to the rotator and conditioning the CMP pad when rotated, and a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner, thereby predicting a wear rate of the CMP pad based on the vibration acceleration and a state in which the CMP pad conditioner is installed or being used.

Abstract: This invention relates to a conditioner for a CMP (Chemical Mechanical Polishing) pad, which is used in a CMP process which is part of the fabrication of a semiconductor device, and more particularly, to a CMP pad conditioner in which the structure of the cutting tips is such that the change in the wear of the polishing pad is not great even when different kinds of slurry are used and when there are changes in pressure of the conditioner, and to a method of manufacturing the same.

Abstract: Provided is a chemical mechanical polishing (CMP) apparatus that includes a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval, a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad, a rotator rotatably installed on the other end of the connector, a CMP pad conditioner coupled to the rotator and conditioning the CMP pad when rotated, and a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner, thereby predicting a wear rate of the CMP pad based on the vibration acceleration and a state in which the CMP pad conditioner is installed or being used.

Abstract: This invention relates to a conditioner for a CMP (Chemical Mechanical Polishing) pad, which is used in a CMP process which is part of the fabrication of a semiconductor device, and more particularly, to a CMP pad conditioner in which the structure of the cutting tips is such that the change in the wear of the polishing pad is not great even when different kinds of slurry are used and when there are changes in pressure of the conditioner, and to a method of manufacturing the same.

Abstract: The present invention relates to a conditioner for a chemical-mechanical planarization (CMP) pad, which is used in a CMP process that is part of a semiconductor element manufacturing process, and more particularly, to a conditioner for a soft pad, and a method of manufacturing the same, wherein the conditioner can be used under CMP conditions using a slurry having a small amount of polishing particles, and/or a porous pad having comparatively low hardness and very high porosity.

Abstract: The present invention relates to a novel sulfonamide derivatives and novel intermediates thereof, preparation thereof, and a pharmaceutical composition comprising the same, and more particularly, to novel sulfonamide derivatives and intermediates thereof that are used as angiogenesis controlling material and that can inhibit overexpression of matrix metalloproteinase that decomposes protein constituents in extracellular and basement membranes of connective tissues, and preparation methods thereof, and a pharmaceutical composition comprising the same.

Abstract: The present invention relates to a Korean Acanthopanax Senticosus extract, a protein extract and crude protein polysaccharide derived therefrom, and an immuno-regulating composition comprising the same as an ative ingredient and the use thereof, and more particularly to a Korean Acanthopanax Senticosus extract and a protein extract and crude protein polysaccharide derived therefrom, which are have effective in increasing immunity and have superior anti-allergy effects and thus can be used as an active ingredient for functional foods, cosmetics, and pharmaceutical compositions, and as an immuno-regulating compositoin comprising the same as an active ingredient and the use thereof.

Abstract: The present invention relates to a novel sulfonamide derivatives and novel intermediates thereof, preparation thereof, and a pharmaceutical composition comprising the same, and more particularly, to novel sulfonamide derivatives and intermediates thereof that are used as angiogenesis controlling material and that can inhibit overexpression of matrix metalloproteinase that decomposes protein constituents in extracellular and basement membranes of connective tissues, and preparation methods thereof, and a pharmaceutical composition comprising the same.

Abstract: The invention relates to a diamond saw blade which is made by attaching improved undercut preventing tips, produced by diffusing and joining cobalt-based powder onto ultra hard tips at a high temperature, to respective shank slot walls formed on the circumference of a diamond saw blade by means of laser welding in order to remove drawbacks of high cost or insecurity with the conventional art.

Abstract: Disclosed is a new fluorocystosine and derivatives thereof. The fluorocystosine and derivatives thereof provide a pharmaceutical composition exhibiting better anti-cancer characteristics than the conventional composition.

Abstract: The present invention relates to a saw blade for preventing undercut wherein out of the sludge discharging slots arranged together with undercutting segments and ordinary cutting segments on the circumference of a steel wheel, those slots located behind the undercutting segments are dimensioned larger or wider than the slots behind the ordinary cutting segments in order to prevent the breakage and falling-off of the undercut preventing segments and ordinary cutting segments.

Abstract: The invention relates to a diamond saw blade which is made by attaching improved undercut preventing tips, produced by diffusing and joining cobalt-based powder onto ultra hard tips at a high temperature, to respective shank slot walls formed on the circumference of a diamond saw blade by means of laser welding in order to remove drawbacks of high cost or insecurity with the conventional art.