Patents by Inventor Youn-hyeong Cho

Youn-hyeong Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6078135
    Abstract: A method for forming a silica film on a face panel is disclosed. The method includes steps of preparing a first composite having a staring material of a silica-titania two component system where alcohol is added as a catalyst; preparing a second composite having a titaniumalkoxide or a derivative of the titaniumalkoxide as a catalyst; mixing the first and second composites at a predetermined ratio; agitating the face panel; and calcinating the coated colloidal solution at a temperature of 160-200.degree. C. The silica-titania two-component system is selected from a group consisting of a tetraethyl-silicate and a tetraethyl-silicate oligomer. The tetraethyl-silicate oligomer has a degree of polymerization of 40, 51 or 56.
    Type: Grant
    Filed: December 16, 1997
    Date of Patent: June 20, 2000
    Assignee: Samsung Display Devices Co., Ltd
    Inventors: Jong-Hyuk Lee, Youn-Hyeong Cho, Dong-Sik Chang
  • Patent number: 5879762
    Abstract: A method for forming a face film on a face panel includes the steps of applying electromagnetic wave-shielding solution on the face panel, calcining the face panel, and photoreducing the precursor metal ion contained in the electromagnetic wave-shielding film by radiating ultraviolet ray on the face panel for about 20-50 minutes. The precursor is selected from silver or gold. Preferably, the step of calcining is conducted at a temperature of about 160.degree.-200.degree. C. Further preferably, the ultraviolet ray is in the range of 1-50 mW/cm.sup.2.
    Type: Grant
    Filed: June 17, 1998
    Date of Patent: March 9, 1999
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Jong-hyuk Lee, Youn-hyeong Cho, Dong-sik Jang, Yun-ho Chon