Patents by Inventor Young-Chan Ban

Young-Chan Ban has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof
    Patent number: 7097949
    Abstract: A phase edge phase shift mask and a fabrication method thereof for enforcing a width of a field gate image located on a field region, which is weakened by a two exposure process, by using a phase shift mask and a trim mask on a semiconductor substrate, and enforcing a width of the field gate image to maximize a current driving capability of the semiconductor device.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: August 29, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-Hyun Kim, Moon-Hyun Yoo, Jeong-Lim Nam, Yoo-Hyon Kim, Chul-Hong Park, Soo-Han Choi, Young-Chan Ban, Hye-Soo Shin
  • Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof
    Publication number: 20040091794
    Abstract: A phase edge phase shift mask and a fabrication method thereof for enforcing a width of a field gate image located on a field region, which is weakened by a two exposure process, by using a phase shift mask and a trim mask on a semiconductor substrate, and enforcing a width of the field gate image to maximize a current driving capability of the semiconductor device.
    Type: Application
    Filed: October 17, 2003
    Publication date: May 13, 2004
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Dong-Hyun Kim, Moon-Hyun Yoo, Jeong-Lim Nam, Yoo-Hyon Kim, Chul-Hong Park, Soo-Han Choi, Young-Chan Ban, Hye-Soo Shin