Patents by Inventor Young-chang Kim

Young-chang Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130297969
    Abstract: The present invention relates to a method of improving file write performance and providing availability in a hybrid storage system. When a file writing target server information request signal is received from a client, any one cache server is selected in consideration of storage spaces of cache servers, information about the selected cache server to the client is transmitted so that the client stores the file in the selected cache server. When a duplicate writing target server information request is received from the selected cache server, any one first data server is selected in consideration of storage spaces of respective data servers, information about the selected first data server is transmitted to the cache server so that the cache server stores a duplicate of the file in the first data server. Information about storage of the file and the duplicate is received, and then file metadata is stored.
    Type: Application
    Filed: April 17, 2013
    Publication date: November 7, 2013
    Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Young-Chang KIM, Hong-Yeon KIM, Wan CHOI
  • Patent number: 8561597
    Abstract: A flange for a fuel pump module and a manufacturing method thereof, in which the passage communicating a first valve seat with a second valve seat in the flange can be easily and simply formed by inserting a passage forming piece in a mold without requiring an additional process during an injection-molding process of manufacturing the flange.
    Type: Grant
    Filed: January 11, 2011
    Date of Patent: October 22, 2013
    Assignee: Coavis
    Inventors: Jong Keun Lim, In Seok Sohn, Young Chang Kim, Joon Seup Kim, Mun Sik Jeon, Jin Seok Kim
  • Publication number: 20120158816
    Abstract: Disclosed are service providing method and device, including: collecting execution state information about a plurality of tasks that constitute at least one service, and are dynamically distributed and arranged over a plurality of nodes; and performing scheduling based on the collected execution state information about the plurality of tasks, wherein each of the plurality of tasks has at least one input source and output source, and a unit of data to be processed for each input source and a data processing operation are defined by a user, and the scheduling is to delete at least a portion of data input into at least one task or to process the at least a portion of input data in at least one duplicate task by referring to the defined unit of data. In particular, the present invention may effectively provide a service of analyzing and processing large stream data in semi-real time.
    Type: Application
    Filed: December 14, 2011
    Publication date: June 21, 2012
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Hyun Hwa CHOI, Young Chang KIM, Byoung Seob KIM, Myung Cheol LEE, Dong Oh KIM, Hun Soon LEE, Mi Young LEE
  • Publication number: 20110261907
    Abstract: A wireless wake-up system and an operation method thereof are provided to optimize power consumption when wireless data is received. The wireless wake-up system activates a wake-up detection module and then compares a wireless input signal received through an antenna with a pre-stored reference value. If the wireless input signal is equal to the reference value, the wireless wake-up system determines that the input signal is a wake-up signal with a low bit rate, and then generates a wake-up command corresponding to the wake-up signal. Also, the wireless wake-up system activates a selected module kept in an inactive state by sending the wake-up command to the selected module. The activated module may be a microcontroller unit (MCU). When the MCU is activated, the wireless wake-up system may inactivate the wake-up detection module.
    Type: Application
    Filed: December 15, 2010
    Publication date: October 27, 2011
    Applicant: Dong-A University Research Foundation For Industry -Academy Cooperation
    Inventors: Kyoung Moon LEE, Young Tak KIM, Dong Seok KANG, Young Chang KIM, Ae Kyoung KO, Jae Pyung KO
  • Publication number: 20110202892
    Abstract: In a retarget process modeling method, an effect according to density of patterns, and shapes or distances with respect to neighboring patterns may be sufficiently reflected while a relatively small amount of time and few costs are consumed. The retarget process modeling method involves obtaining prediction data, by a modelling calculating unit, on a test layout using a first process model, obtaining bias data based on measurement data of the test layout and the prediction data, using the bias data to check and detect corresponding features of a representative pattern affected by a photoresist (PR) flow rate, generating kernels including a PR flow kernel in consideration of a sub resolution assist feature (SRAF) pattern of the representative pattern to determine an uncalibrated model including the kernels and obtaining a second process model by fitting the uncalibrated model to the measurement data to obtain a second process model.
    Type: Application
    Filed: December 21, 2010
    Publication date: August 18, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-mi Lee, Young-chang Kim, Sung-soo Suh
  • Publication number: 20110177437
    Abstract: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.
    Type: Application
    Filed: April 4, 2011
    Publication date: July 21, 2011
    Inventors: Sung-soo Suh, Suk-joo Lee, Han-ku Cho, Yong-jin Chun, Sung-woo Lee, Young-chang Kim
  • Publication number: 20110168136
    Abstract: A flange for a fuel pump module and a manufacturing method thereof, in which the passage communicating a first valve seat with a second valve seat in the flange can be easily and simply formed by inserting a passage forming piece in a mold without requiring an additional process during an injection-molding process of manufacturing the flange.
    Type: Application
    Filed: January 11, 2011
    Publication date: July 14, 2011
    Applicant: COAVIS
    Inventors: Jong Keun Lim, In Seok Sohn, Young Chang Kim, Joon Seup Kim, Mun Sik Jeon, Jin Seok Kim
  • Publication number: 20110123853
    Abstract: A secondary battery including an electrode assembly, a can to house the electrode assembly, and electrical insulators that expand to secure the electrode assembly in the can, by absorbing a significant amount of liquid.
    Type: Application
    Filed: November 23, 2010
    Publication date: May 26, 2011
    Applicant: Samsung SDI Co., Ltd.
    Inventor: Young-Chang Kim
  • Patent number: 7940373
    Abstract: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: May 10, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-soo Suh, Suk-joo Lee, Han-ku Cho, Yong-jin Chun, Sung-woo Lee, Young-chang Kim
  • Publication number: 20110060481
    Abstract: An antitheft method and system for motorcycles are provided. The antitheft method and system for motorcycles authenticate an electronic identifier when power-up of a motorcycle or engine start-up is sensed and cut off the power-up or engine start-up if the power-up or engine start-up is not authenticated. An electronic control unit can generate a theft alarm signal in case of unauthenticated power-up or engine start-up. The motorcycle engine is automatically stopped if the engine is started through an illegal method, and thus the motorcycle is prevented from being stolen. Further, a user can confirm the electronic identifier and start the motorcycle without inserting a key into a key cylinder, and thus the user can start the motorcycle easily and rapidly.
    Type: Application
    Filed: September 8, 2010
    Publication date: March 10, 2011
    Applicant: Dong-A University Research Foundation for Industry-Academy Cooperation
    Inventors: Dong Seok KANG, Kyoung Moon LEE, Young Chang KIM, Jae Pyung KO, Young Tak KIM
  • Patent number: 7838209
    Abstract: A method of reducing the influence of the spread of the transmitted light on the feature size during optical lithography is disclosed. The method comprises at least two irradiation steps. During a first irradiation the resist is exposed with the original mask, i.e., comprising substantially the pattern to be obtained in the layer. Thereafter, without developing the exposed resist, an irradiation with at least one exposure is performed whereby the resist is exposed with a second mask, being at least partly the inverse of the original mask. The exposures of the second irradiation step are defocused compared to the first irradiation.
    Type: Grant
    Filed: July 20, 2005
    Date of Patent: November 23, 2010
    Assignee: IMEC
    Inventors: Peter Leunissen, Young-Chang Kim
  • Publication number: 20080106719
    Abstract: Provided are a compensating mask, a multi-optical system using the compensating mask, and a method of compensating for a 3-dimensional (3-D) mask effect using the compensating mask. Methods of compensating for a 3-D mask effect using a compensating mask may include generating a first kernel corresponding to a normal mask used for forming a minute pattern, generating a second kernel corresponding to a compensating mask, mixing the first kernel corresponding to the normal mask with the second kernel corresponding to the compensating mask, and generating a multi-optical system kernel corresponding to mixing the first kernel and the second kernel.
    Type: Application
    Filed: October 26, 2007
    Publication date: May 8, 2008
    Inventors: Sung-soo Suh, Suk-joo Lee, Han-ku Cho, Yong-jin Chun, Sung-woo Lee, Young-chang Kim
  • Patent number: 7038777
    Abstract: A semiconductor wafer has an alignment mark for use in aligning the wafer with exposure equipment during the manufacturing of a semiconductor device. The wafer is made by forming a chemical mechanical polishing target layer over an alignment mark layer, chemically-mechanically polishing the target layer to planarize the same, and prior to forming the chemical mechanical polishing target layer over the alignment mark layer, forming a dense pattern of lands or trenches in the alignment layer of dimensions and an inter-spacing preselected to inhibit a dishing phenomenon from occurring in the target layer as the result of its being chemically-mechanically polished. The lands or trenches may be disposed in at least a 2×2 array of rows and columns.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: May 2, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Young-chang Kim, Heung-jo Ryuk, Young-koog Han
  • Publication number: 20060019179
    Abstract: A method of reducing the influence of the spread of the transmitted light on the feature size during optical lithography is disclosed. The method comprises at least two irradiation steps. During a first irradiation the resist is exposed with the original mask, i.e., comprising substantially the pattern to be obtained in the layer. Thereafter, without developing the exposed resist, an irradiation with at least one exposure is performed whereby the resist is exposed with a second mask, being at least partly the inverse of the original mask. The exposures of the second irradiation step are defocused compared to the first irradiation.
    Type: Application
    Filed: July 20, 2005
    Publication date: January 26, 2006
    Inventors: Peter Leunissen, Young-Chang Kim
  • Patent number: 6742228
    Abstract: A clamp pad-body assembly that resists a separation of the clamp pad from the clamp body due to externally applied forces. The clamp body has a peripheral surface that has a height that is greater than the height of the exterior perimeter surface of the pad, and the exterior perimeter surface of the pad abuts the perimeter surface of a recess in the clamp body. The clamp pad-body assembly my be incorporated into a clothes hanger including two such clamps disposed at the ends of a beam coupled to a question-mark-shaped hook.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: June 1, 2004
    Inventor: Young Chang Kim
  • Publication number: 20030186479
    Abstract: The present invention discloses a Zn3P2—ZnO mixture thin film for photoluminescence and a method of fabricating the same. The object of the present invention is to provide a Zn3P2—ZnO mixture thin film for photoluminescence and a method of fabricating the same which can generate the photoluminescence characteristics in a navy blue region by depositing a semiconductor mixture thin film of ZnO and Zn3P2 with a predetermined mole ratio on the upper surface of a sapphire substrate by pulsed laser deposition. According to the Zn3P2—ZnO mixture thin film for photoluminescence and the method of fabricating the same, a thin film having a flat surface property and the effective photoluminescence characteristics of a navy blue region can be fabricated by growing a thin film of a mixture material on a sapphire substrate by a deposition method using laser ablation by using a target of a mixture of ZnO and Zn3P2 having a mole ratio of 1:9.
    Type: Application
    Filed: June 4, 2002
    Publication date: October 2, 2003
    Inventors: Young-Chang Kim, Sang-Yeol Lee
  • Publication number: 20030183818
    Abstract: The present invention discloses a method of forming a p-n junction on a ZnO thin film and a p-n junction thin film. The object of the present invention is to provide a method of forming a p-n junction on a ZnO thin film and a p-n junction thin film which deposits Zn3P2 on a ZnO thin film and forms a p-type material constituting a device by using thermal diffusion for the Zn3P2 in order to fabricate an effective p-type material. The method of forming a p-n junction on a ZnO thin film, in a light emitting device having a sapphire substrate as a base substrate, comprises the steps of: cladding the sapphire substrate with a n-type ZnO thin film; depositing a Zn3P2 thin film on the n-type ZnO thin film; forming a p-type ZnO thin film by irradiating a laser on the upper surface of the Zn3P2 thin film, decomposing the Zn3P2 thin film and diffusing the same on the n-type ZnO thin film; and forming an electrode on the n-type ZnO thin film and the p-type ZnO thin film respectively.
    Type: Application
    Filed: June 4, 2002
    Publication date: October 2, 2003
    Inventors: Young-Chang Kim, Sang-Yeol Lee
  • Patent number: 6624442
    Abstract: The present invention discloses a method of forming a p-n junction on a ZnO thin film and a p-n junction thin film. The object of the present invention is to provide a method of forming a p-n junction on a ZnO thin film and a p-n junction thin film which deposits Zn3P2 on a ZnO thin film and forms a p-type material constituting a device by using thermal diffusion for the Zn3P2 in order to fabricate an effective p-type material. The method of forming a p-n junction on a ZnO thin film, in a light emitting device having a sapphire substrate as a base substrate, comprises the steps of: cladding the sapphire substrate with a n-type ZnO thin film; depositing a Zn3P2 thin film on the n-type ZnO thin film; forming a p-type ZnO thin film by irradiating a laser on the upper surface of the Zn3P2 thin film, decomposing the Zn3P2 thin film and diffusing the same on the n-type ZnO thin film; and forming an electrode on the n-type ZnO thin film and the p-type ZnO thin film respectively.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: September 23, 2003
    Inventors: Young-Chang Kim, Sang-Yeol Lee
  • Patent number: 6549023
    Abstract: An apparatus for measuring the focus of a light exposure system for selectively exposing a photosensitive plate to light rays in a process of fabricating a semiconductor device, wherein there is provided a focus measuring part having opaque region, transparent region, and a transparent electrode arranged in the transparent region, a conducting stage supporting the photosensitive plate; and a capacitance detector for measuring the capacitance between the transparent electrode and the conducting stage.
    Type: Grant
    Filed: June 11, 2001
    Date of Patent: April 15, 2003
    Assignee: Samsung Electric Co., Ltd.
    Inventor: Young-Chang Kim
  • Publication number: 20030053060
    Abstract: A semiconductor wafer has an alignment mark for use in aligning the wafer with exposure equipment during the manufacturing of a semiconductor device. The wafer is made by forming a chemical mechanical polishing target layer over an alignment mark layer, chemically-mechanically polishing the target layer to planarize the same, and prior to forming the chemical mechanical polishing target layer over the alignment mark layer, forming a dense pattern of lands or trenches in the alignment layer of dimensions and an inter-spacing preselected to inhibit a dishing phenomenon from occurring in the target layer as the result of its being chemically-mechanically polished. The lands or trenches may be disposed in at least a 2×2 array of rows and columns.
    Type: Application
    Filed: November 8, 2002
    Publication date: March 20, 2003
    Inventors: Young-Chang Kim, Heung-Jo Ryuk, Young-Koog Han