Abstract: Provided is an oxime ester phenylcarbazole compound useful as a photoinitiator for photocrosslinking. Specifically, the carbon atom forming a double bond with the nitrogen atom in the oxime ester moiety of the oxime ester phenylcarbazole compound is bonded to the phenylcarbazole group and is directly bonded to a (C1-C20)alkyl or (C6-C20)aryl group. Also provided is a photopolymerizable composition including the oxime ester phenylcarbazole compound. The oxime ester phenylcarbazole compound and the photopolymerizable composition have improved solubilities, are highly photosensitive, and exhibit excellent physical properties in terms of residual film ratio, pattern stability, resist adhesiveness. Due to these advantages, the oxime ester phenylcarbazole compound and the photopolymerizable composition are suitable for use in black resists, color resists, overcoats, column spacers, and organic insulating films of LCDs.

Abstract: A method of controlling process distribution of a semiconductor process includes receiving process distribution data representing the process distribution of the semiconductor process, receiving a parameter related to the process distribution, generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter, and modifying a process variable affecting the process distribution based on the virtual metrology model.

Abstract: A semiconductor manufacturing apparatus includes a chamber having a plurality of stages, on each of which a wafer is placed, separately arranged therein, a common pumping line coupled to the chamber and connected to an area of each of the stages and forming a common passage of air that is pumped out from the areas of the stages, and a divider coupled to at least one of the chamber and the common pumping line and dividing the air being pumped to allow the air to be independently pumped from the respective areas of the stages. Thus, the generation of a process error because the RF reflected power is not stable due to the imbalance in pressure between a plurality of stages in a single chamber can be prevented.