Abstract: A processor-implemented method includes generating an adjusted reference patch by adjusting a position of a reference patch in a reference image based on a pixel value of a ground truth (GT) patch of a GT image and a pixel value of the reference patch, wherein the GT patch corresponds to a specific region of an input image; generating a super-resolution (SR) image of the input image using a SR model provided an input that is based on the generated adjusted reference patch; and training the SR model based on the SR image and the GT image.

Abstract: An electronic device is provided. The electronic device includes a printed circuit board, a light emitting unit and a light receiving unit which are disposed on the printed circuit board, a cover member which has at least a partial region configured by a material having high optical transmittance, is disposed to face the printed circuit board, and includes a first region substantially facing the light emitting unit, and a second region substantially facing the light receiving unit, and a pattern disposed in at least one of the first region and the second region of the cover member. The pattern may be disposed by repeatedly arranging blocking units having low transmittance at a predetermined interval. In addition, various embodiments may be possible.

Abstract: Systems and methods for super-resolution (SR) are described. The SR method includes determining a direction type of an input image based on a gradient of the input image, obtaining a first intermediate image based on the direction type using a look-up table (LUT) that stores an SR operation result of a pixel value combination corresponding to a kernel set mapped to the determined direction type, wherein the first intermediate image is an SR image corresponding to the input image, applying SR interpolation to the input image to obtain a baseline image, and obtaining an output image based on the first intermediate image and the baseline image.

Abstract: An upper electrode used for a substrate processing apparatus using plasma is provided. The upper electrode includes a bottom surface including a center region and an edge region having a ring shape and surrounding the center region, a first protrusion portion protruding toward plasma from the edge region and having a ring shape, wherein the first protrusion portion includes a first apex corresponding to a radial local maximum point toward the plasma, and a first distance, which is a radial-direction distance between the first apex and a center axis of the upper electrode, is greater than a radius of a substrate.

Abstract: An upper electrode used for a substrate processing apparatus using plasma is provided. The upper electrode includes a bottom surface including a center region and an edge region having a ring shape and surrounding the center region, a first protrusion portion protruding toward plasma from the edge region and having a ring shape, wherein the first protrusion portion includes a first apex corresponding to a radial local maximum point toward the plasma, and a first distance, which is a radial-direction distance between the first apex and a center axis of the upper electrode, is greater than a radius of a substrate.

Abstract: An upper electrode used for a substrate processing apparatus using plasma is provided. The upper electrode includes a bottom surface including a center region and an edge region having a ring shape and surrounding the center region, a first protrusion portion protruding toward plasma from the edge region and having a ring shape, wherein the first protrusion portion includes a first apex corresponding to a radial local maximum point toward the plasma, and a first distance, which is a radial-direction distance between the first apex and a center axis of the upper electrode, is greater than a radius of a substrate.

Abstract: An upper electrode used for a substrate processing apparatus using plasma is provided. The upper electrode includes a bottom surface including a center region and an edge region having a ring shape and surrounding the center region, a first protrusion portion protruding toward plasma from the edge region and having a ring shape, wherein the first protrusion portion includes a first apex corresponding to a radial local maximum point toward the plasma, and a first distance, which is a radial-direction distance between the first apex and a center axis of the upper electrode, is greater than a radius of a substrate.