Patents by Inventor Young J. Paik
Young J. Paik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20230356353Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.Type: ApplicationFiled: July 12, 2023Publication date: November 9, 2023Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Patent number: 11738421Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.Type: GrantFiled: April 26, 2021Date of Patent: August 29, 2023Assignee: Applied Materials, Inc.Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Publication number: 20210245323Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.Type: ApplicationFiled: April 26, 2021Publication date: August 12, 2021Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Patent number: 11007619Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.Type: GrantFiled: December 20, 2018Date of Patent: May 18, 2021Assignee: Applied Materials, Inc.Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Publication number: 20200381286Abstract: A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.Type: ApplicationFiled: August 5, 2020Publication date: December 3, 2020Inventors: Young J. Paik, Melvin Barrentine, Abhijit Y. Desai, Hai Nguyen, Ashish Bhatnagar, Rajkumar Alagarsamy
-
Publication number: 20190118336Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.Type: ApplicationFiled: December 20, 2018Publication date: April 25, 2019Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Patent number: 10160093Abstract: An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.Type: GrantFiled: December 4, 2009Date of Patent: December 25, 2018Assignee: Applied Materials, Inc.Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Publication number: 20170243779Abstract: A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.Type: ApplicationFiled: May 10, 2017Publication date: August 24, 2017Applicant: Applied Materials, Inc.Inventors: Young J. Paik, Melvin Barrentine, Abhijit Y. Desai, Hai Nguyen, Ashish Bhatnagar, Rajkumar Alagarsamy
-
Patent number: 9381613Abstract: A reinforcement ring is for placement in a carrier head to abut an inner surface of a perimeter portion of a flexible membrane. The reinforcement ring includes a substantially vertical cylindrical portion, a first flange projecting inwardly from the bottom of the cylindrical portion, and a second flange projecting outwardly from a bottom of the cylindrical portion. The second flange projects downwardly at a non-zero angle from vertical.Type: GrantFiled: January 24, 2014Date of Patent: July 5, 2016Assignee: Applied Materials, Inc.Inventors: Jamie Stuart Leighton, Stacy Meyer, Young J. Paik
-
Publication number: 20160136780Abstract: A carrier head includes a base, a substrate mounting surface, a retaining ring secured to the base, and a plurality of stacked shims located between the base and the retaining ring. The retaining ring has a bottom surface for contacting a polishing pad during polishing.Type: ApplicationFiled: January 26, 2016Publication date: May 19, 2016Applicant: Applied Materials, Inc.Inventors: Stacy Meyer, Young J. Paik, Christopher R. Mahon
-
Patent number: 9272387Abstract: A carrier head includes a base, a substrate mounting surface, a retaining ring secured to the base, and a plurality of stacked shims located between the base and the retaining ring. The retaining ring has a bottom surface for contacting a polishing pad during polishing.Type: GrantFiled: April 12, 2012Date of Patent: March 1, 2016Assignee: Applied Materials, Inc.Inventors: Stacy Meyer, Young J. Paik, Christopher R. Mahon
-
Patent number: 9227297Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.Type: GrantFiled: March 19, 2014Date of Patent: January 5, 2016Assignee: Applied Materials, Inc.Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Abraham Palaty, Aswathnarayanaiah Ravi, Ashish Bhatnagar, Young J. Paik, Stacy Meyer, Daniel Martin
-
Patent number: 9168631Abstract: A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.Type: GrantFiled: May 31, 2013Date of Patent: October 27, 2015Assignee: Applied Materials, Inc.Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Aswathnarayanaiah Ravi, Abraham Palaty, Young J. Paik, Stacy Meyer, James Klingler, Ashish Bhatnagar
-
Publication number: 20140287662Abstract: A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.Type: ApplicationFiled: March 19, 2014Publication date: September 25, 2014Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Abraham Palaty, Aswathnarayanaiah Ravi, Ashish Bhatnagar, Young J. Paik, Stacy Meyer, Daniel Martin
-
Publication number: 20140273776Abstract: A reinforcement ring is for placement in a carrier head to abut an inner surface of a perimeter portion of a flexible membrane. The reinforcement ring includes a substantially vertical cylindrical portion, a first flange projecting inwardly from the bottom of the cylindrical portion, and a second flange projecting outwardly from a bottom of the cylindrical portion. The second flange projects downwardly at a non-zero angle from vertical.Type: ApplicationFiled: January 24, 2014Publication date: September 18, 2014Applicant: Applied Materials, Inc.Inventors: Jamie Stuart Leighton, Stacy Meyer, Young J. Paik
-
Patent number: 8662957Abstract: In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.Type: GrantFiled: June 28, 2010Date of Patent: March 4, 2014Assignee: Applied Materials, Inc.Inventors: Young J. Paik, Christopher R. Mahon, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Publication number: 20130324017Abstract: A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.Type: ApplicationFiled: May 31, 2013Publication date: December 5, 2013Inventors: Irfanulla Khuddus Rahmathullah, Bopanna Ichettira Vansantha, Padma Gopalakrishnan, Ravi Aswathnarayanaiah, Abraham Palaty, Young J. Paik, Stacy Meyer, James Klingler, Ashish Bhatnagar
-
Patent number: 8475231Abstract: A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.Type: GrantFiled: December 4, 2009Date of Patent: July 2, 2013Assignee: Applied Materials, Inc.Inventors: Young J. Paik, Ashish Bhatnagar, Kadthala Ramaya Narendrnath
-
Publication number: 20130035022Abstract: A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.Type: ApplicationFiled: July 27, 2012Publication date: February 7, 2013Inventors: Young J. Paik, James Klingler, Stacy Meyer, Christopher R. Mahon, Laxman Murugesh, Ashish Bhatnagar, Padma Gopalakrishnan
-
Publication number: 20120264360Abstract: A carrier head includes a base, a substrate mounting surface, a retaining ring secured to the base, and a plurality of stacked shims located between the base and the retaining ring. The retaining ring has a bottom surface for contacting a polishing pad during polishing.Type: ApplicationFiled: April 12, 2012Publication date: October 18, 2012Inventors: Stacy Meyer, Young J. Paik, Christopher R. Mahon