Patents by Inventor Young-Joo Hwang
Young-Joo Hwang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8845810Abstract: A substrate damage prevention system and method for a plasma treating apparatus are provided. The system may include a lower electrode on which a substrate may be mounted, an inert gas supply unit which may supply an inert gas to an upper surface of the lower electrode on which the substrate is mounted, and an air supply unit which may supply air to the upper surface of the lower electrode. An inert gas may be supplied between the lower electrode and the substrate in order to control the temperature of the substrate during the chucking. Air may be supplied between the lower electrode and the substrate during dechucking in order to allow the substrate to be easily separated from the lower electrode.Type: GrantFiled: October 18, 2007Date of Patent: September 30, 2014Assignee: ADP Engineering Co., Ltd.Inventor: Young Joo Hwang
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Patent number: 8273211Abstract: Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.Type: GrantFiled: October 7, 2008Date of Patent: September 25, 2012Assignee: Advanced Display Process Engineering Co., Ltd.Inventors: Gwang Ho Hur, Jun Young Choi, Cheol Won Lee, Hyun Hwan Ahn, Young Joo Hwang, Chun Sik Kim
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Patent number: 7886687Abstract: A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.Type: GrantFiled: December 20, 2005Date of Patent: February 15, 2011Assignee: Advanced Display Process Engineering Co. Ltd.Inventors: Young Jong Lee, Jun Young Choi, Saeng Hyun Jo, Young-Joo Hwang, Jong-Cheon Kim
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Patent number: 7699957Abstract: Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transferring a substrate and opening and closing openings of the chambers.Type: GrantFiled: February 28, 2007Date of Patent: April 20, 2010Assignee: Advanced Display Process Engineering Co., Ltd.Inventors: Seoung-Wook Lee, Young-Joo Hwang
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Publication number: 20090263230Abstract: A cluster apparatus for processing a substrate includes a load-lock chamber to receive a substrate, a transfer chamber adjacent to the load-lock chamber, one or more processing chambers each having a side facing the transfer chamber, and a robot in the transfer chamber to unload the substrate from or load the substrate into at least one of the one or more processing chambers or the load-lock chamber. A rotating stage is included in the load-lock chamber to support and rotate the substrate to a desired orientation.Type: ApplicationFiled: October 24, 2008Publication date: October 22, 2009Inventor: Young Joo HWANG
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Patent number: 7537673Abstract: Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular to an upper end of the driving shaft. The baffle comprises a baffle plate coupled to the upper end of the driving shaft, and a shielding portion coupled to a lower surface of the baffle plate. The substrate supporting member is a foldable substrate supporting member. The baffle and the substrate supporting member are driven up and down at the same time by the driving shaft. As a result, it is possible to protect the substrate supporting member from plasma, and to prevent interference between the baffle and the outer lifting bar during operation of the plasma processing apparatus.Type: GrantFiled: September 6, 2005Date of Patent: May 26, 2009Assignee: Advanced Display Processing Engineering Co., Ltd.Inventors: Young Jong Lee, Jun Young Choi, Hyun Hwan Ahn, Chan-Ho Kang, Hyun-Woo Baek, Young-Joo Hwang
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Publication number: 20090025877Abstract: Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.Type: ApplicationFiled: October 7, 2008Publication date: January 29, 2009Inventors: Gwang Ho HUR, Jun Young CHOI, Cheol Won LEE, Hyun Hwan AHN, Young Joo HWANG, Chun Sik KIM
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Publication number: 20080138535Abstract: A substrate damage prevention system and method for a plasma treating apparatus are provided. The system may include a lower electrode on which a substrate may be mounted, an inert gas supply unit which may supply an inert gas to an upper surface of the lower electrode on which the substrate is mounted, and an air supply unit which may supply air to the upper surface of the lower electrode. An inert gas may be supplied between the lower electrode and the substrate in order to control the temperature of the substrate during the chucking. Air may be supplied between the lower electrode and the substrate during dechucking in order to allow the substrate to be easily separated from the lower electrode.Type: ApplicationFiled: October 18, 2007Publication date: June 12, 2008Inventor: Young Joo HWANG
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Publication number: 20070204958Abstract: Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transferring a substrate and opening and closing openings of the chambers.Type: ApplicationFiled: February 28, 2007Publication date: September 6, 2007Inventors: Seoung-Wook Lee, Young-Joo Hwang
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Publication number: 20060137820Abstract: A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.Type: ApplicationFiled: December 20, 2005Publication date: June 29, 2006Inventors: Young Lee, Jun Choi, Saeng Jo, Young-Joo Hwang, Jong-Cheon Kim
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Publication number: 20060048709Abstract: Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular to an upper end of the driving shaft. The baffle comprises a baffle plate coupled to the upper end of the driving shaft, and a shielding portion coupled to a lower surface of the baffle plate. The substrate supporting member is a foldable substrate supporting member. The baffle and the substrate supporting member are driven up and down at the same time by the driving shaft. As a result, it is possible to protect the substrate supporting member from plasma, and to prevent interference between the baffle and the outer lifting bar during operation of the plasma processing apparatus.Type: ApplicationFiled: September 6, 2005Publication date: March 9, 2006Inventors: Young Lee, Jun Choi, Hyun Ahn, Chan-Ho Kang, Hyun-Woo Baek, Young-Joo Hwang