Patents by Inventor Young-Jun Jin
Young-Jun Jin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11921781Abstract: A background music providing method includes: based on a user command for executing a content recognition mode being received, obtaining a data corresponding to the content, reproduced on the display apparatus, in the content recognition mode; transmitting the obtained data to an external source; obtaining information corresponding to the content based on the data from the external source; and displaying a result UI corresponding to the obtained information on the display apparatus.Type: GrantFiled: September 12, 2019Date of Patent: March 5, 2024Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Ji-hun Park, Myung-jae Kim, Young-jun Ryu, Jang-ho Jin
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Publication number: 20230131888Abstract: Proposed is a non-destructive osteochondral graft quality analysis method using a Micro-CT assay, rather than using an existing biochemical assay involving destructive pretreatment of osteochondral tissue samples. Since the GAG content of the osteochondral graft can be measured by the non-destructive method through the Micro-CT assay, the quality analysis of the osteochondral graft provided by a donor can be easily performed, and the therapeutic effect of the osteochondral transplantation can be improved by enabling the use of a graft with a GAG content of 70% or more.Type: ApplicationFiled: October 26, 2022Publication date: April 27, 2023Applicant: ATEMS CO., LTD.Inventors: Byoung-Hyun MIN, Young-Jun JIN
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Patent number: 9347125Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.Type: GrantFiled: May 29, 2015Date of Patent: May 24, 2016Assignees: Samsung Display Co., Ltd., DONGWOO FINE-CHEM CO., LTD.Inventors: In-Bae Kim, Jong-Hyun Choung, Seon-Il Kim, Hong-Sick Park, Wang Woo Lee, Jae-Woo Jeong, In Seol Kuk, Sang-Tae Kim, Young-Chul Park, Keyong Bo Shim, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee, Joon-Woo Lee, Sang-Hoon Jang, Young-Jun Jin
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Publication number: 20150274583Abstract: A glass-reinforcing composition and method of using the same, the composition including 1 weight % to 20 weight % of hydrofluoric acid, 0.1 weight % to 5 weight % of ammonium fluoride, 1 weight % to 20 weight % of an inorganic acid, an organic acid, or 1 weight % to 10 weight % of an organic acid salt, and a remainder of water.Type: ApplicationFiled: September 8, 2014Publication date: October 1, 2015Inventors: Soo Min AN, Young-Jin Yoon, Gi Yong Nam, Soo Guy Rho, Sang-Duck Park, Kang Bin Yi, Jung Bo Lee, Sang Hun Cho, Sang-Tae Kim, Young-Jun Jin, Yong Seok Choi
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Publication number: 20150259598Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.Type: ApplicationFiled: May 29, 2015Publication date: September 17, 2015Inventors: In-Bae KIM, Jong-Hyun CHOUNG, Seon-Il KIM, Hong-Sick PARK, Wang Woo LEE, Jae-Woo JEONG, In Seol KUK, Sang-Tae KIM, Young-Chul PARK, Keyong Bo SHIM, In-Ho YU, Young-Jin YOON, Suck-Jun LEE, Joon-Woo LEE, Sang-Hoon JANG, Young-Jun JIN
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Patent number: 9111813Abstract: An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.Type: GrantFiled: June 17, 2014Date of Patent: August 18, 2015Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Hong-Sick Park, Wang-Woo Lee, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Kyong-Min Kang, Young-Jin Yoon, Suck-Jun Lee, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Dong-Ki Kim
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Patent number: 9045833Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.Type: GrantFiled: December 18, 2012Date of Patent: June 2, 2015Assignee: Samsung Display Co., Ltd.Inventors: In-Bae Kim, Jong-Hyun Choung, Seon-Il Kim, Hong-Sick Park, Wang Woo Lee, Jae-Woo Jeong, In Seol Kuk, Sang-Tae Kim, Young-Chul Park, Keyong Bo Shim, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee, Joon-Woo Lee, Sang-Hoon Jang, Young-Jun Jin
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Patent number: 9048430Abstract: Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.Type: GrantFiled: December 19, 2011Date of Patent: June 2, 2015Assignees: Samsung Display Co., Ltd., Dongwoo Fine-Chem Co., Ltd.Inventors: Seon-Il Kim, Shin-Il Choi, Ji-Young Park, Sang-Gab Kim, O-Byoung Kwon, Dong-Ki Kim, Sang-Tae Kim, Young-Chul Park, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee, Joon-Woo Lee, Min-Ki Lim, Sang-Hoon Jang, Young-Jun Jin
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Publication number: 20140295599Abstract: An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.Type: ApplicationFiled: June 17, 2014Publication date: October 2, 2014Inventors: Hong-Sick PARK, Wang-Woo LEE, Sang-Tae KIM, Joon-Woo LEE, Young-Chul PARK, Young-Jun JIN, Kyong-Min KANG, Young-Jin YOON, Suck-Jun LEE, O-Byoung KWON, In-Ho YU, Sang-Hoon JANG, Min-Ki LIM, Dong-Ki KIM
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Patent number: 8785935Abstract: An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.Type: GrantFiled: June 24, 2011Date of Patent: July 22, 2014Assignee: Samsung Display Co., Ltd.Inventors: Hong-Sick Park, Wang-Woo Lee, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Kyong-Min Kang, Young-Jin Yoon, Suck-Jun Lee, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Dong-Ki Kim
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Publication number: 20140075750Abstract: A touch screen panel and a method for preparing the same, and more specifically, a touch screen panel includes a window plate 311, a non-conductive color pattern 312 formed on a non-display part on one face of the window plate, and a non-conductive shielding pattern 313 formed on the non-conductive color pattern 312, so as to provide a non-conductive pattern having the desired colors and shielding effects, and to reduce failure rates during the formation of the non-conductive pattern, as well as a method for preparing the same.Type: ApplicationFiled: August 21, 2013Publication date: March 20, 2014Applicant: DONGWOO FINE-CHEM CO., LTD.Inventors: Yong-Seok CHOI, Won-Young CHANG, Ji-Min CHUN, Young-Jun JIN
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Publication number: 20140024206Abstract: A etchant composition that includes, based on a total weight of the etchant composition, about 0.5 wt % to about 20 wt % of a persulfate, about 0.5 wt % to about 0.9 wt % of an ammonium fluoride, about 1 wt % to about 10 wt % of an inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 10.0 wt % of a sulfonic acid, about 5 wt % to about 10 wt % of an organic acid or a salt thereof, and a remainder of water. The etchant composition may be configured to etch a metal layer including copper and titanium, to form a metal wire that may be included in a thin film transistor array panel of a display device.Type: ApplicationFiled: December 18, 2012Publication date: January 23, 2014Applicants: DONGWOO FINE-CHEM CO., LTD., SAMSUNG DISPLAY CO., LTD.Inventors: In-Bae KIM, Jong-Hyun CHOUNG, Seon-Il KIM, Hong-Sick PARK, Wang Woo LEE, Jae-Woo JEONG, In Seol KUK, Sang-Tae KIM, Young-Chul PARK, Keyong Bo SHIM, In-Ho YU, Young-Jin YOON, Suck-Jun LEE, Joon-Woo LEE, Sang-Hoon JANG, Young-Jun JIN
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Patent number: 8617944Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.Type: GrantFiled: March 1, 2013Date of Patent: December 31, 2013Assignees: Dongwood Fine-Chem Co., Ltd., Samsung Display Co., Ltd.Inventors: Byeong-Jin Lee, Hong-Sik Park, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Suck-Jun Lee, Seung-Jae Yang, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Hye-Ra Shin, Yu-Jin Lee
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Patent number: 8409999Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.Type: GrantFiled: November 16, 2010Date of Patent: April 2, 2013Assignee: Samsung Display Co., Ltd.Inventors: Byeong-Jin Lee, Hong-Sick Park, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Suck-Jun Lee, Seung-Jae Yang, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Hye-Ra Shin, Yu-Jin Lee
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Patent number: 8383437Abstract: An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.Type: GrantFiled: September 1, 2011Date of Patent: February 26, 2013Assignees: Samsung Display Co., Ltd., Dongwoo Fine-Chem Co., Ltd.Inventors: Ji-Young Park, Shin-Il Choi, Jong-Hyun Choung, Sang Gab Kim, Seon-Il Kim, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Kyong-Min Kang, Suck-Jun Lee, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Yu-Jin Lee
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Publication number: 20120252148Abstract: An etchant according to exemplary embodiments of the present invention includes about 0.5 wt % to about 20 wt % of persulfate, about 0.01 wt % to about 2 wt % of a fluorine compound, about 1 wt % to about 10 wt % of inorganic acid, about 0.5 wt % to about 5 wt % of a cyclic amine compound, about 0.1 wt % to about 5 wt % of a chlorine compound, about 0.05 wt % to about 3 wt % of copper salt, about 0.1 wt % to about 10 wt % of organic acid or organic acid salt, and water.Type: ApplicationFiled: September 1, 2011Publication date: October 4, 2012Applicants: DONGWOO FINE-CHEM CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Ji-Young PARK, Shin-Il CHOI, Jong-Hyun CHOUNG, Sang Gab KIM, Seon-Il KIM, Sang-Tae KIM, Joon-Woo LEE, Young-Chul PARK, Young-Jun JIN, Kyong-Min KANG, Suck-Jun LEE, O-Byoung KWON, In-Ho YU, Sang-Hoon JANG, Min-Ki LIM, Yu-Jin LEE
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Publication number: 20120208310Abstract: Exemplary embodiments of the present invention disclose a non-halogenated etchant for etching an indium oxide layer and a method of manufacturing a display substrate using the non-halogenated etchant, the non-halogenated etchant including nitric acid, sulfuric acid, a corrosion inhibitor including ammonium, a cyclic amine-based compound, and water.Type: ApplicationFiled: December 19, 2011Publication date: August 16, 2012Applicants: DONGWOO FINE-CHEM CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Seon-Il KIM, Shin-Il Choi, Ji-Young Park, Sang-Gab Kim, O-Byoung Kwon, Dong-Ki Kim, Sang-Tae Kim, Young-Chul Park, In-Ho Yu, Young-Jin Yoon, Suck-Jun Lee, Joon-Woo Lee, Min-Ki Lim, Sang-Hoon Jang, Young-Jun JIN
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Publication number: 20120153287Abstract: An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.Type: ApplicationFiled: June 24, 2011Publication date: June 21, 2012Applicants: DONGWOO FINE-CHEM CO., LTD., SAMSUNG ELECTRONICS CO., LTD.Inventors: Hong-Sick PARK, Wang-Woo LEE, Sang-Tae KIM, Joon-Woo LEE, Young-Chul PARK, Young-Jun JIN, Kyong-Min KANG, Young-Jin YOON, Suck-Jun LEE, O-Byoung KWON, In-Ho YU, Sang-Hoon JANG, Min-Ki LIM, Dong-Ki KIM
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Publication number: 20110183476Abstract: An etchant composition for etching a transparent electrode is provided, the etchant composition includes an inorganic acid, an ammonium (NH4+)-containing compound, a cyclic amine compound, and the remaining amount of water.Type: ApplicationFiled: November 16, 2010Publication date: July 28, 2011Inventors: Byeong-Jin LEE, Hong-Sick Park, Sang-Tae Kim, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Suck-Jun Lee, Seung-Jae Yang, O-Byoung Kwon, In-Ho Yu, Sang-Hoon Jang, Min-Ki Lim, Hye-Ra Shin, Yu-Jin Lee
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Patent number: 7968000Abstract: An etchant composition is provided. The etchant composition includes about 40 to about 65 wt % of phosphoric acid, about 2 to about 5 wt % of nitric acid, about 2 to about 20 wt % of acetic acid, about 0.1 to about 2 wt % of a compound containing phosphate, about 0.1 to about 2 wt % of a compound simultaneously containing an amino group and a carboxyl group, and a remaining weight percent of water for the total weight of the composition.Type: GrantFiled: April 29, 2009Date of Patent: June 28, 2011Assignees: Samsung Electronics, Co., Ltd., Dongwoo Fine-Chem Co., Ltd.Inventors: Young-Joo Choi, Bong-Kyun Kim, Byeong-Jin Lee, Jong-Hyun Choung, Sun-Young Hong, Nam-Seok Suh, Hong-Sick Park, Ky-Sub Kim, Seung-Yong Lee, Joon-Woo Lee, Young-Chul Park, Young-Jun Jin, Seung-Jae Yang, Hyun-Kyu Lee, Sang-Hoon Jang, Min-Ki Lim