Patents by Inventor Young Paik
Young Paik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 12232408Abstract: A substrate for display comprises one surface, the other surface, a first area (folding area) and a second area (non-folding area). A first hole passing through the one surface and the other surface is formed on the first area. A 1-1 groove is formed on one surface of the first area in the direction from the one surface to the other surface. A 1-2 groove is formed on the other surface of the first area in the direction from the other surface to the one surface. A 2-1 groove is formed on one surface of the second area in the direction from the one surface to the other surface. A 2-2 groove is formed on the other surface of the second area in the direction from the other surface to the one surface. The 1-1 groove and 1-2 groove and the 2-1 groove and 2-2 groove do not overlap each other in the thickness direction of the substrate for display.Type: GrantFiled: July 27, 2020Date of Patent: February 18, 2025Assignee: LG INNOTEK CO., LTD.Inventors: Duck Hoon Park, Hae Sik Kim, Woo Young Chang, Jee Heum Paik
-
Publication number: 20240281653Abstract: An artificial neural network is trained using pathology slides, obtained by staining serial sections of a single pathological specimen with a variety of different staining reagents, such that a disease can be determined with a high degree of accuracy. A method for training an artificial neural network, the method includes: generating a training data set including individual training data; and training the artificial neural network on the basis of the training data. A step of generating the training data set includes generating, for all m where 1<=m<=M, m-th training data to be included in the training data set. Generating the m-th training data includes acquiring first to Nth pathology slide images, the slide images being pathology slide images obtained by staining serial sections of a single pathological specimen with different staining reagents; and generating the m-th training data on the basis of the first to Nth pathology slide images.Type: ApplicationFiled: January 7, 2022Publication date: August 22, 2024Inventors: Tae Yeong KWAK, In Young PAIK, Sun Woo KIM
-
Patent number: 11652045Abstract: An example via contact patterning method includes providing a pattern of alternating trench contacts and gates over a support structure. For each pair of adjacent trench contacts and gates, a trench contact is electrically insulated from an adjacent gate by a dielectric material and/or multiple layers of different dielectric materials, and the gates are recessed with respect to the trench contacts. The method further includes wrapping a protective layer of one or more dielectric materials, and a sacrificial helmet material on top of the trench contacts to protect them during the via contact patterning and etch processes for forming via contacts over one or more gates. Such a method may advantageously allow increasing the edge placement error margin for forming via contacts of metallization stacks.Type: GrantFiled: October 27, 2021Date of Patent: May 16, 2023Assignee: Intel CorporationInventors: Mohit K. Haran, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An, Debashish Basu, Kilhyun Bang, Jason W. Klaus, Reken Patel, Charles Henry Wallace, James Jeong, Ruth Amy Brain
-
Publication number: 20230072274Abstract: A neuron-level plasticity control (NPC) addresses the issue of catastrophic forgetting in an artificial neural network. The plasticity of a network is controlled at a neuron level rather than at a connection level during training of a new task, thereby conserving existing knowledge. The neuron-level plasticity control evaluates the importance of each neuron and applies a low training speed to integrate important neurons. In addition, a scheduled NPC (SNPC) is provided that uses training schedule information to more clearly protect important neurons.Type: ApplicationFiled: July 24, 2020Publication date: March 9, 2023Inventors: In Young PAIK, Sang Jun OH, Tae Yeong KWAK
-
Publication number: 20220051975Abstract: An example via contact patterning method includes providing a pattern of alternating trench contacts and gates over a support structure. For each pair of adjacent trench contacts and gates, a trench contact is electrically insulated from an adjacent gate by a dielectric material and/or multiple layers of different dielectric materials, and the gates are recessed with respect to the trench contacts. The method further includes wrapping a protective layer of one or more dielectric materials, and a sacrificial helmet material on top of the trench contacts to protect them during the via contact patterning and etch processes for forming via contacts over one or more gates. Such a method may advantageously allow increasing the edge placement error margin for forming via contacts of metallization stacks.Type: ApplicationFiled: October 27, 2021Publication date: February 17, 2022Applicant: Intel CorporationInventors: Mohit K. Haran, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An, Debashish Basu, Kilhyun Bang, Jason W. Klaus, Reken Patel, Charles Henry Wallace, James Jeong, Ruth Amy Brain
-
Patent number: 11211324Abstract: An example via contact patterning method includes providing a pattern of alternating trench contacts and gates over a support structure. For each pair of adjacent trench contacts and gates, a trench contact is electrically insulated from an adjacent gate by a dielectric material and/or multiple layers of different dielectric materials, and the gates are recessed with respect to the trench contacts. The method further includes wrapping a protective layer of one or more dielectric materials, and a sacrificial helmet material on top of the trench contacts to protect them during the via contact patterning and etch processes for forming via contacts over one or more gates. Such a method may advantageously allow increasing the edge placement error margin for forming via contacts of metallization stacks.Type: GrantFiled: September 18, 2019Date of Patent: December 28, 2021Assignee: Intel CorporationInventors: Mohit K. Haran, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An, Debashish Basu, Kilhyun Bang, Jason W. Klaus, Reken Patel, Charles Henry Wallace, James Jeong, Ruth Amy Brain
-
Publication number: 20210082805Abstract: An example via contact patterning method includes providing a pattern of alternating trench contacts and gates over a support structure. For each pair of adjacent trench contacts and gates, a trench contact is electrically insulated from an adjacent gate by a dielectric material and/or multiple layers of different dielectric materials, and the gates are recessed with respect to the trench contacts. The method further includes wrapping a protective layer of one or more dielectric materials, and a sacrificial helmet material on top of the trench contacts to protect them during the via contact patterning and etch processes for forming via contacts over one or more gates. Such a method may advantageously allow increasing the edge placement error margin for forming via contacts of metallization stacks.Type: ApplicationFiled: September 18, 2019Publication date: March 18, 2021Applicant: Intel CorporationInventors: Mohit K. Haran, Daniel James Bahr, Deepak S. Rao, Marvin Young Paik, Seungdo An, Debashish Basu, Kilhyun Bang, Jason W. Klaus, Reken Patel, Charles Henry Wallace, James Jeong, Ruth Amy Brain
-
Patent number: 9977023Abstract: The present invention relates to a composition comprising a probe for detecting six representative causative viruses of acute enteritis (norovirus genogroup I and genogroup II, rotavirus, hepatitis A virus, coxsackievirus, astrovirus, and adenovirus), and a DNA microarray, a kit, and a detection method comprising the composition. The present invention is effective due to high specificity and sensitivity to viruses. In addition, since the causative viruses can simply be detected at low cost compared to conventional detection methods, without expensive diagnosis devices or specialists, the present invention may be effectively used as a method for diagnosing viruses causing acute enteritis.Type: GrantFiled: November 26, 2015Date of Patent: May 22, 2018Assignee: Catholic University Industry Academic Cooperation FoundationInventors: Soon-young Paik, Yu-jeong Won
-
Publication number: 20170356912Abstract: The present invention relates to a composition comprising a probe for detecting six representative causative viruses of acute enteritis (norovirus genogroup I and genogroup II, rotavirus, hepatitis A virus, coxsackievirus, astrovirus, and adenovirus), and a DNA microarray, a kit, and a detection method comprising the composition. The present invention is effective due to high specificity and sensitivity to viruses. In addition, since the causative viruses can simply be detected at low cost compared to conventional detection methods, without expensive diagnosis devices or specialists, the present invention may be effectively used as a method for diagnosing viruses causing acute enteritis.Type: ApplicationFiled: November 26, 2015Publication date: December 14, 2017Inventors: Soon-young PAIK, Yu-jeong WON
-
Publication number: 20080293039Abstract: The present invention relates to a VP7 gene of human rotavirus and a composition for diagnosis of human rotavirus infection comprising primer or probe specific to thereof, and more particularly to a VP7 gene encoding the amino acid sequence set forth in SEQ ID NO:2 and a composition for diagnosis of human rotavirus infection comprising primer or probe specific to thereof. The human rotavirus VP7 gene according to the present invention will be useful for diagnosis of novel G11 type human rotavirus infection, and will be used for development of rotavirus vaccine.Type: ApplicationFiled: December 7, 2007Publication date: November 27, 2008Applicant: MSD Korea Co., Ltd.Inventors: Soon-Young Paik, Jin Han Kang
-
Publication number: 20080021571Abstract: A method, system, and medium of modeling and/or for controlling a manufacturing process is disclosed. In particular, a method according to embodiments of the present invention includes calculating a set of predicted output values, and obtaining a prediction model based on a set of input parameters, the set of predicted output values, and empirical output values. Each input parameter causes a change in at least two outputs. The method also includes optimizing the prediction model by minimizing differences between the set of predicted output values and the empirical output values, and adjusting the set of input parameters to obtain a set of desired output values to control the manufacturing apparatus. Obtaining the prediction model includes transforming the set of input parameters into transformed input values using a transformation function of multiple coefficient values, and calculating the predicted output values using the transformed input values.Type: ApplicationFiled: July 31, 2007Publication date: January 24, 2008Inventors: Yuri Kokotov, Efim Entin, Jacques Seror, Yossi Fisher, Shalomo Sarel, Arulkumar Shanmugasundram, Alexander Schwarm, Young Paik
-
Publication number: 20070014932Abstract: A deposition method includes placing a substrate on a susceptor inside a chamber, the susceptor including a center pin passing through the susceptor for lifting the substrate, energizing an electrode to applying a uniform electric field to the substrate, electrically connecting a ground member extending along and attached to an entire axial length of the center pin to a ground voltage source, and forming a film on the substrate by chemical vapor deposition.Type: ApplicationFiled: June 30, 2006Publication date: January 18, 2007Inventor: Young Paik
-
Publication number: 20060195214Abstract: A method, system and medium is provided for enabling improved control systems. An error, or deviation from a target result, is observed for example during manufacture of semiconductor chips. The error within standard deviation is caused by two components: a white noise component and a signal component (such as systematic errors). The white noise component is, e.g., random noise and therefore is relatively non-controllable. The systematic error component, in contrast, may be controlled by changing the control parameters. A ratio between the two components is calculated autoregressively. Based on the ratio and using the observed or measured error, the actual value of the error caused by the systematic component is calculated utilizing an autoregressive stochastic sequence. The actual value of the error is then used in determining when and how to change the control parameters.Type: ApplicationFiled: April 6, 2006Publication date: August 31, 2006Applicant: Applied Materials, Inc.Inventor: Young Paik
-
Publication number: 20060079465Abstract: The present invention relates to a determination of a stereochemistry, a synthesis and dauer effect of 6R-(3,6-dideoxy-L-arabino-hexopyranosyloxy)heptanoic acid as a pheromone isolated from the Caenorhabditis elegance related to suppress of aging and stress. It becomes possible to develop medical substances using the pheromone relating to aging, stress, metabolism, signal transfer system in vivo, and anti-cancer, obesity and a suppressing agent for aging and stress.Type: ApplicationFiled: November 15, 2004Publication date: April 13, 2006Applicant: KDR Biotech. Co. Ltd.Inventors: Mankil Jung, Young Paik
-
Publication number: 20060009129Abstract: A method, apparatus and medium of conditioning a planarizing surface includes installing a wafer to be polished in a chemical mechanical polishing (CMP) apparatus having a polishing pad and a conditioning disk, polishing the wafer under a first set of pad conditioning parameters selected to maintain wafer material removal rates with preselected minimum and maximum removal rates, determining a wafer material removal rate occurring during the polishing step, calculating updated pad conditioning parameters to maintain wafer material removal rates within the maximum and minimum removal rates, and conditioning the polishing pad using the updated pad conditioning parameters, wherein the updated pad conditioning parameters are calculated using a pad wear and conditioning model that predicts the wafer material removal rate of the polishing pad based upon pad conditioning parameters, such as the conditioning down force and rotational speed of the conditioning disk.Type: ApplicationFiled: September 6, 2005Publication date: January 12, 2006Applicant: Applied Materials, Inc.Inventor: Young Paik
-
Publication number: 20050282281Abstract: A recombinant baculoviral vector, which comprises a vesicular stomatitis virus glycoprotein (VSVG) gene and a protein transduction domain (PTD) gene derived from HIV-1 (human immunodeficiency virus-1) Tat gene, is useful in a gene therapy owing to its excellent efficiencies in the delivery of a target gene to the host cell and expression of the target gene in the host cell.Type: ApplicationFiled: May 13, 2005Publication date: December 22, 2005Inventors: Soon-Young Paik, Jong-Sob Yoon, Seong-Karp Hong
-
Publication number: 20050278051Abstract: A method, system and medium is provided for enabling improved control systems. An error, or deviation from a target result, is observed for example during manufacture of semiconductor chips. The error within standard deviation is caused by two components: a white noise component and a signal component (such as systematic errors). The white noise component is, e.g., random noise and therefore is relatively non-controllable. The systematic error component, in contrast, may be controlled by changing the control parameters. A ratio between the two components is calculated autoregressively. Based on the ratio and using the observed or measured error, the actual value of the error caused by the systematic component is calculated utilizing an autoregressive stochastic sequence. The actual value of the error is then used in determining when and how to change the control parameters.Type: ApplicationFiled: May 28, 2004Publication date: December 15, 2005Applicant: Applied Materials, Inc.Inventor: Young Paik
-
Publication number: 20050267607Abstract: A method, system and medium are provided for enabling improved feedback and feedforward control. An error, or deviation from target result, is observed during manufacture of semi conductor chips. The error within standard deviation is caused by two components: a white noise component and a signal component (such as systematic errors). The white noise component is random noise and therefore is relatively non-controllable. The systematic error, in contrast, may be controlled by changing the control parameters. A ratio between the two components is calculated autoregressively. Based on the ratio and using the observed or measured error, the actual value of the error caused by the signal component is calculated utilizing an autoregressive stochastic sequence. The actual value of the error is then used in determining when and how to change the control parameters.Type: ApplicationFiled: April 8, 2005Publication date: December 1, 2005Inventor: Young Paik
-
Publication number: 20050208879Abstract: A method, apparatus and medium of conditioning a planarizing surface includes installing a wafer to be polished in a chemical mechanical polishing (CMP) apparatus having a polishing pad and a conditioning disk, polishing the wafer under a first set of pad conditioning parameters selected to maintain wafer material removal rates with preselected minimum and maximum removal rates, determining a wafer material removal rate occurring during the polishing step, calculating updated pad conditioning parameters to maintain wafer material removal rates within the maximum and minimum removal rates, and conditioning the polishing pad using the updated pad conditioning parameters, wherein the updated pad conditioning parameters are calculated by a pad wear and conditioning model that predicts the wafer material removal rate of the polishing pad based upon the rotational speed and direction of the conditioning disk.Type: ApplicationFiled: April 29, 2005Publication date: September 22, 2005Applicant: Applied MaterialsInventor: Young Paik
-
Publication number: 20050075389Abstract: The present invention discloses a method for effectively isolating and purifying a physiological active dauer pheromone compound having the following structural formula I related to aging and stress of C. elegans, and determination of the structure of such material. First, ethanol extract is prepared by completely concentrating a liquid medium with ethanol after culturing C. elegans on a S. basal liquid medium, and then this ethanol fraction is further extracted with ethyl acetate. Then, impurities are removed from ethyl acetate extract by a silica-gel adsorption chromatography and a pheromone extract is isolated and purified by amine column chromatographic procedures using various solvents as eluent. Finally, a pheromone compound having structural formula I is completely isolated and characterized by size-exclusion HPLC.Type: ApplicationFiled: October 7, 2003Publication date: April 7, 2005Inventors: Young Paik, Pan Jeong