Patents by Inventor Young-Seok JANG

Young-Seok JANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240118092
    Abstract: Disclosed is an image-based cooperative simultaneous localization and mapping system and method by using rendezvous. An embodiment of the present invention provides an image-based cooperative simultaneous localization and mapping method in a multi-platform system, the method comprising the steps of: estimating a camera posture on the basis of an image input through a camera in a single SLAM scheme and manufacturing an local map by each of multiple platforms; extracting a non-static feature from the image and managing same; transmitting, to a ground station, the camera posture, the local map, and the non-static feature as platform data; determining, by the ground station, whether a rendezvous situation has occurred between one of the multiple platforms and the remaining platforms, on the basis of the platform data; and when the rendezvous situation occurs, fusing the local map received from two or more rendezvoused platforms into a global map.
    Type: Application
    Filed: March 16, 2021
    Publication date: April 11, 2024
    Inventors: Hyoun Jin KIM, Young Seok JANG
  • Patent number: 11735427
    Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: August 22, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jin Shin, Woo-Mok Son, Nam-Hoon Lee, Dong-Eog Kim, Seung-Hun Oh, Eun-Seok Lee, Young-Seok Jang
  • Patent number: 11648644
    Abstract: A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: May 16, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun Seok Lee, Ja Eung Koo, Kuen Byul Kim, Jeong Min Na, Chang Gil Ryu, Hyeon Dong Song, Young Seok Jang, Jin Suk Hong
  • Patent number: 11541698
    Abstract: A Helmholtz resonator for a vehicle wheel reduces sonic resonance, which is generated in a tire during running of the vehicle, by employing a wheel cap, which has an internal chamber in the vehicle wheel cap and is closely mounted on the vehicle wheel from the outside of the vehicle wheel, a connecting pipe connecting the internal chamber in the vehicle wheel cap with the cavity in the tire and a coupling member.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: January 3, 2023
    Assignees: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION
    Inventors: Jae Sung Jung, Young Seok Jang
  • Publication number: 20220093405
    Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.
    Type: Application
    Filed: December 8, 2021
    Publication date: March 24, 2022
    Inventors: Jin SHIN, Woo-Mok SON, Nam-Hoon LEE, Dong-Eog KIM, Seung-Hun OH, Eun-Seok LEE, Young-Seok JANG
  • Patent number: 11222786
    Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: January 11, 2022
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jin Shin, Woo-Mok Son, Nam-Hoon Lee, Dong-Eog Kim, Seung-Hun Oh, Eun-Seok Lee, Young-Seok Jang
  • Publication number: 20200282778
    Abstract: A Helmholtz resonator for a vehicle wheel reduces sonic resonance, which is generated in a tire during running of the vehicle, by employing a wheel cap, which has an internal chamber in the vehicle wheel cap and is closely mounted on the vehicle wheel from the outside of the vehicle wheel, a connecting pipe connecting the internal chamber in the vehicle wheel cap with the cavity in the tire and a coupling member.
    Type: Application
    Filed: June 27, 2019
    Publication date: September 10, 2020
    Inventors: Jae Sung Jung, Young Seok Jang
  • Publication number: 20200206870
    Abstract: A polishing pad conditioning apparatus according to an example embodiment of the present inventive concept includes an apparatus body, a pivot arm provided on the apparatus body and including a housing having an internal space and provided at a distal end portion of the pivot arm and a head unit disposed at the distal end portion of the pivot arm. The head unit includes: a rotary motor provided in the internal space of the housing, the rotary motor including a rotary shaft; a foreign material blocking member connected to the rotary shaft; a disk holder connected to the rotary shaft; and a conditioning disk coupled to the disk holder. The foreign material blocking member includes a fluid flow groove configured to guide a movement of fluid for preventing foreign objects from entering the housing on an outer surface of the foreign material blocking member.
    Type: Application
    Filed: July 22, 2019
    Publication date: July 2, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eun Seok LEE, Ja Eung KOO, Kuen Byul KIM, Jeong Min NA, Chang Gil RYU, Hyeon Dong SONG, Young Seok JANG, Jin Suk HONG
  • Publication number: 20200152469
    Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.
    Type: Application
    Filed: May 30, 2019
    Publication date: May 14, 2020
    Inventors: Jin SHIN, Woo-Mok SON, Nam-Hoon LEE, Dong-Eog KIM, Seung-Hun OH, Eun-Seok LEE, Young-Seok JANG
  • Publication number: 20190091833
    Abstract: A chemical mechanical polishing method includes providing a pad conditioner, such that the pad conditioner includes a base and a plurality of tips protruding from a surface of the base, adjusting a surface roughness of an upper surface of each tip of the plurality of tips, and adjusting a polishing rate of chemical mechanical polishing using the adjusted surface roughness of the upper surfaces of the plurality of tips.
    Type: Application
    Filed: April 19, 2018
    Publication date: March 28, 2019
    Applicant: EHWA DIAMOND IND. CO., LTD.
    Inventors: Sol HAN, Yung Jun KIM, Ho Young KIM, Doo Sik MOON, Sung Oh PARK, Young Seok JANG, Sun Gyu PARK, Kyu Min OH, Joo Han LEE
  • Patent number: 10017838
    Abstract: A method of extracting lithium from a lithium bearing solution and specifically, economically extracting lithium from a lithium bearing solution comprising the steps of: adding a nucleus particle to a lithium bearing solution; and precipitating the dissolved lithium in the lithium bearing solution as lithium phosphate by adding a phosphorous supplying material to the lithium bearing solution including the nucleus particle is provided.
    Type: Grant
    Filed: December 10, 2012
    Date of Patent: July 10, 2018
    Assignee: RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY
    Inventors: Uong Chon, Ki Young Kim, Gi-Chun Han, Chang Ho Song, Young Seok Jang, Kee-Uek Jeung, So Ra Jung
  • Patent number: 9994931
    Abstract: Disclosed is a method of extracting lithium from a solution including lithium. The method of extracting lithium from a solution including lithium includes: separating the solution including lithium into a monovalent ion-containing solution and a solution including ions having more than divalence using a separation membrane having a negative charge on its surface; removing impurities from the monovalent ion-containing solution; and precipitating lithium dissolved in the monovalent ion-containing solution into lithium phosphate by adding a phosphorus-supplying material to the monovalent ion-containing solution.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: June 12, 2018
    Assignees: POSCO, RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY
    Inventors: Uong Chon, Gi-Chun Han, Ki Young Kim, So Ra Jung, Kee Uek Jeung, Chang Ho Song, Young Seok Jang
  • Patent number: 9790096
    Abstract: Disclosed is a boron recovering device including: an aeration-type water-channel reactor including a water channel; at least one aeration unit disposed in the water channel and aerating a boron-containing solution by passing it through the water channel to deposit boron in the form of borax; and a precipitation bath precipitating the deposited borax in the boron-containing solution having passed through the aeration-type water-channel reactor and separating a filtrate by overflowing, a boron recovering device, a method of recovering boron, and a boron recovering system.
    Type: Grant
    Filed: December 27, 2012
    Date of Patent: October 17, 2017
    Assignees: POSCO, RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY, MMPLY CO., LTD.
    Inventors: Uong Chon, Ki Young Kim, Gi-Chun Han, Im Chang Lee, Young Seok Jang, Sou Hwan Son
  • Publication number: 20150197830
    Abstract: Disclosed is a method of extracting lithium from a solution including lithium. The method of extracting lithium from a solution including lithium includes: separating the solution including lithium into a monovalent ion-containing solution and a solution including ions having more than divalence using a separation membrane having a negative charge on its surface; removing impurities from the monovalent ion-containing solution; and precipitating lithium dissolved in the monovalent ion-containing solution into lithium phosphate by adding a phosphorus-supplying material to the monovalent ion-containing solution.
    Type: Application
    Filed: December 28, 2012
    Publication date: July 16, 2015
    Applicant: RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY
    Inventors: Uong Chon, Gi-Chun Han, Ki Young Kim, So Ra Jung, Kee Uek Jeung, Chang Ho Song, Young Seok Jang
  • Publication number: 20150118130
    Abstract: Disclosed is a boron recovering device including: an aeration-type water-channel reactor including a water channel; at least one aeration unit disposed in the water channel and aerating a boron-containing solution by passing it through the water channel to deposit boron in the form of borax; and a precipitation bath precipitating the deposited borax in the boron-containing solution having passed through the aeration-type water-channel reactor and separating a filtrate by overflowing, a boron recovering device, a method of recovering boron, and a boron recovering system.
    Type: Application
    Filed: December 27, 2012
    Publication date: April 30, 2015
    Inventors: Uong Chon, Ki Young Kim, Gi-Chun Han, Im Chang Lee, Young Seok Jang, Sou Hwan Son
  • Publication number: 20140348734
    Abstract: A method of extracting lithium from a lithium bearing solution and specifically, economically extracting lithium from a lithium bearing solution comprising the steps of: adding a nucleus particle to a lithium bearing solution; and precipitating the dissolved lithium in the lithium bearing solution as lithium phosphate by adding a phosphorous supplying material to the lithium bearing solution including the nucleus particle is provided.
    Type: Application
    Filed: December 10, 2012
    Publication date: November 27, 2014
    Inventors: Uong Chong, Ki Young Kim, Gi-Chun Han, Chang Ho Song, Young Seok Jang, Kee-Uek Jeung, So Ra Jung
  • Publication number: 20130316628
    Abstract: A flexible membrane for a polishing head includes a main part having a first surface configured to make contact with a surface of a substrate and a second surface opposite to the first surface, a plurality of extensions extending substantially perpendicularly from the second surface of the main part so as to define a plurality of independent spaces, respectively, and an inner ring coupled with an inner side of an outermost extension of the extensions to support an edge portion of the main part. A bottom surface of the inner ring is substantially flat.
    Type: Application
    Filed: March 6, 2013
    Publication date: November 28, 2013
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Young-Seok JANG, Young-Ho KOH, Jae-Sun KIM, Kuen-Byul KIM, Jae-Chang LEE, Min-Sung HEO, Jin-Suk HONG, Jae-Dong LEE