Patents by Inventor Young-Sheng Bai

Young-Sheng Bai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8963019
    Abstract: A circuit board and a manufacturing method thereof are provided. According to the method, a dielectric layer is formed on a dielectric substrate, and the dielectric layer contains active particles. A surface treatment is performed on a surface of the dielectric first conductive layer is formed on the activated surface of the dielectric layer. A conductive via is formed in the dielectric substrate and the dielectric layer. A patterned mask layer is formed on the first conductive layer, in which the patterned mask layer exposes the conductive via and a part of the first conductive layer. A second conductive layer is formed on the first conductive layer and conductive via exposed by the patterned mask layer. The patterned mask layer and the first conductive layer below the patterned mask layer are removed.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: February 24, 2015
    Assignee: Unimicron Technology Corp.
    Inventors: Cheng-Po Yu, Shang-Feng Huang, Chang-Ming Lee, Young-Sheng Bai
  • Publication number: 20130327564
    Abstract: A circuit board and a manufacturing method thereof are provided. According to the method, a dielectric layer is formed on a dielectric substrate, and the dielectric layer contains active particles. A surface treatment is performed on a surface of the dielectric first conductive layer is formed on the activated surface of the dielectric layer. A conductive via is formed in the dielectric substrate and the dielectric layer. A patterned mask layer is formed on the first conductive layer, in which the patterned mask layer exposes the conductive via and a part of the first conductive layer. A second conductive layer is formed on the first conductive layer and conductive via exposed by the patterned mask layer. The patterned mask layer and the first conductive layer below the patterned mask layer are removed.
    Type: Application
    Filed: August 9, 2012
    Publication date: December 12, 2013
    Applicant: UNIMICRON TECHNOLOGY CORP.
    Inventors: Cheng-Po Yu, Shang-Feng Huang, Chang-Ming Lee, Young-Sheng Bai