Abstract: Provided are a nanostructure network and a method of fabricating the same. The nanostructure network includes nanostructures having a poly-crystalline structure formed by self-assembly of the nanostructures. The method includes preparing a nanostructure solution in which nanostructures are dispersed in a first solvent, forming a nanostructure ink by adding the nanostructure solution into a second solvent having a viscosity higher than that of the first solvent, coating a surface of a substrate with the nanostructure ink, and forming a nanostructure network by evaporating the first solvent and the second solvent included in the nanostructure ink coated on the substrate.

Abstract: Provided are a nanostructure network and a method of fabricating the same. The nanostructure network includes nanostructures having a poly-crystalline structure formed by self-assembly of the nanostructures. The method includes preparing a nanostructure solution in which nanostructures are dispersed in a first solvent, forming a nanostructure ink by adding the nanostructure solution into a second solvent having a viscosity higher than that of the first solvent, coating a surface of a substrate with the nanostructure ink, and forming a nanostructure network by evaporating the first solvent and the second solvent included in the nanostructure ink coated on the substrate.

Abstract: The present invention discloses a method for manufacturing a fringe field switching mode liquid crystal display device. Here, a gate bus line has a double layer structure of an ITO layer and an opaque metal layer, and thus the gate bus line and a counter electrode region where a counter electrode is formed are formed at the same time. In addition, a data bus line has a double layer structure of the ITO layer and the opaque metal layer, and thus the data bus line and a pixel electrode region where a pixel electrode is formed are formed at the same time. A polyimide layer is employed as an electrode insulating layer formed between the pixel electrode and the counter electrode.

Abstract: The present invention discloses a method for manufacturing a fringe field switching mode liquid crystal display device. Here, a gate bus line has a double layer structure of an ITO layer and an opaque metal layer, and thus the gate bus line and a counter electrode region where a counter electrode is formed are formed at the same time. In addition, a data bus line has a double layer structure of the ITO layer and the opaque metal layer, and thus the data bus line and a pixel electrode region where a pixel electrode is formed are formed at the same time. A polyimide layer is employed as an electrode insulating layer formed between the pixel electrode and the counter electrode.